SE355692B - - Google Patents

Info

Publication number
SE355692B
SE355692B SE814869A SE814869A SE355692B SE 355692 B SE355692 B SE 355692B SE 814869 A SE814869 A SE 814869A SE 814869 A SE814869 A SE 814869A SE 355692 B SE355692 B SE 355692B
Authority
SE
Sweden
Application number
SE814869A
Inventor
H Deens
E Buckley
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of SE355692B publication Critical patent/SE355692B/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105After-treatment
    • H01L21/311Etching the insulating layers by chemical or physical means
    • H01L21/31105Etching inorganic layers
    • H01L21/31111Etching inorganic layers by chemical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Weting (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)
SE814869A 1968-06-10 1969-06-09 SE355692B (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73571968A 1968-06-10 1968-06-10

Publications (1)

Publication Number Publication Date
SE355692B true SE355692B (ja) 1973-04-30

Family

ID=24956905

Family Applications (1)

Application Number Title Priority Date Filing Date
SE814869A SE355692B (ja) 1968-06-10 1969-06-09

Country Status (8)

Country Link
BR (1) BR6909609D0 (ja)
DE (1) DE1929084C3 (ja)
ES (1) ES368134A1 (ja)
FR (1) FR2011513B1 (ja)
GB (1) GB1228083A (ja)
MY (1) MY7400057A (ja)
NL (1) NL6908748A (ja)
SE (1) SE355692B (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2288138A1 (fr) * 1974-10-18 1976-05-14 Radiotechnique Compelec Procede d'attaque de l'alumine
US4230523A (en) * 1978-12-29 1980-10-28 International Business Machines Corporation Etchant for silicon dioxide films disposed atop silicon or metallic silicides
US4620934A (en) * 1984-04-26 1986-11-04 Allied Corporation Soluble fluorinated cycloalkane sulfonate surfactant additives for NH4
US4517106A (en) * 1984-04-26 1985-05-14 Allied Corporation Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
DE19935446A1 (de) 1999-07-28 2001-02-01 Merck Patent Gmbh Ätzlösung, Flußsäure enthaltend
US7192860B2 (en) 2002-06-20 2007-03-20 Honeywell International Inc. Highly selective silicon oxide etching compositions
CN112099311B (zh) * 2020-09-22 2024-05-21 桂林电子科技大学 一种基于aao纳米结构光刻掩膜版的制备方法

Also Published As

Publication number Publication date
NL6908748A (ja) 1969-12-12
FR2011513A1 (ja) 1970-03-06
MY7400057A (en) 1974-12-31
FR2011513B1 (ja) 1973-10-19
ES368134A1 (es) 1971-06-16
BR6909609D0 (pt) 1973-01-02
GB1228083A (ja) 1971-04-15
DE1929084C3 (de) 1980-05-08
DE1929084B2 (de) 1975-01-09
DE1929084A1 (de) 1969-12-11

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