SE0004594D0 - Microscale nozzie - Google Patents

Microscale nozzie

Info

Publication number
SE0004594D0
SE0004594D0 SE0004594A SE0004594A SE0004594D0 SE 0004594 D0 SE0004594 D0 SE 0004594D0 SE 0004594 A SE0004594 A SE 0004594A SE 0004594 A SE0004594 A SE 0004594A SE 0004594 D0 SE0004594 D0 SE 0004594D0
Authority
SE
Sweden
Prior art keywords
microscale
nozzle
nozzie
microscale channel
channel
Prior art date
Application number
SE0004594A
Other languages
English (en)
Swedish (sv)
Inventor
Per Andersson
Ove Oehman
Original Assignee
Gyros Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gyros Ab filed Critical Gyros Ab
Priority to SE0004594A priority Critical patent/SE0004594D0/xx
Publication of SE0004594D0 publication Critical patent/SE0004594D0/xx
Priority to JP2002549470A priority patent/JP2004522596A/ja
Priority to DE60137717T priority patent/DE60137717D1/de
Priority to EP01270426A priority patent/EP1349731B1/en
Priority to US10/450,177 priority patent/US7213339B2/en
Priority to AT01270426T priority patent/ATE423007T1/de
Priority to PCT/SE2001/002753 priority patent/WO2002047913A1/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/162Manufacturing of the nozzle plates
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1637Manufacturing processes molding
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1642Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1643Manufacturing processes thin film formation thin film formation by plating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49124On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155Manufacturing circuit on or in base
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49401Fluid pattern dispersing device making, e.g., ink jet
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/4998Combined manufacture including applying or shaping of fluent material

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Nozzles (AREA)
SE0004594A 2000-12-12 2000-12-12 Microscale nozzie SE0004594D0 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE0004594A SE0004594D0 (sv) 2000-12-12 2000-12-12 Microscale nozzie
JP2002549470A JP2004522596A (ja) 2000-12-12 2001-12-12 マイクロスケールノズル及びその製造方法
DE60137717T DE60137717D1 (de) 2000-12-12 2001-12-12 Mikrodüse und verfahren zur herstellung derselben
EP01270426A EP1349731B1 (en) 2000-12-12 2001-12-12 Microscale nozzle and method for manufacturing the same
US10/450,177 US7213339B2 (en) 2000-12-12 2001-12-12 Method of manufacturing a microscale nozzle
AT01270426T ATE423007T1 (de) 2000-12-12 2001-12-12 Mikrodüse und verfahren zur herstellung derselben
PCT/SE2001/002753 WO2002047913A1 (en) 2000-12-12 2001-12-12 Microscale nozzle and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0004594A SE0004594D0 (sv) 2000-12-12 2000-12-12 Microscale nozzie

Publications (1)

Publication Number Publication Date
SE0004594D0 true SE0004594D0 (sv) 2000-12-12

Family

ID=20282200

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0004594A SE0004594D0 (sv) 2000-12-12 2000-12-12 Microscale nozzie

Country Status (7)

Country Link
US (1) US7213339B2 (ja)
EP (1) EP1349731B1 (ja)
JP (1) JP2004522596A (ja)
AT (1) ATE423007T1 (ja)
DE (1) DE60137717D1 (ja)
SE (1) SE0004594D0 (ja)
WO (1) WO2002047913A1 (ja)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9808836D0 (en) * 1998-04-27 1998-06-24 Amersham Pharm Biotech Uk Ltd Microfabricated apparatus for cell based assays
GB9809943D0 (en) 1998-05-08 1998-07-08 Amersham Pharm Biotech Ab Microfluidic device
US7261859B2 (en) 1998-12-30 2007-08-28 Gyros Ab Microanalysis device
SE0001790D0 (sv) * 2000-05-12 2000-05-12 Aamic Ab Hydrophobic barrier
SE0004296D0 (sv) * 2000-11-23 2000-11-23 Gyros Ab Device and method for the controlled heating in micro channel systems
JP4323806B2 (ja) 2001-03-19 2009-09-02 ユィロス・パテント・アクチボラグ 反応可変要素の特徴付け
US6919058B2 (en) * 2001-08-28 2005-07-19 Gyros Ab Retaining microfluidic microcavity and other microfluidic structures
US7105810B2 (en) 2001-12-21 2006-09-12 Cornell Research Foundation, Inc. Electrospray emitter for microfluidic channel
WO2003082730A1 (en) * 2002-03-31 2003-10-09 Gyros Ab Efficient mmicrofluidic devices
SE0300454D0 (sv) * 2003-02-19 2003-02-19 Aamic Ab Nozzles for electrospray ionization and methods of fabricating them
US7007710B2 (en) * 2003-04-21 2006-03-07 Predicant Biosciences, Inc. Microfluidic devices and methods
US7537807B2 (en) 2003-09-26 2009-05-26 Cornell University Scanned source oriented nanofiber formation
US7282705B2 (en) * 2003-12-19 2007-10-16 Agilent Technologies, Inc. Microdevice having an annular lining for producing an electrospray emitter
US20090010819A1 (en) * 2004-01-17 2009-01-08 Gyros Patent Ab Versatile flow path
EP1849004A1 (en) * 2005-01-17 2007-10-31 Gyros Patent Ab A versatile flow path
WO2010102199A1 (en) 2009-03-06 2010-09-10 Waters Technologies Corporation Electromechanical and fluidic interface to a microfluidic substrate

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4935624A (en) * 1987-09-30 1990-06-19 Cornell Research Foundation, Inc. Thermal-assisted electrospray interface (TAESI) for LC/MS
GB2219129B (en) * 1988-05-26 1992-06-03 Plessey Co Plc Improvements in and relating to piezoelectric composites
JP3200881B2 (ja) * 1991-09-20 2001-08-20 セイコーエプソン株式会社 インクジェットヘッドの製造方法
JP2803697B2 (ja) * 1991-12-26 1998-09-24 富士電機株式会社 インクジェット記録ヘッドの製造方法
JP3097298B2 (ja) * 1992-04-17 2000-10-10 ブラザー工業株式会社 液滴噴射装置およびその製造方法
FR2727648B1 (fr) * 1994-12-01 1997-01-03 Commissariat Energie Atomique Procede de fabrication micromecanique de buses pour jets de liquide
US5575929A (en) * 1995-06-05 1996-11-19 The Regents Of The University Of California Method for making circular tubular channels with two silicon wafers
US5872010A (en) * 1995-07-21 1999-02-16 Northeastern University Microscale fluid handling system
DE19638501A1 (de) 1996-09-19 1998-04-02 Siemens Ag Verfahren zur Herstellung einer Kapillare
WO2000030167A1 (en) 1998-11-19 2000-05-25 California Institute Of Technology Polymer-based electrospray nozzle for mass spectrometry

Also Published As

Publication number Publication date
US20040055136A1 (en) 2004-03-25
ATE423007T1 (de) 2009-03-15
WO2002047913A1 (en) 2002-06-20
DE60137717D1 (de) 2009-04-02
JP2004522596A (ja) 2004-07-29
EP1349731A1 (en) 2003-10-08
US7213339B2 (en) 2007-05-08
EP1349731B1 (en) 2009-02-18

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