SA520411272B1 - مواد مائعة بحجم النانو بقناة كالسيت - Google Patents

مواد مائعة بحجم النانو بقناة كالسيت

Info

Publication number
SA520411272B1
SA520411272B1 SA520411272A SA520411272A SA520411272B1 SA 520411272 B1 SA520411272 B1 SA 520411272B1 SA 520411272 A SA520411272 A SA 520411272A SA 520411272 A SA520411272 A SA 520411272A SA 520411272 B1 SA520411272 B1 SA 520411272B1
Authority
SA
Saudi Arabia
Prior art keywords
calcite
photoresist
nanofluidics
channel pattern
deposited
Prior art date
Application number
SA520411272A
Other languages
English (en)
Inventor
كيو تشا دون
عبدالله اليوسف علي
العتيبي محمد
Original Assignee
شركه الزيت العربية السعودية
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by شركه الزيت العربية السعودية filed Critical شركه الزيت العربية السعودية
Publication of SA520411272B1 publication Critical patent/SA520411272B1/ar

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2059—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a scanning corpuscular radiation beam, e.g. an electron beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Micromachines (AREA)

Abstract

يتعلق الاختراع الحالي بطريقة لتصنيع قنوات كالسيت في جهاز مائع بحجم النانو. يتم طلاء مادة مقاومة للضوء على ركيزة، وبعد ذلك تعريض جزء من المادة المقاومة للضوء إلى حزمة من الإلكترونات بنمط قناة. يتم تطوير الجزء المكشوف من المادة المقاومة للضوء لتشكيل نمط قناة، ويتم ترسيب الكالسيت في نمط القناة باستخدام غاز منتج للكالسيت. يتضمن الكالسيت المترسب جانب واحد على الأقل له طول في نطاق تقريباً 50 إلى 100 نانو متر. يتم إزالة المادة المقاومة للضوء المتبقية بعد ظهور الجزء المكشوف من المادة المقاومة للضوء. شكل 1.
SA520411272A 2017-08-09 2020-02-08 مواد مائعة بحجم النانو بقناة كالسيت SA520411272B1 (ar)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US15/673,147 US10365564B2 (en) 2017-08-09 2017-08-09 Calcite channel nanofluidics

Publications (1)

Publication Number Publication Date
SA520411272B1 true SA520411272B1 (ar) 2022-09-15

Family

ID=63405414

Family Applications (1)

Application Number Title Priority Date Filing Date
SA520411272A SA520411272B1 (ar) 2017-08-09 2020-02-08 مواد مائعة بحجم النانو بقناة كالسيت

Country Status (7)

Country Link
US (2) US10365564B2 (ar)
EP (1) EP3665532B1 (ar)
JP (1) JP6947482B2 (ar)
CN (1) CN111108440A (ar)
CA (1) CA3075166C (ar)
SA (1) SA520411272B1 (ar)
WO (1) WO2019032903A1 (ar)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10365564B2 (en) 2017-08-09 2019-07-30 Saudi Arabian Oil Company Calcite channel nanofluidics
US10761428B2 (en) 2018-08-28 2020-09-01 Saudi Arabian Oil Company Fabricating calcite nanofluidic channels
US10926227B2 (en) * 2018-12-03 2021-02-23 Saudi Arabian Oil Company Fabricating calcite nanofluidic channels
US11300554B2 (en) 2020-01-14 2022-04-12 Saudi Arabian Oil Company Calcite channel structures with heterogeneous wettability
US11449083B2 (en) 2020-08-04 2022-09-20 International Business Machines Corporation Evaluating enhanced oil recovery methods
US11454097B2 (en) 2021-01-04 2022-09-27 Saudi Arabian Oil Company Artificial rain to enhance hydrocarbon recovery
US11961702B2 (en) 2021-12-09 2024-04-16 Saudi Arabian Oil Company Fabrication of in situ HR-LCTEM nanofluidic cell for nanobubble interactions during EOR processes in carbonate rocks
US11787993B1 (en) 2022-03-28 2023-10-17 Saudi Arabian Oil Company In-situ foamed gel for lost circulation
US11913319B2 (en) 2022-06-21 2024-02-27 Saudi Arabian Oil Company Sandstone stimulation

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CN1717437B (zh) * 2002-11-01 2012-03-28 佐治亚技术研究公司 牺牲组合物、其应用以及分解方法
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KR20160014504A (ko) * 2014-07-29 2016-02-11 광주과학기술원 패럴린 박막을 포함하는 미세유체소자의 제조방법 및 이에 의해 제조된 미세유체소자
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Also Published As

Publication number Publication date
CN111108440A (zh) 2020-05-05
US20190250514A1 (en) 2019-08-15
US10983439B2 (en) 2021-04-20
JP2020533620A (ja) 2020-11-19
JP6947482B2 (ja) 2021-10-13
CA3075166C (en) 2022-06-21
EP3665532A1 (en) 2020-06-17
WO2019032903A1 (en) 2019-02-14
US10365564B2 (en) 2019-07-30
US20190049847A1 (en) 2019-02-14
CA3075166A1 (en) 2019-02-14
EP3665532B1 (en) 2020-12-30

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