RU2017141042A3 - - Google Patents
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- Publication number
- RU2017141042A3 RU2017141042A3 RU2017141042A RU2017141042A RU2017141042A3 RU 2017141042 A3 RU2017141042 A3 RU 2017141042A3 RU 2017141042 A RU2017141042 A RU 2017141042A RU 2017141042 A RU2017141042 A RU 2017141042A RU 2017141042 A3 RU2017141042 A3 RU 2017141042A3
- Authority
- RU
- Russia
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J35/00—X-ray tubes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/006—X-ray radiation generated from plasma being produced from a liquid or gas details of the ejection system, e.g. constructional details of the nozzle
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2017141042A RU2670273C2 (ru) | 2017-11-24 | 2017-11-24 | Устройство и способ для генерации излучения из лазерной плазмы |
| PCT/RU2018/000520 WO2019103648A1 (en) | 2017-11-24 | 2018-08-08 | High-brightness lpp source and methods for generating radiation and mitigating debris |
| KR1020207015967A KR102597847B1 (ko) | 2017-11-24 | 2018-08-08 | 고휘도 lpp 소스 및 방사선 생성과 잔해 완화를 위한 방법 |
| JP2020543042A JP6860185B2 (ja) | 2017-11-24 | 2018-08-08 | 高輝度ｌｐｐ線源および放射線の発生方法並びにデブリの軽減方法 |
| CN201880075848.7A CN111406303B (zh) | 2017-11-24 | 2018-08-08 | 高亮度lpp源和用于产生辐射并减少碎屑的方法 |
| EP18880978.4A EP3714476B1 (en) | 2017-11-24 | 2018-08-08 | High-brightness lpp source and methods for generating radiation and mitigating debris |
| US16/103,243 US10638588B2 (en) | 2017-11-24 | 2018-08-14 | High-brightness laser produced plasma source and methods for generating radiation and mitigating debris |
| US16/952,587 US11252810B2 (en) | 2017-11-24 | 2020-11-19 | Short-wavelength radiation source with multisectional collector module and method of collecting radiation |
| US17/569,737 US12028958B2 (en) | 2017-11-24 | 2022-01-06 | High-brightness laser produced plasma source and method of generation and collection radiation |
| US18/519,456 US20240121878A1 (en) | 2017-11-24 | 2023-11-27 | High brightness lpp euv light source with fast rotating target and method of cooling thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2017141042A RU2670273C2 (ru) | 2017-11-24 | 2017-11-24 | Устройство и способ для генерации излучения из лазерной плазмы |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| RU2017141042A RU2017141042A (ru) | 2018-08-10 |
| RU2017141042A3 true RU2017141042A3 (ru) | 2018-08-21 |
| RU2670273C2 RU2670273C2 (ru) | 2018-10-22 |
Family
ID=63113080
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2017141042A RU2670273C2 (ru) | 2017-11-24 | 2017-11-24 | Устройство и способ для генерации излучения из лазерной плазмы |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10638588B2 (ru) |
| EP (1) | EP3714476B1 (ru) |
| JP (1) | JP6860185B2 (ru) |
| KR (1) | KR102597847B1 (ru) |
| CN (1) | CN111406303B (ru) |
| RU (1) | RU2670273C2 (ru) |
| WO (1) | WO2019103648A1 (ru) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2709183C1 (ru) * | 2019-04-26 | 2019-12-17 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Источник рентгеновского излучения с жидкометаллической мишенью и способ генерации излучения |
| RU2743572C1 (ru) * | 2020-09-04 | 2021-02-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Высокояркостный источник коротковолнового излучения (варианты) |
| US10887973B2 (en) * | 2018-08-14 | 2021-01-05 | Isteq B.V. | High brightness laser-produced plasma light source |
| RU2726316C1 (ru) * | 2020-01-25 | 2020-07-13 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Высокояркостный источник коротковолнового излучения на основе лазерной плазмы |
| RU2706713C1 (ru) * | 2019-04-26 | 2019-11-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Источник коротковолнового излучения высокой яркости |
| KR102428199B1 (ko) * | 2019-04-26 | 2022-08-02 | 이유브이 랩스, 엘티디. | 회전하는 액체 금속 타겟을 가지는 x레이 소스 및 복사 생성 방법 |
| RU195771U1 (ru) * | 2019-10-29 | 2020-02-05 | Федеральное государственное бюджетное учреждение "Институт теоретической и экспериментальной физики имени А.И. Алиханова Национального исследовательского центра "Курчатовский институт" | Лазерный генератор ионов |
| US11515050B1 (en) * | 2019-11-22 | 2022-11-29 | X Development Llc | Mitigating plasma instability |
| EP4209120A1 (en) * | 2020-09-04 | 2023-07-12 | Isteq B.V. | Short- wavelength radiation source with multisectional collector module |
| RU2749835C1 (ru) * | 2020-09-21 | 2021-06-17 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" (Госкорпорация "Росатом") | Способ формирования пространственных конфигураций лазерных источников в схемах прямого облучения сферических мишеней на установках для лазерного термоядерного синтеза |
| CN114485279B (zh) * | 2020-10-26 | 2023-03-07 | 北京大学 | 一种用于重频激光打靶的溅射屏蔽系统及方法 |
| RU2765486C1 (ru) * | 2021-06-07 | 2022-01-31 | Федеральное государственное бюджетное учреждение науки Физико-технический институт им. А.Ф. Иоффе Российской академии наук | Термоядерная мишень непрямого инициирования |
| WO2023079042A1 (en) | 2021-11-03 | 2023-05-11 | Isteq B.V. | High-brightness laser produced plasma source and method of generating and collecting radiation |
| CN114302552B (zh) * | 2021-12-09 | 2023-02-07 | 清华大学 | 复合转换靶 |
| WO2023135322A1 (en) | 2022-01-17 | 2023-07-20 | Isteq B.V. | Target material, high-brightness euv source and method for generating euv radiation |
| JP2023148403A (ja) * | 2022-03-30 | 2023-10-13 | ウシオ電機株式会社 | 光源装置 |
| JP2023149176A (ja) * | 2022-03-30 | 2023-10-13 | ウシオ電機株式会社 | 光源装置 |
| JP2023173942A (ja) * | 2022-05-27 | 2023-12-07 | ウシオ電機株式会社 | 光源装置 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2206186C2 (ru) * | 2000-07-04 | 2003-06-10 | Государственный научный центр Российской Федерации Троицкий институт инновационных и термоядерных исследований | Способ получения коротковолнового излучения из газоразрядной плазмы и устройство для его реализации |
| ATE489838T1 (de) * | 2000-07-28 | 2010-12-15 | Jettec Ab | Verfahren und vorrichtung zur erzeugung von röntgenstrahlung |
| AU2003303542A1 (en) * | 2003-01-02 | 2004-07-29 | Jmar Research Inc. | Method and apparatus for generating a membrane target for laser produced plasma |
| US7307375B2 (en) * | 2004-07-09 | 2007-12-11 | Energetiq Technology Inc. | Inductively-driven plasma light source |
| JP4901874B2 (ja) * | 2005-11-02 | 2012-03-21 | ユニバーシティ・カレッジ・ダブリン，ナショナル・ユニバーシティ・オブ・アイルランド，ダブリン | Ｅｕｖミラー |
| JP4904809B2 (ja) * | 2005-12-28 | 2012-03-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| ATE489839T1 (de) * | 2006-05-16 | 2010-12-15 | Koninkl Philips Electronics Nv | Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät |
| JP5098019B2 (ja) * | 2007-04-27 | 2012-12-12 | ギガフォトン株式会社 | 極端紫外光源装置 |
| JP4952513B2 (ja) * | 2007-10-31 | 2012-06-13 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| NL1036614A1 (nl) * | 2008-03-21 | 2009-09-22 | Asml Netherlands Bv | A target material, a source, an EUV lithographic apparatus and a device manufacturing method using the same. |
| JP5454881B2 (ja) * | 2008-08-29 | 2014-03-26 | ギガフォトン株式会社 | 極端紫外光源装置及び極端紫外光の発生方法 |
| JP4893730B2 (ja) * | 2008-12-25 | 2012-03-07 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| EP2556729A1 (en) * | 2010-04-08 | 2013-02-13 | ASML Netherlands BV | Euv radiation source and euv radiation generation method |
| US8344339B2 (en) * | 2010-08-30 | 2013-01-01 | Media Lario S.R.L. | Source-collector module with GIC mirror and tin rod EUV LPP target system |
| TWI596384B (zh) * | 2012-01-18 | 2017-08-21 | Ａｓｍｌ荷蘭公司 | 光源收集器元件、微影裝置及元件製造方法 |
| JP5724986B2 (ja) * | 2012-10-30 | 2015-05-27 | ウシオ電機株式会社 | 放電電極 |
| JP6241062B2 (ja) * | 2013-04-30 | 2017-12-06 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| US9544984B2 (en) * | 2013-07-22 | 2017-01-10 | Kla-Tencor Corporation | System and method for generation of extreme ultraviolet light |
| US9338870B2 (en) * | 2013-12-30 | 2016-05-10 | Asml Netherlands B.V. | Extreme ultraviolet light source |
-
2017
- 2017-11-24 RU RU2017141042A patent/RU2670273C2/ru active
-
2018
- 2018-08-08 KR KR1020207015967A patent/KR102597847B1/ko active IP Right Grant
- 2018-08-08 EP EP18880978.4A patent/EP3714476B1/en active Active
- 2018-08-08 CN CN201880075848.7A patent/CN111406303B/zh active Active
- 2018-08-08 WO PCT/RU2018/000520 patent/WO2019103648A1/en unknown
- 2018-08-08 JP JP2020543042A patent/JP6860185B2/ja active Active
- 2018-08-14 US US16/103,243 patent/US10638588B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| US10638588B2 (en) | 2020-04-28 |
| JP2021504763A (ja) | 2021-02-15 |
| CN111406303A (zh) | 2020-07-10 |
| EP3714476A4 (en) | 2021-01-06 |
| CN111406303B (zh) | 2023-08-08 |
| EP3714476B1 (en) | 2021-06-23 |
| WO2019103648A1 (en) | 2019-05-31 |
| RU2670273C2 (ru) | 2018-10-22 |
| JP6860185B2 (ja) | 2021-04-14 |
| KR102597847B1 (ko) | 2023-11-03 |
| EP3714476A1 (en) | 2020-09-30 |
| RU2017141042A (ru) | 2018-08-10 |
| US20190166679A1 (en) | 2019-05-30 |
| KR20200092974A (ko) | 2020-08-04 |