RO91139B1 - Procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciu - Google Patents
Procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciuInfo
- Publication number
- RO91139B1 RO91139B1 RO118156A RO11815685A RO91139B1 RO 91139 B1 RO91139 B1 RO 91139B1 RO 118156 A RO118156 A RO 118156A RO 11815685 A RO11815685 A RO 11815685A RO 91139 B1 RO91139 B1 RO 91139B1
- Authority
- RO
- Romania
- Prior art keywords
- silicon wafers
- local source
- deposition
- forming
- boron doping
- Prior art date
Links
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title abstract 3
- 229910052796 boron Inorganic materials 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052710 silicon Inorganic materials 0.000 title abstract 2
- 239000010703 silicon Substances 0.000 title abstract 2
- 235000012431 wafers Nutrition 0.000 title abstract 2
- 230000008021 deposition Effects 0.000 title 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- 238000009434 installation Methods 0.000 abstract 2
- 229910052582 BN Inorganic materials 0.000 abstract 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 abstract 1
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 238000007669 thermal treatment Methods 0.000 abstract 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Inventia se refera la un procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciu, utilizat pentru realizarea jonctiunilor semiconductoare. Procedeul, conform inventiei, consta în utilizarea drept tinta plasata la catodul instalatiei, consta în utilizarea drept tinta plasata la catodul instalatiei a unei plachete ceramice de înalta puritate de nitrura de bor cu continut de bor mai mare de 41% penttru uz electronic, gazul de descarcare fiind argonul, pentru plachetele fiind supuse unui tratament termic la o temperatura cuprinsa între 1175-1250 K, iar în final îndepartarea chimica a stratului superficial depus.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RO118156A RO91139B1 (ro) | 1985-03-28 | 1985-03-28 | Procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciu |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RO118156A RO91139B1 (ro) | 1985-03-28 | 1985-03-28 | Procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciu |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RO91139A2 RO91139A2 (ro) | 1987-02-27 |
| RO91139B1 true RO91139B1 (ro) | 1987-03-01 |
Family
ID=20116854
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RO118156A RO91139B1 (ro) | 1985-03-28 | 1985-03-28 | Procedeu de depunere a sursei locale pentru doparea cu bor a plachetelor de siliciu |
Country Status (1)
| Country | Link |
|---|---|
| RO (1) | RO91139B1 (ro) |
-
1985
- 1985-03-28 RO RO118156A patent/RO91139B1/ro unknown
Also Published As
| Publication number | Publication date |
|---|---|
| RO91139A2 (ro) | 1987-02-27 |
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