PT88799B - Isolamento dinamico e acostagem sem contacto - Google Patents

Isolamento dinamico e acostagem sem contacto Download PDF

Info

Publication number
PT88799B
PT88799B PT88799A PT8879988A PT88799B PT 88799 B PT88799 B PT 88799B PT 88799 A PT88799 A PT 88799A PT 8879988 A PT8879988 A PT 8879988A PT 88799 B PT88799 B PT 88799B
Authority
PT
Portugal
Prior art keywords
tube
gas
slit
porous plate
enclosure
Prior art date
Application number
PT88799A
Other languages
English (en)
Portuguese (pt)
Other versions
PT88799A (pt
Inventor
Francois Meline
Original Assignee
Sgn Soc Gen Tech Nouvelle
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgn Soc Gen Tech Nouvelle filed Critical Sgn Soc Gen Tech Nouvelle
Publication of PT88799A publication Critical patent/PT88799A/pt
Publication of PT88799B publication Critical patent/PT88799B/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F24—HEATING; RANGES; VENTILATING
    • F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
    • F24F9/00—Use of air currents for screening, e.g. air curtains
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775—Docking arrangements
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S55/00—Gas separation
    • Y10S55/29—Air curtains
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/206—Flow affected by fluid contact, energy field or coanda effect [e.g., pure fluid device or system]

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Workshop Equipment, Work Benches, Supports, Or Storage Means (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Structure Of Emergency Protection For Nuclear Reactors (AREA)
  • Separation Using Semi-Permeable Membranes (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Thermal Insulation (AREA)
PT88799A 1987-10-20 1988-10-19 Isolamento dinamico e acostagem sem contacto PT88799B (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8714469A FR2621887B1 (fr) 1987-10-20 1987-10-20 Confinement dynamique et accostage sans contact

Publications (2)

Publication Number Publication Date
PT88799A PT88799A (pt) 1989-07-31
PT88799B true PT88799B (pt) 1994-01-31

Family

ID=9355983

Family Applications (1)

Application Number Title Priority Date Filing Date
PT88799A PT88799B (pt) 1987-10-20 1988-10-19 Isolamento dinamico e acostagem sem contacto

Country Status (9)

Country Link
US (1) US4901764A (en, 2012)
EP (1) EP0313455B1 (en, 2012)
JP (1) JPH0821529B2 (en, 2012)
KR (1) KR890007418A (en, 2012)
DE (1) DE3868842D1 (en, 2012)
ES (1) ES2030193T3 (en, 2012)
FR (1) FR2621887B1 (en, 2012)
GR (1) GR3004547T3 (en, 2012)
PT (1) PT88799B (en, 2012)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8901630A (nl) * 1989-06-28 1991-01-16 Philips Nv Vacuuem systeem.
US5316794A (en) * 1992-12-11 1994-05-31 Applied Materials, Inc. Method for servicing vacuum chamber using non-reactive gas-filled maintenance enclosure
US5590537A (en) * 1995-09-07 1997-01-07 The Perkin-Elmer Corporation Dry gas curtain for cryogenic surface
US6248146B1 (en) 1997-04-21 2001-06-19 Herbert L. Willke, Jr. Induction assembly for high efficiency air filter
GB0416295D0 (en) * 2004-07-21 2004-08-25 Boc Group Plc Ventilator
JP2013148221A (ja) * 2010-05-11 2013-08-01 Sharp Corp クリーンルーム
JP6411582B1 (ja) * 2017-06-02 2018-10-24 日本エアーテック株式会社 エアーカーテン装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1106473B (de) * 1954-04-15 1961-05-10 Schilde Maschb Ag Abschirmung eines Raumes durch einen Luftschleier
US3068775A (en) * 1959-05-13 1962-12-18 Sulzer Ag Control system for an air curtain sealing the entrance of a building
US3223396A (en) * 1963-04-22 1965-12-14 Hayes Inc C I Heat treatment apparatus
FR2087023A5 (en) * 1970-04-15 1971-12-31 Neu Ets Extrusion plant - with air conditioning in the viewing zone adjacent the nozzles
GB1443414A (en) * 1972-07-11 1976-07-21 Nat Res Dev Isolators
DE2609030C3 (de) * 1976-03-05 1984-05-24 Fläkt AB, 13134 Nacka Vorrichtung zum Führen von aus einer luftdurchlässigen perforierten Fläche austretenden Luftströmen
US4162196A (en) * 1976-11-24 1979-07-24 National Appliance Company Adaptor collar
EP0058782A1 (en) * 1981-02-24 1982-09-01 Stichting Ontwikkeling Koeltechniek Cold-storage building
FR2515319B1 (fr) * 1981-10-26 1986-12-26 Air Ind Paroi repartitrice d'air de ventilation pour enceintes de travail
FR2530163B1 (fr) * 1982-07-15 1986-08-29 Commissariat Energie Atomique Procede de confinement de la pollution d'un local a l'aide d'une veine gazeuse
US4534277A (en) * 1983-08-18 1985-08-13 Richard H. Gillmor Geometric air projection and containment
US4696226A (en) * 1986-08-28 1987-09-29 Witmer Warner H Fluid barrier curtain system
FR2620049B2 (fr) * 1986-11-28 1989-11-24 Commissariat Energie Atomique Procede de traitement, stockage et/ou transfert d'un objet dans une atmosphere de haute proprete, et conteneur pour la mise en oeuvre de ce procede

Also Published As

Publication number Publication date
FR2621887A1 (fr) 1989-04-21
KR890007418A (ko) 1989-06-19
JPH0821529B2 (ja) 1996-03-04
PT88799A (pt) 1989-07-31
EP0313455B1 (fr) 1992-03-04
EP0313455A1 (fr) 1989-04-26
DE3868842D1 (de) 1992-04-09
US4901764A (en) 1990-02-20
FR2621887B1 (fr) 1990-03-30
JPH01166520A (ja) 1989-06-30
GR3004547T3 (en, 2012) 1993-04-28
ES2030193T3 (es) 1992-10-16

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Legal Events

Date Code Title Description
FG3A Patent granted, date of granting

Effective date: 19930701

MM3A Annulment or lapse

Free format text: LAPSE DUE TO NON-PAYMENT OF FEES

Effective date: 19990131