PT2977485T - Aparelho de processamento de pvd e método de processamento de pvd - Google Patents
Aparelho de processamento de pvd e método de processamento de pvdInfo
- Publication number
- PT2977485T PT2977485T PT14769428T PT14769428T PT2977485T PT 2977485 T PT2977485 T PT 2977485T PT 14769428 T PT14769428 T PT 14769428T PT 14769428 T PT14769428 T PT 14769428T PT 2977485 T PT2977485 T PT 2977485T
- Authority
- PT
- Portugal
- Prior art keywords
- pvd processing
- processing apparatus
- processing method
- pvd
- processing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013056771A JP6000173B2 (ja) | 2013-03-19 | 2013-03-19 | Pvd処理装置及びpvd処理方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
PT2977485T true PT2977485T (pt) | 2019-06-11 |
Family
ID=51579681
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT14769428T PT2977485T (pt) | 2013-03-19 | 2014-03-03 | Aparelho de processamento de pvd e método de processamento de pvd |
Country Status (11)
Country | Link |
---|---|
US (1) | US20160002769A1 (pt) |
EP (1) | EP2977485B1 (pt) |
JP (1) | JP6000173B2 (pt) |
KR (1) | KR20150126701A (pt) |
CN (1) | CN105051247B (pt) |
BR (1) | BR112015024142B1 (pt) |
ES (1) | ES2727323T3 (pt) |
MX (1) | MX2015011420A (pt) |
PT (1) | PT2977485T (pt) |
TW (1) | TWI522486B (pt) |
WO (1) | WO2014147979A1 (pt) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105420681A (zh) * | 2015-12-09 | 2016-03-23 | 中国科学院长春光学精密机械与物理研究所 | 一种用于控制平面元件膜厚均匀性的镀膜工装 |
CN105603377B (zh) * | 2016-02-23 | 2018-06-08 | 东莞市汇成真空科技有限公司 | 公转与自转均可独立调速的真空镀膜机工件转架运动机构 |
DE102016007727A1 (de) * | 2016-06-23 | 2017-12-28 | Man Truck & Bus Ag | Brennkraftmaschine, insbesondere Hubkolben-Brennkraftmaschine |
BR112020021943A2 (pt) * | 2018-04-27 | 2021-01-26 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | dispositivo de deposição de película e método de deposição de película |
CN108977789B (zh) * | 2018-09-07 | 2021-01-05 | 中国工程物理研究院激光聚变研究中心 | 微球涂层系统 |
JP6772315B2 (ja) * | 2019-02-14 | 2020-10-21 | Towa株式会社 | 成膜品の製造方法及びスパッタリング装置 |
CN109868451B (zh) * | 2019-03-07 | 2021-05-28 | 安徽工业大学 | 一种涂层刀具及其涂层制备工艺 |
CN110284115A (zh) * | 2019-07-09 | 2019-09-27 | 江苏太平洋精锻科技股份有限公司 | 多腔式差速旋转台车 |
JP6635492B1 (ja) * | 2019-10-15 | 2020-01-29 | サンテック株式会社 | 基板回転装置 |
CN111041445B (zh) * | 2019-12-26 | 2024-07-12 | 北京大学深圳研究院 | 一种螺纹件表面涂层物理气相沉积用多向转动装置 |
KR102627931B1 (ko) * | 2023-07-05 | 2024-01-23 | 한국생산기술연구원 | 장축관 균일 코팅 장치 및 방법 |
CN117364043A (zh) * | 2023-10-20 | 2024-01-09 | 深圳金迈克精密科技有限公司 | 一种铝合金pvd流化工艺 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60116775A (ja) * | 1983-11-28 | 1985-06-24 | Pioneer Electronic Corp | 蒸着処理装置 |
DE3852500T2 (de) | 1988-08-25 | 1995-07-27 | Hauzer Ind Bv | Physikalische dampfniederschlag-doppelbeschichtungsvorrichtung und verfahren. |
CN2061568U (zh) * | 1990-01-25 | 1990-09-05 | 北京有色金属研究总院 | 物理气相沉积用杆状基体夹持装置 |
JPH11200042A (ja) | 1998-01-14 | 1999-07-27 | Nikon Corp | 成膜装置及び成膜方法 |
DE10005612A1 (de) * | 2000-02-09 | 2001-08-16 | Hauzer Techno Coating Europ B | Verfahren zur Herstellung eines Gegenstandes und Gegenstand |
JP3959737B2 (ja) * | 2002-03-14 | 2007-08-15 | 三菱マテリアル神戸ツールズ株式会社 | 高速歯切加工ですぐれた耐チッピング性を発揮する硬質被覆層を超硬合金製むく歯切工具の表面に形成する方法 |
JP4120255B2 (ja) * | 2002-04-11 | 2008-07-16 | 三菱マテリアル株式会社 | 工具の成膜方法 |
JP4173762B2 (ja) * | 2003-04-04 | 2008-10-29 | 株式会社神戸製鋼所 | α型結晶構造主体のアルミナ皮膜の製造方法および積層皮膜被覆部材の製造方法 |
US20050126497A1 (en) * | 2003-09-30 | 2005-06-16 | Kidd Jerry D. | Platform assembly and method |
JP4600025B2 (ja) * | 2004-12-16 | 2010-12-15 | 日新電機株式会社 | コーティング装置 |
US20070240982A1 (en) * | 2005-10-17 | 2007-10-18 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | Arc ion plating apparatus |
JP2010095745A (ja) * | 2008-10-15 | 2010-04-30 | Sumitomo Electric Ind Ltd | 成膜方法及び成膜装置 |
CN102002679A (zh) * | 2010-12-20 | 2011-04-06 | 天津乾谕电子有限公司 | 真空镀膜的自转式工架机构 |
JP2012224878A (ja) * | 2011-04-15 | 2012-11-15 | Nissan Motor Co Ltd | 蒸着装置用ワーク移動機構とこれを用いた蒸着方法 |
-
2013
- 2013-03-19 JP JP2013056771A patent/JP6000173B2/ja active Active
-
2014
- 2014-03-03 EP EP14769428.5A patent/EP2977485B1/en active Active
- 2014-03-03 WO PCT/JP2014/001143 patent/WO2014147979A1/ja active Application Filing
- 2014-03-03 BR BR112015024142-5A patent/BR112015024142B1/pt active IP Right Grant
- 2014-03-03 ES ES14769428T patent/ES2727323T3/es active Active
- 2014-03-03 KR KR1020157029192A patent/KR20150126701A/ko not_active Application Discontinuation
- 2014-03-03 PT PT14769428T patent/PT2977485T/pt unknown
- 2014-03-03 CN CN201480016804.9A patent/CN105051247B/zh active Active
- 2014-03-03 MX MX2015011420A patent/MX2015011420A/es active IP Right Grant
- 2014-03-03 US US14/768,519 patent/US20160002769A1/en not_active Abandoned
- 2014-03-14 TW TW103109645A patent/TWI522486B/zh active
Also Published As
Publication number | Publication date |
---|---|
JP6000173B2 (ja) | 2016-09-28 |
TWI522486B (zh) | 2016-02-21 |
MX2015011420A (es) | 2016-02-03 |
JP2014181385A (ja) | 2014-09-29 |
CN105051247A (zh) | 2015-11-11 |
ES2727323T3 (es) | 2019-10-15 |
US20160002769A1 (en) | 2016-01-07 |
BR112015024142A2 (pt) | 2017-07-18 |
KR20150126701A (ko) | 2015-11-12 |
EP2977485B1 (en) | 2019-05-08 |
WO2014147979A1 (ja) | 2014-09-25 |
EP2977485A1 (en) | 2016-01-27 |
TW201439348A (zh) | 2014-10-16 |
EP2977485A4 (en) | 2017-01-04 |
CN105051247B (zh) | 2018-05-18 |
BR112015024142B1 (pt) | 2021-08-03 |
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