PL69869B1 - - Google Patents

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Publication number
PL69869B1
PL69869B1 PL1970140363A PL14036370A PL69869B1 PL 69869 B1 PL69869 B1 PL 69869B1 PL 1970140363 A PL1970140363 A PL 1970140363A PL 14036370 A PL14036370 A PL 14036370A PL 69869 B1 PL69869 B1 PL 69869B1
Authority
PL
Poland
Prior art keywords
mask
semiconductor wafer
holder
parallel
carriage
Prior art date
Application number
PL1970140363A
Other languages
English (en)
Polish (pl)
Original Assignee
Veb Elektromat
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Veb Elektromat filed Critical Veb Elektromat
Publication of PL69869B1 publication Critical patent/PL69869B1/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
    • H10P72/57—Mask-wafer alignment

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PL1970140363A 1969-05-05 1970-05-02 PL69869B1 (enExample)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD13960169A DD80779A1 (enExample) 1969-05-05 1969-05-05

Publications (1)

Publication Number Publication Date
PL69869B1 true PL69869B1 (enExample) 1973-10-31

Family

ID=5481173

Family Applications (1)

Application Number Title Priority Date Filing Date
PL1970140363A PL69869B1 (enExample) 1969-05-05 1970-05-02

Country Status (6)

Country Link
DD (1) DD80779A1 (enExample)
DE (1) DE2009307C3 (enExample)
FR (1) FR2042416B1 (enExample)
GB (1) GB1286793A (enExample)
PL (1) PL69869B1 (enExample)
SU (1) SU398067A3 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3674368A (en) * 1970-05-11 1972-07-04 Johannsmeier Karl Heinz Out of contact optical alignment and exposure apparatus
FR2507695B1 (fr) * 1981-06-12 1986-05-23 Marchal Equip Auto Distributeur de courant haute tension, notamment pour un allumage de moteur a combustion interne
AT406100B (de) * 1996-08-08 2000-02-25 Thallner Erich Kontaktbelichtungsverfahren zur herstellung von halbleiterbausteinen
US7578642B2 (en) 2005-08-05 2009-08-25 The Boeing Corporation Flexible single rail drilling system
CN117572732A (zh) * 2024-01-16 2024-02-20 上海图双精密装备有限公司 调平辅助装置及调平方法

Also Published As

Publication number Publication date
DD80779A1 (enExample) 1971-03-20
DE2009307A1 (de) 1970-11-19
GB1286793A (en) 1972-08-23
DE2009307C3 (de) 1974-06-27
FR2042416B1 (enExample) 1974-06-14
FR2042416A1 (enExample) 1971-02-12
SU398067A3 (enExample) 1973-09-17
DE2009307B2 (de) 1973-11-29

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