PL390896A1 - Sposób wytwarzania kryształów, zwłaszcza węglika krzemu, z fazy gazowej - Google Patents
Sposób wytwarzania kryształów, zwłaszcza węglika krzemu, z fazy gazowejInfo
- Publication number
- PL390896A1 PL390896A1 PL390896A PL39089610A PL390896A1 PL 390896 A1 PL390896 A1 PL 390896A1 PL 390896 A PL390896 A PL 390896A PL 39089610 A PL39089610 A PL 39089610A PL 390896 A1 PL390896 A1 PL 390896A1
- Authority
- PL
- Poland
- Prior art keywords
- seed
- gas phase
- chamber
- gas
- crystals
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/12—Substrate holders or susceptors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Przedmiotem wynalazku jest sposób wytwarzania kryształów, zwłaszcza krzemu, z fazy gazowej, mających zastosowanie w elektronice wysokich mocy i optoelektronice jako materiały na podłoża pod struktury specjalne. Sposób polega na tym, że monokrystaliczną zaródź (1) w postaci płytki, zamocowaną w pierścieniu (3) z wysokiej czystości grafitu tak, że tylko jej krawędź styka się bezpośrednio z pierścieniem (3), umieszcza się w górnej części komory wzrostu (6), wypełnionej gazem obojętnym lub zapewniającym domieszkowanie kryształu, z naniesionym na jej dnie materiałem źródłowym (5), po czym zaródź (1) podgrzewa się do temperatury krystalizacji w warunkach wysokiego ciśnienia gazu wypełniającego komorę (6), zaś wyższą temperaturę w dolnej części komory (6) utrzymuje się przy zachowaniu różnicy temperatur między materiałem źródłowym (5) a zarodzią (1) w zakresie 50-300°C.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL390896A PL234396B1 (pl) | 2010-04-01 | 2010-04-01 | Sposób wytwarzania kryształów, zwłaszcza węglika krzemu, z fazy gazowej |
EP11159952.8A EP2371997B1 (en) | 2010-04-01 | 2011-03-28 | Method for manufacturing crystals of silicon carbide from gaseous phase |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL390896A PL234396B1 (pl) | 2010-04-01 | 2010-04-01 | Sposób wytwarzania kryształów, zwłaszcza węglika krzemu, z fazy gazowej |
Publications (2)
Publication Number | Publication Date |
---|---|
PL390896A1 true PL390896A1 (pl) | 2011-10-10 |
PL234396B1 PL234396B1 (pl) | 2020-02-28 |
Family
ID=44084055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL390896A PL234396B1 (pl) | 2010-04-01 | 2010-04-01 | Sposób wytwarzania kryształów, zwłaszcza węglika krzemu, z fazy gazowej |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP2371997B1 (pl) |
PL (1) | PL234396B1 (pl) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8860040B2 (en) | 2012-09-11 | 2014-10-14 | Dow Corning Corporation | High voltage power semiconductor devices on SiC |
US9018639B2 (en) | 2012-10-26 | 2015-04-28 | Dow Corning Corporation | Flat SiC semiconductor substrate |
US9738991B2 (en) | 2013-02-05 | 2017-08-22 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a supporting shelf which permits thermal expansion |
US9017804B2 (en) | 2013-02-05 | 2015-04-28 | Dow Corning Corporation | Method to reduce dislocations in SiC crystal growth |
US9797064B2 (en) | 2013-02-05 | 2017-10-24 | Dow Corning Corporation | Method for growing a SiC crystal by vapor deposition onto a seed crystal provided on a support shelf which permits thermal expansion |
US8940614B2 (en) | 2013-03-15 | 2015-01-27 | Dow Corning Corporation | SiC substrate with SiC epitaxial film |
US9279192B2 (en) | 2014-07-29 | 2016-03-08 | Dow Corning Corporation | Method for manufacturing SiC wafer fit for integration with power device manufacturing technology |
PL238539B1 (pl) * | 2015-03-25 | 2021-09-06 | Instytut Tech Materialow Elektronicznych | Sposób wytwarzania kryształów węglika krzemu |
RU2633909C1 (ru) * | 2016-12-23 | 2017-10-19 | Федеральное государственное автономное образовательное учреждение высшего образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" им. В.И. Ульянова (Ленина)" (СПбГЭТУ "ЛЭТИ") | СПОСОБ ПОЛУЧЕНИЯ МОНОКРИСТАЛЛИЧЕСКОГО SiC |
CN111593407B (zh) * | 2020-05-25 | 2021-12-17 | 北京北方华创微电子装备有限公司 | 碳化硅生长方法 |
RU2768938C1 (ru) * | 2021-10-14 | 2022-03-25 | Санкт-Петербургский государственный электротехнический университет ЛЭТИ им. В.И. Ульянова (Ленина) | Способ получения монокристаллического SiC политипа 4H |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0637353B2 (ja) * | 1988-04-13 | 1994-05-18 | 新日本製鐵株式会社 | 炭化珪素単結晶成長方法および装置 |
DE50006005D1 (de) * | 1999-07-07 | 2004-05-13 | Siemens Ag | Keimkristallhalter mit seitlicher einfassung eines sic-keimkristalls |
JP4880164B2 (ja) * | 2000-02-15 | 2012-02-22 | ザ フォックス グループ,インコーポレイティド | 低欠陥密度炭化ケイ素材料 |
JP4275308B2 (ja) * | 2000-12-28 | 2009-06-10 | 株式会社デンソー | 炭化珪素単結晶の製造方法およびその製造装置 |
US7316747B2 (en) | 2002-06-24 | 2008-01-08 | Cree, Inc. | Seeded single crystal silicon carbide growth and resulting crystals |
US7601441B2 (en) * | 2002-06-24 | 2009-10-13 | Cree, Inc. | One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer |
US20090053125A1 (en) * | 2007-08-20 | 2009-02-26 | Il-Vi Incorporated | Stabilizing 4H Polytype During Sublimation Growth Of SiC Single Crystals |
-
2010
- 2010-04-01 PL PL390896A patent/PL234396B1/pl unknown
-
2011
- 2011-03-28 EP EP11159952.8A patent/EP2371997B1/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP2371997A1 (en) | 2011-10-05 |
PL234396B1 (pl) | 2020-02-28 |
EP2371997B1 (en) | 2017-01-11 |
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