PL3178887T3 - Krzemionka hydrofobowa do kompozycji tonera elektrofotograficznego - Google Patents
Krzemionka hydrofobowa do kompozycji tonera elektrofotograficznegoInfo
- Publication number
- PL3178887T3 PL3178887T3 PL15198652T PL15198652T PL3178887T3 PL 3178887 T3 PL3178887 T3 PL 3178887T3 PL 15198652 T PL15198652 T PL 15198652T PL 15198652 T PL15198652 T PL 15198652T PL 3178887 T3 PL3178887 T3 PL 3178887T3
- Authority
- PL
- Poland
- Prior art keywords
- hydrophobic silica
- toner composition
- electrophotographic toner
- electrophotographic
- composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09725—Silicon-oxides; Silicates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/0821—Developers with toner particles characterised by physical parameters
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
- C01B33/187—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by acidic treatment of silicates
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3063—Treatment with low-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3081—Treatment with organo-silicon compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/0802—Preparation methods
- G03G9/0815—Post-treatment
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/0819—Developers with toner particles characterised by the dimensions of the particles
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G9/00—Developers
- G03G9/08—Developers with toner particles
- G03G9/097—Plasticisers; Charge controlling agents
- G03G9/09708—Inorganic compounds
- G03G9/09716—Inorganic compounds treated with organic compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/30—Particle morphology extending in three dimensions
- C01P2004/32—Spheres
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/54—Particles characterised by their aspect ratio, i.e. the ratio of sizes in the longest to the shortest dimension
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/80—Compositional purity
- C01P2006/82—Compositional purity water content
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Developing Agents For Electrophotography (AREA)
- Silicon Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP15198652.8A EP3178887B1 (en) | 2015-12-09 | 2015-12-09 | Hydrophobic silica for electrophotographic toner composition |
Publications (1)
Publication Number | Publication Date |
---|---|
PL3178887T3 true PL3178887T3 (pl) | 2018-11-30 |
Family
ID=54838265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL15198652T PL3178887T3 (pl) | 2015-12-09 | 2015-12-09 | Krzemionka hydrofobowa do kompozycji tonera elektrofotograficznego |
Country Status (12)
Country | Link |
---|---|
US (1) | US10222717B2 (pl) |
EP (1) | EP3178887B1 (pl) |
JP (1) | JP7026436B2 (pl) |
KR (1) | KR20170068394A (pl) |
CN (1) | CN106986347A (pl) |
ES (1) | ES2685825T3 (pl) |
HU (1) | HUE039680T2 (pl) |
MY (1) | MY171326A (pl) |
PL (1) | PL3178887T3 (pl) |
PT (1) | PT3178887T (pl) |
TR (1) | TR201811754T4 (pl) |
TW (1) | TWI744263B (pl) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102351824B1 (ko) * | 2019-11-28 | 2022-01-14 | 창원대학교 산학협력단 | 실란커플링제를 이용한 실리카 표면 개질방법 |
KR20240076801A (ko) | 2021-09-24 | 2024-05-30 | 에보니크 오퍼레이션즈 게엠베하 | 서브미크론 표면-개질된 금속 산화물 입자 |
CN114149182B (zh) * | 2021-11-30 | 2022-08-09 | 中国地质大学(武汉) | 一种pH响应超润湿性切换表面及其制备方法和应用 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58132757A (ja) | 1982-02-03 | 1983-08-08 | Konishiroku Photo Ind Co Ltd | 静電荷像現像剤及び画像形成方法 |
JPS5934539A (ja) | 1982-08-23 | 1984-02-24 | Canon Inc | 正荷電性現像剤 |
JPH04340972A (ja) * | 1991-05-17 | 1992-11-27 | Minolta Camera Co Ltd | 静電荷像現像用トナー |
US5989768A (en) * | 1997-03-06 | 1999-11-23 | Cabot Corporation | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
JP3056122B2 (ja) | 1997-05-09 | 2000-06-26 | 花王株式会社 | 非磁性一成分用フルカラートナー |
JP4343378B2 (ja) * | 1999-02-22 | 2009-10-14 | キヤノン株式会社 | トナーの製造方法、及び画像形成方法 |
JP4390994B2 (ja) | 2000-09-27 | 2009-12-24 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、それを用いた画像形成方法及び画像形成装置 |
JP3891265B2 (ja) * | 2001-11-30 | 2007-03-14 | 信越化学工業株式会社 | 疎水性シリカ微粉末及びその製造方法 |
JP3983234B2 (ja) * | 2004-08-16 | 2007-09-26 | 電気化学工業株式会社 | トナー外添材の製造方法 |
JP4347201B2 (ja) * | 2004-11-30 | 2009-10-21 | 信越化学工業株式会社 | 静電荷像現像用トナー外添剤およびトナー |
KR101302646B1 (ko) * | 2005-07-04 | 2013-09-03 | 닛산 가가쿠 고교 가부시키 가이샤 | 소수성 실리카 분말의 제조방법 |
DE102007035951A1 (de) * | 2007-07-30 | 2009-02-05 | Evonik Degussa Gmbh | Oberflächenmodifizierte, pyrogen hergestellte Kieselsäuren |
JP5504600B2 (ja) * | 2008-10-01 | 2014-05-28 | 日本アエロジル株式会社 | 疎水性シリカ微粒子及び電子写真用トナー組成物 |
US20110244382A1 (en) * | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
JP5739223B2 (ja) * | 2011-05-13 | 2015-06-24 | 日本アエロジル株式会社 | 疎水性シリカ微粒子の製造方法 |
JP5790337B2 (ja) * | 2011-09-01 | 2015-10-07 | 富士ゼロックス株式会社 | シリカ粒子、及び、トナー |
US9023575B2 (en) * | 2012-09-14 | 2015-05-05 | Canon Kabushiki Kaisha | Toner and method for producing toner |
JP2014114175A (ja) * | 2012-12-06 | 2014-06-26 | Shin Etsu Chem Co Ltd | 表面疎水化球状シリカ微粒子、その製造方法及びそれを用いた静電荷像現像用トナー外添剤 |
-
2015
- 2015-12-09 TR TR2018/11754T patent/TR201811754T4/tr unknown
- 2015-12-09 PT PT15198652T patent/PT3178887T/pt unknown
- 2015-12-09 ES ES15198652.8T patent/ES2685825T3/es active Active
- 2015-12-09 HU HUE15198652A patent/HUE039680T2/hu unknown
- 2015-12-09 PL PL15198652T patent/PL3178887T3/pl unknown
- 2015-12-09 EP EP15198652.8A patent/EP3178887B1/en active Active
-
2016
- 2016-11-23 US US15/359,758 patent/US10222717B2/en active Active
- 2016-12-06 TW TW105140266A patent/TWI744263B/zh not_active IP Right Cessation
- 2016-12-06 MY MYPI2016704525A patent/MY171326A/en unknown
- 2016-12-08 KR KR1020160166584A patent/KR20170068394A/ko not_active Application Discontinuation
- 2016-12-08 CN CN201611120777.7A patent/CN106986347A/zh active Pending
- 2016-12-09 JP JP2016239286A patent/JP7026436B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
TR201811754T4 (tr) | 2018-09-21 |
TWI744263B (zh) | 2021-11-01 |
ES2685825T3 (es) | 2018-10-11 |
EP3178887A1 (en) | 2017-06-14 |
JP7026436B2 (ja) | 2022-02-28 |
HUE039680T2 (hu) | 2019-01-28 |
KR20170068394A (ko) | 2017-06-19 |
US20170168409A1 (en) | 2017-06-15 |
US10222717B2 (en) | 2019-03-05 |
EP3178887B1 (en) | 2018-06-20 |
PT3178887T (pt) | 2018-10-11 |
MY171326A (en) | 2019-10-09 |
TW201736262A (zh) | 2017-10-16 |
JP2017124965A (ja) | 2017-07-20 |
CN106986347A (zh) | 2017-07-28 |
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