NO903374L - Trykkplate. - Google Patents

Trykkplate.

Info

Publication number
NO903374L
NO903374L NO90903374A NO903374A NO903374L NO 903374 L NO903374 L NO 903374L NO 90903374 A NO90903374 A NO 90903374A NO 903374 A NO903374 A NO 903374A NO 903374 L NO903374 L NO 903374L
Authority
NO
Norway
Prior art keywords
radiation
component
silane compound
pressure plate
sensitive
Prior art date
Application number
NO90903374A
Other languages
English (en)
Norwegian (no)
Other versions
NO903374D0 (no
Inventor
John Robert Wade
Michael John Pratt
Robert Alexander Wal Johnstone
David Ian Smith
Original Assignee
Du Pont Howson Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont Howson Ltd filed Critical Du Pont Howson Ltd
Publication of NO903374D0 publication Critical patent/NO903374D0/no
Publication of NO903374L publication Critical patent/NO903374L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Laminated Bodies (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Secondary Cells (AREA)
  • Polishing Bodies And Polishing Tools (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Light Receiving Elements (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Electromagnets (AREA)
  • Silicon Polymers (AREA)
  • Dc Digital Transmission (AREA)
  • Radio Transmission System (AREA)
  • Control Of Charge By Means Of Generators (AREA)
NO90903374A 1989-09-12 1990-07-31 Trykkplate. NO903374L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB898920622A GB8920622D0 (en) 1989-09-12 1989-09-12 Improvements in or relating to lithographic printing plates

Publications (2)

Publication Number Publication Date
NO903374D0 NO903374D0 (no) 1990-07-31
NO903374L true NO903374L (no) 1991-03-13

Family

ID=10662949

Family Applications (1)

Application Number Title Priority Date Filing Date
NO90903374A NO903374L (no) 1989-09-12 1990-07-31 Trykkplate.

Country Status (15)

Country Link
US (1) US5550001A (ja)
EP (1) EP0419018B1 (ja)
JP (1) JP3080644B2 (ja)
AT (1) ATE172798T1 (ja)
AU (1) AU6009590A (ja)
BR (1) BR9004520A (ja)
CA (1) CA2022604A1 (ja)
DE (1) DE69032719T2 (ja)
ES (1) ES2125852T3 (ja)
FI (1) FI904337A0 (ja)
GB (1) GB8920622D0 (ja)
IE (1) IE902807A1 (ja)
NO (1) NO903374L (ja)
NZ (1) NZ234729A (ja)
ZA (1) ZA906360B (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999052018A1 (en) * 1998-04-07 1999-10-14 Euv Limited Liability Corporation Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths
WO2002004552A1 (en) * 2000-07-06 2002-01-17 Commonwealth Scientific And Industrial Research Organisation A process for modifying the surface of a substrate containing a polymeric material by means of vaporising the surface modifying agent
JP2002160141A (ja) * 2000-11-27 2002-06-04 Mori Seiki Co Ltd 工作機械の冷却装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3924520A (en) * 1974-06-27 1975-12-09 Hercules Inc Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups
JPS57205740A (en) * 1981-06-15 1982-12-16 Toray Ind Inc Method for fixing negative type lithographic plate requiring no dampening water
US5215867A (en) * 1983-09-16 1993-06-01 At&T Bell Laboratories Method with gas functionalized plasma developed layer
JPS60169852A (ja) * 1984-02-14 1985-09-03 Fuji Photo Film Co Ltd 湿し水不要ネガ型感光性平版印刷版の製版法
US4981909A (en) * 1985-03-19 1991-01-01 International Business Machines Corporation Plasma-resistant polymeric material, preparation thereof, and use thereof
US4613398A (en) * 1985-06-06 1986-09-23 International Business Machines Corporation Formation of etch-resistant resists through preferential permeation
US4931351A (en) * 1987-01-12 1990-06-05 Eastman Kodak Company Bilayer lithographic process
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
DE3811242A1 (de) * 1988-04-02 1989-10-19 Hoechst Ag Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen
US5108875A (en) * 1988-07-29 1992-04-28 Shipley Company Inc. Photoresist pattern fabrication employing chemically amplified metalized material

Also Published As

Publication number Publication date
IE902807A1 (en) 1991-03-27
DE69032719T2 (de) 1999-04-22
EP0419018A3 (en) 1992-05-06
ZA906360B (en) 1991-06-26
US5550001A (en) 1996-08-27
JP3080644B2 (ja) 2000-08-28
GB8920622D0 (en) 1989-10-25
ATE172798T1 (de) 1998-11-15
AU6009590A (en) 1991-03-21
NZ234729A (en) 1992-10-28
ES2125852T3 (es) 1999-03-16
DE69032719D1 (de) 1998-12-03
FI904337A0 (fi) 1990-09-03
CA2022604A1 (en) 1991-03-13
EP0419018B1 (en) 1998-10-28
BR9004520A (pt) 1991-09-10
JPH03107159A (ja) 1991-05-07
NO903374D0 (no) 1990-07-31
EP0419018A2 (en) 1991-03-27

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