ES2125852T3 - Perfeccionamientos en, o relativos a, planchas de impresion litografica. - Google Patents
Perfeccionamientos en, o relativos a, planchas de impresion litografica.Info
- Publication number
- ES2125852T3 ES2125852T3 ES90308550T ES90308550T ES2125852T3 ES 2125852 T3 ES2125852 T3 ES 2125852T3 ES 90308550 T ES90308550 T ES 90308550T ES 90308550 T ES90308550 T ES 90308550T ES 2125852 T3 ES2125852 T3 ES 2125852T3
- Authority
- ES
- Spain
- Prior art keywords
- radiation
- lithographic printing
- component
- printing plates
- silane compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Developing Agents For Electrophotography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Secondary Cells (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Radio Transmission System (AREA)
- Control Of Charge By Means Of Generators (AREA)
- Dc Digital Transmission (AREA)
- Light Receiving Elements (AREA)
- Silicon Polymers (AREA)
- Electromagnets (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
UNA PLACA SENSIBLE A LA RADIACION COMPRENDE UN SUSTRATO REVESTIDO CON UNA COMPOSICION SENSIBLE A LA RADIACION, INCLUYENDO UN COMPONENTE QUE TIENE GRUPOS QUE IMPARTEN SOLUBILIDAD EN SOLUCIONES ACUOSAS, Y UN COMPONENTE QUE TIENE GRUPOS FUNCIONALES, CAPACES DE REACCIONAR CON UN COMPUESTO DE SILANO. LA SUPERFICIE DE LA COMPOSICION SE MODIFICA MEDIANTE LA REACCION CON UN COMPUESTO DE SILANO. LA PLACA DA ORIGEN A IMAGENES DE RECEPTIVIDAD PERFECCIONADA DE TINTA, Y PUEDE REVELARSE CON LIQUIDOS REVELADORES ACUOSOS DESPUES DE LA EXPOSICION DE LA IMAGEN.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB898920622A GB8920622D0 (en) | 1989-09-12 | 1989-09-12 | Improvements in or relating to lithographic printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2125852T3 true ES2125852T3 (es) | 1999-03-16 |
Family
ID=10662949
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES90308550T Expired - Lifetime ES2125852T3 (es) | 1989-09-12 | 1990-08-03 | Perfeccionamientos en, o relativos a, planchas de impresion litografica. |
Country Status (15)
Country | Link |
---|---|
US (1) | US5550001A (es) |
EP (1) | EP0419018B1 (es) |
JP (1) | JP3080644B2 (es) |
AT (1) | ATE172798T1 (es) |
AU (1) | AU6009590A (es) |
BR (1) | BR9004520A (es) |
CA (1) | CA2022604A1 (es) |
DE (1) | DE69032719T2 (es) |
ES (1) | ES2125852T3 (es) |
FI (1) | FI904337A0 (es) |
GB (1) | GB8920622D0 (es) |
IE (1) | IE902807A1 (es) |
NO (1) | NO903374L (es) |
NZ (1) | NZ234729A (es) |
ZA (1) | ZA906360B (es) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999052018A1 (en) * | 1998-04-07 | 1999-10-14 | Euv Limited Liability Corporation | Thin layer imaging process for microlithography using radiation at strongly attenuated wavelengths |
WO2002004552A1 (en) * | 2000-07-06 | 2002-01-17 | Commonwealth Scientific And Industrial Research Organisation | A process for modifying the surface of a substrate containing a polymeric material by means of vaporising the surface modifying agent |
JP2002160141A (ja) * | 2000-11-27 | 2002-06-04 | Mori Seiki Co Ltd | 工作機械の冷却装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3924520A (en) * | 1974-06-27 | 1975-12-09 | Hercules Inc | Preparing lithographic plates utilizing vinyl monomers containing hydrolyzable silane groups |
JPS57205740A (en) * | 1981-06-15 | 1982-12-16 | Toray Ind Inc | Method for fixing negative type lithographic plate requiring no dampening water |
US5215867A (en) * | 1983-09-16 | 1993-06-01 | At&T Bell Laboratories | Method with gas functionalized plasma developed layer |
JPS60169852A (ja) * | 1984-02-14 | 1985-09-03 | Fuji Photo Film Co Ltd | 湿し水不要ネガ型感光性平版印刷版の製版法 |
US4981909A (en) * | 1985-03-19 | 1991-01-01 | International Business Machines Corporation | Plasma-resistant polymeric material, preparation thereof, and use thereof |
US4613398A (en) * | 1985-06-06 | 1986-09-23 | International Business Machines Corporation | Formation of etch-resistant resists through preferential permeation |
US4931351A (en) * | 1987-01-12 | 1990-06-05 | Eastman Kodak Company | Bilayer lithographic process |
US4808511A (en) * | 1987-05-19 | 1989-02-28 | International Business Machines Corporation | Vapor phase photoresist silylation process |
DE3811242A1 (de) * | 1988-04-02 | 1989-10-19 | Hoechst Ag | Im waessrigem alkali loesliche, silanylgruppen in der seitenkette enthaltende bindemittel, verfahren zu deren herstellung sowie lichtempfindliches gemisch, enthaltend diese verbindungen |
US5108875A (en) * | 1988-07-29 | 1992-04-28 | Shipley Company Inc. | Photoresist pattern fabrication employing chemically amplified metalized material |
-
1989
- 1989-09-12 GB GB898920622A patent/GB8920622D0/en active Pending
-
1990
- 1990-07-31 NO NO90903374A patent/NO903374L/no unknown
- 1990-07-31 NZ NZ234729A patent/NZ234729A/en unknown
- 1990-08-01 AU AU60095/90A patent/AU6009590A/en not_active Abandoned
- 1990-08-02 CA CA002022604A patent/CA2022604A1/en not_active Abandoned
- 1990-08-03 IE IE280790A patent/IE902807A1/en unknown
- 1990-08-03 AT AT90308550T patent/ATE172798T1/de not_active IP Right Cessation
- 1990-08-03 EP EP90308550A patent/EP0419018B1/en not_active Expired - Lifetime
- 1990-08-03 ES ES90308550T patent/ES2125852T3/es not_active Expired - Lifetime
- 1990-08-03 DE DE69032719T patent/DE69032719T2/de not_active Expired - Fee Related
- 1990-08-10 ZA ZA906360A patent/ZA906360B/xx unknown
- 1990-09-03 FI FI904337A patent/FI904337A0/fi not_active Application Discontinuation
- 1990-09-11 JP JP02241046A patent/JP3080644B2/ja not_active Expired - Fee Related
- 1990-09-11 BR BR909004520A patent/BR9004520A/pt unknown
-
1994
- 1994-05-05 US US08/238,581 patent/US5550001A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
NO903374L (no) | 1991-03-13 |
IE902807A1 (en) | 1991-03-27 |
DE69032719D1 (de) | 1998-12-03 |
EP0419018B1 (en) | 1998-10-28 |
NZ234729A (en) | 1992-10-28 |
ATE172798T1 (de) | 1998-11-15 |
JPH03107159A (ja) | 1991-05-07 |
DE69032719T2 (de) | 1999-04-22 |
GB8920622D0 (en) | 1989-10-25 |
JP3080644B2 (ja) | 2000-08-28 |
NO903374D0 (no) | 1990-07-31 |
CA2022604A1 (en) | 1991-03-13 |
BR9004520A (pt) | 1991-09-10 |
US5550001A (en) | 1996-08-27 |
AU6009590A (en) | 1991-03-21 |
EP0419018A2 (en) | 1991-03-27 |
FI904337A0 (fi) | 1990-09-03 |
ZA906360B (en) | 1991-06-26 |
EP0419018A3 (en) | 1992-05-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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