NO893084L - Vandig fremkallerblanding for fotoresistmaterialer. - Google Patents

Vandig fremkallerblanding for fotoresistmaterialer.

Info

Publication number
NO893084L
NO893084L NO89893084A NO893084A NO893084L NO 893084 L NO893084 L NO 893084L NO 89893084 A NO89893084 A NO 89893084A NO 893084 A NO893084 A NO 893084A NO 893084 L NO893084 L NO 893084L
Authority
NO
Norway
Prior art keywords
photoresist materials
developer mixing
developer
mixing
photoresist
Prior art date
Application number
NO89893084A
Other languages
English (en)
Norwegian (no)
Other versions
NO893084D0 (no
Inventor
Paul L K Hung
Kenneth K S Tseng
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of NO893084D0 publication Critical patent/NO893084D0/no
Publication of NO893084L publication Critical patent/NO893084L/no

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/42—Developers or their precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
NO89893084A 1988-07-28 1989-07-28 Vandig fremkallerblanding for fotoresistmaterialer. NO893084L (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22544988A 1988-07-28 1988-07-28

Publications (2)

Publication Number Publication Date
NO893084D0 NO893084D0 (no) 1989-07-28
NO893084L true NO893084L (no) 1990-01-29

Family

ID=22844911

Family Applications (1)

Application Number Title Priority Date Filing Date
NO89893084A NO893084L (no) 1988-07-28 1989-07-28 Vandig fremkallerblanding for fotoresistmaterialer.

Country Status (11)

Country Link
EP (1) EP0353878A1 (ko)
JP (1) JPH0285861A (ko)
KR (1) KR910006197B1 (ko)
CN (1) CN1039904A (ko)
AU (1) AU3671589A (ko)
BR (1) BR8903684A (ko)
DK (1) DK371189A (ko)
ES (1) ES2012287A6 (ko)
FI (1) FI892577A (ko)
IL (1) IL89372A0 (ko)
NO (1) NO893084L (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen

Also Published As

Publication number Publication date
AU3671589A (en) 1990-02-01
BR8903684A (pt) 1990-03-13
KR900002122A (ko) 1990-02-28
IL89372A0 (en) 1989-09-10
JPH0285861A (ja) 1990-03-27
KR910006197B1 (ko) 1991-08-16
ES2012287A6 (es) 1990-03-01
CN1039904A (zh) 1990-02-21
DK371189A (da) 1990-01-29
FI892577A0 (fi) 1989-05-26
EP0353878A1 (en) 1990-02-07
NO893084D0 (no) 1989-07-28
FI892577A (fi) 1990-01-29
DK371189D0 (da) 1989-07-27

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