DK371189D0 - Fremkaldermateriale til fremkaldelse af loddemetalmasker og dets anvendelse - Google Patents

Fremkaldermateriale til fremkaldelse af loddemetalmasker og dets anvendelse

Info

Publication number
DK371189D0
DK371189D0 DK371189A DK371189A DK371189D0 DK 371189 D0 DK371189 D0 DK 371189D0 DK 371189 A DK371189 A DK 371189A DK 371189 A DK371189 A DK 371189A DK 371189 D0 DK371189 D0 DK 371189D0
Authority
DK
Denmark
Prior art keywords
preparation
weld metal
metal masks
procedural
materials
Prior art date
Application number
DK371189A
Other languages
English (en)
Other versions
DK371189A (da
Inventor
Paul Ling Kong Hung
Kenneth Kuo Sho Tseng
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of DK371189D0 publication Critical patent/DK371189D0/da
Publication of DK371189A publication Critical patent/DK371189A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/42—Developers or their precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Detergent Compositions (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
DK371189A 1988-07-28 1989-07-27 Fremkaldermateriale til fremkaldelse af loddemetalmasker og dets anvendelse DK371189A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22544988A 1988-07-28 1988-07-28

Publications (2)

Publication Number Publication Date
DK371189D0 true DK371189D0 (da) 1989-07-27
DK371189A DK371189A (da) 1990-01-29

Family

ID=22844911

Family Applications (1)

Application Number Title Priority Date Filing Date
DK371189A DK371189A (da) 1988-07-28 1989-07-27 Fremkaldermateriale til fremkaldelse af loddemetalmasker og dets anvendelse

Country Status (11)

Country Link
EP (1) EP0353878A1 (da)
JP (1) JPH0285861A (da)
KR (1) KR910006197B1 (da)
CN (1) CN1039904A (da)
AU (1) AU3671589A (da)
BR (1) BR8903684A (da)
DK (1) DK371189A (da)
ES (1) ES2012287A6 (da)
FI (1) FI892577A (da)
IL (1) IL89372A0 (da)
NO (1) NO893084L (da)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen

Also Published As

Publication number Publication date
DK371189A (da) 1990-01-29
JPH0285861A (ja) 1990-03-27
CN1039904A (zh) 1990-02-21
KR910006197B1 (ko) 1991-08-16
NO893084L (no) 1990-01-29
KR900002122A (ko) 1990-02-28
NO893084D0 (no) 1989-07-28
BR8903684A (pt) 1990-03-13
IL89372A0 (en) 1989-09-10
ES2012287A6 (es) 1990-03-01
FI892577A (fi) 1990-01-29
EP0353878A1 (en) 1990-02-07
FI892577A0 (fi) 1989-05-26
AU3671589A (en) 1990-02-01

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment