FI892577A0 - Vattenhaltig framkallarkomposition foer med loesningsmedel framkallbara fotoresistbelaeggningar. - Google Patents

Vattenhaltig framkallarkomposition foer med loesningsmedel framkallbara fotoresistbelaeggningar.

Info

Publication number
FI892577A0
FI892577A0 FI892577A FI892577A FI892577A0 FI 892577 A0 FI892577 A0 FI 892577A0 FI 892577 A FI892577 A FI 892577A FI 892577 A FI892577 A FI 892577A FI 892577 A0 FI892577 A0 FI 892577A0
Authority
FI
Finland
Prior art keywords
photoresistbelaeggningar
ballet
framing
framework composition
medical requirements
Prior art date
Application number
FI892577A
Other languages
English (en)
Other versions
FI892577A (fi
Inventor
Paul L K Hung
Kenneth K S Tseng
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of FI892577A0 publication Critical patent/FI892577A0/fi
Publication of FI892577A publication Critical patent/FI892577A/fi

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/005Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/42Developers or their precursors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers
    • G03F7/325Non-aqueous compositions
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/32Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
FI892577A 1988-07-28 1989-05-26 Vattenhaltig framkallarkomposition foer med loesningsmedel framkallbara fotoresistbelaeggningar. FI892577A (fi)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22544988A 1988-07-28 1988-07-28

Publications (2)

Publication Number Publication Date
FI892577A0 true FI892577A0 (fi) 1989-05-26
FI892577A FI892577A (fi) 1990-01-29

Family

ID=22844911

Family Applications (1)

Application Number Title Priority Date Filing Date
FI892577A FI892577A (fi) 1988-07-28 1989-05-26 Vattenhaltig framkallarkomposition foer med loesningsmedel framkallbara fotoresistbelaeggningar.

Country Status (11)

Country Link
EP (1) EP0353878A1 (fi)
JP (1) JPH0285861A (fi)
KR (1) KR910006197B1 (fi)
CN (1) CN1039904A (fi)
AU (1) AU3671589A (fi)
BR (1) BR8903684A (fi)
DK (1) DK371189A (fi)
ES (1) ES2012287A6 (fi)
FI (1) FI892577A (fi)
IL (1) IL89372A0 (fi)
NO (1) NO893084L (fi)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen

Also Published As

Publication number Publication date
NO893084L (no) 1990-01-29
AU3671589A (en) 1990-02-01
BR8903684A (pt) 1990-03-13
KR900002122A (ko) 1990-02-28
IL89372A0 (en) 1989-09-10
JPH0285861A (ja) 1990-03-27
KR910006197B1 (ko) 1991-08-16
ES2012287A6 (es) 1990-03-01
CN1039904A (zh) 1990-02-21
DK371189A (da) 1990-01-29
EP0353878A1 (en) 1990-02-07
NO893084D0 (no) 1989-07-28
FI892577A (fi) 1990-01-29
DK371189D0 (da) 1989-07-27

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Legal Events

Date Code Title Description
FD Application lapsed

Owner name: M & T CHEMICALS, INC.