BR8903684A - Composicao reveladora para revelar revestimentos de mascara de solda,concentrado de composicao reveladora e processo para revelar revestimentos de mascara de solda nao expostos - Google Patents

Composicao reveladora para revelar revestimentos de mascara de solda,concentrado de composicao reveladora e processo para revelar revestimentos de mascara de solda nao expostos

Info

Publication number
BR8903684A
BR8903684A BR898903684A BR8903684A BR8903684A BR 8903684 A BR8903684 A BR 8903684A BR 898903684 A BR898903684 A BR 898903684A BR 8903684 A BR8903684 A BR 8903684A BR 8903684 A BR8903684 A BR 8903684A
Authority
BR
Brazil
Prior art keywords
welding mask
developing composition
mask coatings
unveiling
unexposed
Prior art date
Application number
BR898903684A
Other languages
English (en)
Inventor
Paul Ling Kong Hung
Kenneth Kuo Sho Tseng
Original Assignee
M & T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc
Publication of BR8903684A publication Critical patent/BR8903684A/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
    • G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
    • G03C1/42—Developers or their precursors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Detergent Compositions (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
BR898903684A 1988-07-28 1989-07-25 Composicao reveladora para revelar revestimentos de mascara de solda,concentrado de composicao reveladora e processo para revelar revestimentos de mascara de solda nao expostos BR8903684A (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22544988A 1988-07-28 1988-07-28

Publications (1)

Publication Number Publication Date
BR8903684A true BR8903684A (pt) 1990-03-13

Family

ID=22844911

Family Applications (1)

Application Number Title Priority Date Filing Date
BR898903684A BR8903684A (pt) 1988-07-28 1989-07-25 Composicao reveladora para revelar revestimentos de mascara de solda,concentrado de composicao reveladora e processo para revelar revestimentos de mascara de solda nao expostos

Country Status (11)

Country Link
EP (1) EP0353878A1 (pt)
JP (1) JPH0285861A (pt)
KR (1) KR910006197B1 (pt)
CN (1) CN1039904A (pt)
AU (1) AU3671589A (pt)
BR (1) BR8903684A (pt)
DK (1) DK371189A (pt)
ES (1) ES2012287A6 (pt)
FI (1) FI892577A (pt)
IL (1) IL89372A0 (pt)
NO (1) NO893084L (pt)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3908764C2 (de) * 1989-03-17 1994-08-11 Basf Ag Entwickler für die Herstellung photopolymerisierter flexographischer Reliefdruckformen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3019105A (en) * 1957-02-28 1962-01-30 Harris Intertype Corp Treatment of diazo-sensitized lithographic plates
DE3600116A1 (de) * 1986-01-04 1987-07-09 Basf Ag Verfahren zur herstellung von durch photopolymerisation vernetzten reliefformen

Also Published As

Publication number Publication date
NO893084L (no) 1990-01-29
AU3671589A (en) 1990-02-01
KR900002122A (ko) 1990-02-28
IL89372A0 (en) 1989-09-10
JPH0285861A (ja) 1990-03-27
KR910006197B1 (ko) 1991-08-16
ES2012287A6 (es) 1990-03-01
CN1039904A (zh) 1990-02-21
DK371189A (da) 1990-01-29
FI892577A0 (fi) 1989-05-26
EP0353878A1 (en) 1990-02-07
NO893084D0 (no) 1989-07-28
FI892577A (fi) 1990-01-29
DK371189D0 (da) 1989-07-27

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