NO812436L - Fremgangsmaate ved fremstilling av et optisk belegg - Google Patents
Fremgangsmaate ved fremstilling av et optisk beleggInfo
- Publication number
- NO812436L NO812436L NO812436A NO812436A NO812436L NO 812436 L NO812436 L NO 812436L NO 812436 A NO812436 A NO 812436A NO 812436 A NO812436 A NO 812436A NO 812436 L NO812436 L NO 812436L
- Authority
- NO
- Norway
- Prior art keywords
- plasma
- deposition
- carbon
- voltage
- substrate
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 18
- 230000003287 optical effect Effects 0.000 title description 8
- 238000004519 manufacturing process Methods 0.000 title description 3
- 238000000576 coating method Methods 0.000 claims description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 229910052799 carbon Inorganic materials 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 239000004215 Carbon black (E152) Substances 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 11
- 229930195733 hydrocarbon Natural products 0.000 claims description 11
- 150000002430 hydrocarbons Chemical class 0.000 claims description 11
- 238000000151 deposition Methods 0.000 claims description 8
- 230000008021 deposition Effects 0.000 claims description 8
- 238000005137 deposition process Methods 0.000 claims description 8
- 238000001771 vacuum deposition Methods 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 13
- 239000000463 material Substances 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000001273 butane Substances 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2001—Maintaining constant desired temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/332—Coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/338—Changing chemical properties of treated surfaces
- H01J2237/3385—Carburising
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8023435 | 1980-07-17 | ||
| GB8118713 | 1981-06-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NO812436L true NO812436L (no) | 1984-08-24 |
Family
ID=26276256
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NO812436A NO812436L (no) | 1980-07-17 | 1981-07-15 | Fremgangsmaate ved fremstilling av et optisk belegg |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US4444805A (de) |
| DE (1) | DE3128022A1 (de) |
| FR (1) | FR2518581B3 (de) |
| IT (1) | IT1144745B (de) |
| NL (1) | NL8103333A (de) |
| NO (1) | NO812436L (de) |
| SE (1) | SE8104410L (de) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0142176A1 (de) * | 1983-10-24 | 1985-05-22 | George Gergely Merkl | Kubischer Kohlenstoff |
| US4645713A (en) * | 1985-01-25 | 1987-02-24 | Agency Of Industrial Science & Technology | Method for forming conductive graphite film and film formed thereby |
| US4626447A (en) * | 1985-03-18 | 1986-12-02 | Energy Conversion Devices, Inc. | Plasma confining apparatus |
| US4603082A (en) * | 1985-04-29 | 1986-07-29 | Rca Corporation | Diamond-like film |
| GB2175016B (en) * | 1985-05-11 | 1990-01-24 | Barr & Stroud Ltd | Optical coating |
| DE3630419A1 (de) * | 1986-09-06 | 1988-03-10 | Kernforschungsanlage Juelich | Verfahren zur beschichtung von hoher waermebelastung ausgesetzten bauelementen mit einer amorphen wasserstoffhaltigen kohlenstoffschicht |
| DE3630418C1 (de) * | 1986-09-06 | 1987-12-17 | Kernforschungsanlage Juelich | Verfahren zur Beschichtung von Werkstuecken mit amorphem,wasserstoffhaltigem Kohlenstoff |
| DE3719616A1 (de) * | 1987-06-12 | 1988-12-29 | Leybold Ag | Verfahren und vorrichtung zur beschichtung eines substrats |
| US5283087A (en) * | 1988-02-05 | 1994-02-01 | Semiconductor Energy Laboratory Co., Ltd. | Plasma processing method and apparatus |
| US4994298A (en) * | 1988-06-07 | 1991-02-19 | Biogold Inc. | Method of making a biocompatible prosthesis |
| US4992298A (en) * | 1988-10-11 | 1991-02-12 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
| US5055318A (en) * | 1988-10-11 | 1991-10-08 | Beamalloy Corporation | Dual ion beam ballistic alloying process |
| CA2065581C (en) | 1991-04-22 | 2002-03-12 | Andal Corp. | Plasma enhancement apparatus and method for physical vapor deposition |
| GB9420089D0 (en) * | 1994-10-05 | 1994-11-16 | Applied Vision Ltd | Coatings for optical lens having low surface energy properties |
| DE19819414A1 (de) * | 1998-04-30 | 1999-11-04 | Leybold Ag | Für ein Kunststoffsubstrat bestimmtes Schichtpaket und Verfahren zum Erzeugen eines solchen Schichtpaketes |
| US8545995B2 (en) * | 2009-12-14 | 2013-10-01 | Lawrence Livermore National Security, Llc. | Systems having optical absorption layer for mid and long wave infrared and methods for making the same |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3776762A (en) * | 1971-10-18 | 1973-12-04 | Kote Corp Du | Dry lubrication |
| US3961103A (en) * | 1972-07-12 | 1976-06-01 | Space Sciences, Inc. | Film deposition |
| US4170662A (en) * | 1974-11-05 | 1979-10-09 | Eastman Kodak Company | Plasma plating |
| GB1582231A (en) * | 1976-08-13 | 1981-01-07 | Nat Res Dev | Application of a layer of carbonaceous material to a surface |
| CH634424A5 (fr) * | 1978-08-18 | 1983-01-31 | Nat Res Dev | Procede et appareil de detection et de commande de depot d'une pellicule fine. |
| JPS5846057B2 (ja) * | 1979-03-19 | 1983-10-14 | 富士通株式会社 | プラズマ処理方法 |
-
1981
- 1981-06-22 US US06/276,259 patent/US4444805A/en not_active Expired - Lifetime
- 1981-07-14 NL NL8103333A patent/NL8103333A/nl not_active Application Discontinuation
- 1981-07-15 NO NO812436A patent/NO812436L/no unknown
- 1981-07-16 FR FR8113844A patent/FR2518581B3/fr not_active Expired
- 1981-07-16 DE DE19813128022 patent/DE3128022A1/de not_active Withdrawn
- 1981-07-16 SE SE8104410A patent/SE8104410L/xx unknown
- 1981-07-17 IT IT67986/81A patent/IT1144745B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| IT8167986A0 (it) | 1981-07-17 |
| US4444805A (en) | 1984-04-24 |
| NL8103333A (nl) | 1983-04-05 |
| FR2518581A1 (de) | 1983-06-24 |
| FR2518581B3 (de) | 1984-09-07 |
| DE3128022A1 (de) | 1984-01-26 |
| IT1144745B (it) | 1986-10-29 |
| SE8104410L (sv) | 1983-08-02 |
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