NO341687B1 - Passiveringssabel på en solcelle av krystallinsk silisium - Google Patents
Passiveringssabel på en solcelle av krystallinsk silisiumInfo
- Publication number
- NO341687B1 NO341687B1 NO20131549A NO20131549A NO341687B1 NO 341687 B1 NO341687 B1 NO 341687B1 NO 20131549 A NO20131549 A NO 20131549A NO 20131549 A NO20131549 A NO 20131549A NO 341687 B1 NO341687 B1 NO 341687B1
- Authority
- NO
- Norway
- Prior art keywords
- crystalline silicon
- layer
- solar cell
- silicon solar
- passivation
- Prior art date
Links
- 229910021419 crystalline silicon Inorganic materials 0.000 title abstract 7
- 238000002161 passivation Methods 0.000 title abstract 2
- -1 silica nitride Chemical class 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 3
- 239000000377 silicon dioxide Substances 0.000 abstract 3
- 238000000151 deposition Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000003989 dielectric material Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/308—Oxynitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02041—Cleaning
- H01L21/02057—Cleaning during device manufacture
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02126—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
- H01L21/0214—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material containing Si, O, and at least one of H, N, C, F, or other non-metal elements, e.g. SiOC, SiOC:H or SiONC the material being a silicon oxynitride, e.g. SiON or SiON:H
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
- H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
- H01L21/02301—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment in-situ cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
- H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Sustainable Development (AREA)
- Life Sciences & Earth Sciences (AREA)
- Sustainable Energy (AREA)
- Crystallography & Structural Chemistry (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Inorganic Chemistry (AREA)
- Photovoltaic Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Formation Of Insulating Films (AREA)
Abstract
Det beskrives en fremgangsmåte for fremstilling av en passiveringsstabel på en solcelleanordning (1) av krystallinsk silisium, fremgangsmåten omfatter trinnene med: - tilveiebringelse av et substrat omfattende et lag (2) av krystallinsk silisium, så som en wafer eller chip av krystallinsk silisium; - rensing av en overflate (21, 23) av laget (2) av krystallinsk silisium ved fjerning av et oksidlag i det minste fra et parti av én side av laget (2) av krystallinsk silisium; - avsetting av, på i det minste en del av den rensede overflaten (21, 23), et lag av silisiumoksynitrid (3); og - avsetting av et dekklag (5) omfattende et hydrert dielektrisk materiale oppå laget av silisiumoksynitrid (3), hvor laget av silisiumoksynitrid (3) avsettes ved en temperatur mellom 100 °C og 200 °C, fortrinnsvis mellom 100 °C og 150 °C, og enda mer foretrukket mellom 100 °C og 130 °C. Det beskrives også en solcelleanordning av krystallinsk silisium som kan fremskaffes ved hjelp av en fremgangsmåte i henhold til oppfinnelsen.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20131549A NO341687B1 (no) | 2013-11-19 | 2013-11-19 | Passiveringssabel på en solcelle av krystallinsk silisium |
US15/037,163 US9660130B2 (en) | 2013-11-19 | 2014-11-19 | Passivation stack on a crystalline silicon solar cell |
EP14864819.9A EP3072165B1 (en) | 2013-11-19 | 2014-11-19 | Method for the manufacture of a passivation stack on a crystalline silicon solar cell |
PCT/NO2014/050215 WO2015076678A1 (en) | 2013-11-19 | 2014-11-19 | Passivation stack on a crystalline silicon solar cell |
CN201480063181.0A CN105745768B (zh) | 2013-11-19 | 2014-11-19 | 晶体硅太阳能电池上的钝化堆叠件 |
MYPI2016701768A MY173674A (en) | 2013-11-19 | 2014-11-19 | Passivation stack on a crystalline silicon solar cell |
JP2016533099A JP2017504186A (ja) | 2013-11-19 | 2014-11-19 | 結晶シリコン太陽電池上のパッシベーションスタック |
US15/494,064 US9978902B2 (en) | 2013-11-19 | 2017-04-21 | Passivation stack on a crystalline silicon solar cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
NO20131549A NO341687B1 (no) | 2013-11-19 | 2013-11-19 | Passiveringssabel på en solcelle av krystallinsk silisium |
Publications (2)
Publication Number | Publication Date |
---|---|
NO20131549A1 NO20131549A1 (no) | 2015-05-20 |
NO341687B1 true NO341687B1 (no) | 2017-12-18 |
Family
ID=50030409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20131549A NO341687B1 (no) | 2013-11-19 | 2013-11-19 | Passiveringssabel på en solcelle av krystallinsk silisium |
Country Status (7)
Country | Link |
---|---|
US (1) | US9660130B2 (no) |
EP (1) | EP3072165B1 (no) |
JP (1) | JP2017504186A (no) |
CN (1) | CN105745768B (no) |
MY (1) | MY173674A (no) |
NO (1) | NO341687B1 (no) |
WO (1) | WO2015076678A1 (no) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR3059463B1 (fr) * | 2016-11-30 | 2018-12-07 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Structure et procede de passivation. |
KR101846444B1 (ko) | 2017-01-13 | 2018-04-06 | 엘지전자 주식회사 | 태양 전지 |
KR102053912B1 (ko) * | 2017-09-01 | 2019-12-09 | 주식회사 한화 | 계면 특성이 향상된 perc 솔라셀, 솔라셀 제조 방법 및 제조 장치 |
CN109950363A (zh) * | 2019-03-29 | 2019-06-28 | 山西潞安太阳能科技有限责任公司 | 一种perc太阳能电池的背面钝化工艺 |
CN110854243B (zh) * | 2019-12-31 | 2024-03-22 | 太仓市哲泰天产品设计有限公司 | 一种氮氧化硅perc背钝化方法及钝化炉 |
CN111416013A (zh) * | 2020-05-02 | 2020-07-14 | 熵熠(上海)能源科技有限公司 | 一种以氢化非晶氮氧化硅薄膜为钝化层的异质结太阳电池 |
CN112382696B (zh) * | 2020-10-15 | 2022-05-10 | 山西潞安太阳能科技有限责任公司 | 一种新型晶硅SiON双面电池背钝化工艺 |
CN115036375B (zh) * | 2021-02-23 | 2023-03-24 | 浙江晶科能源有限公司 | 太阳能电池及其制作方法、太阳能组件 |
CN117038744A (zh) * | 2021-09-06 | 2023-11-10 | 上海晶科绿能企业管理有限公司 | 太阳能电池及光伏组件 |
CN114883453B (zh) * | 2022-06-17 | 2023-03-28 | 意诚新能(苏州)科技有限公司 | 一种双面多层钝化膜、制备方法及晶硅太阳能电池 |
CN118198200A (zh) * | 2024-05-14 | 2024-06-14 | 金阳(泉州)新能源科技有限公司 | 一种背接触电池的制作方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2185626A (en) * | 1986-01-16 | 1987-07-22 | Rca Corp | Silicon oxynitride passivated semiconductor body and method of making same |
EP1304748A2 (de) * | 2001-10-19 | 2003-04-23 | RWE Solar GmbH | Verfahren zur Herstellung einer Solarzelle |
US20090056800A1 (en) * | 2005-04-14 | 2009-03-05 | Renewable Energy Corporation Asa | Surface Passivation of Silicon Based Wafers |
US20110284068A1 (en) * | 2010-04-23 | 2011-11-24 | Solexel, Inc. | Passivation methods and apparatus for achieving ultra-low surface recombination velocities for high-efficiency solar cells |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006140282A (ja) * | 2004-11-11 | 2006-06-01 | Sharp Corp | 結晶シリコン太陽電池の製造方法 |
US20080179762A1 (en) * | 2007-01-25 | 2008-07-31 | Au Optronics Corporation | Layered structure with laser-induced aggregation silicon nano-dots in a silicon-rich dielectric layer, and applications of the same |
US20120000512A1 (en) * | 2009-01-27 | 2012-01-05 | Miho Shimizu | Solar Cell And Method For Manufacturing Solar Cell |
JP5334645B2 (ja) * | 2009-03-31 | 2013-11-06 | 富士フイルム株式会社 | 可撓性太陽電池モジュール |
GB2471128A (en) | 2009-06-18 | 2010-12-22 | Rec Solar As | Surface passivation of silicon wafers |
DE102011086351A1 (de) * | 2011-11-15 | 2013-05-16 | International Solar Energy Research Center Konstanz E.V. | Verfahren zur Herstellung einer Solarzelle mit PECVD-Kombinationsschicht und Solarzelle mit PECVD-Kombinationsschicht |
JP2013128077A (ja) * | 2011-12-19 | 2013-06-27 | Sharp Corp | 界面パッシベーション構造、裏面パッシベーション型太陽電池および界面パッシベーション構造の製造方法 |
-
2013
- 2013-11-19 NO NO20131549A patent/NO341687B1/no unknown
-
2014
- 2014-11-19 WO PCT/NO2014/050215 patent/WO2015076678A1/en active Application Filing
- 2014-11-19 EP EP14864819.9A patent/EP3072165B1/en active Active
- 2014-11-19 JP JP2016533099A patent/JP2017504186A/ja active Pending
- 2014-11-19 US US15/037,163 patent/US9660130B2/en active Active
- 2014-11-19 CN CN201480063181.0A patent/CN105745768B/zh active Active
- 2014-11-19 MY MYPI2016701768A patent/MY173674A/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2185626A (en) * | 1986-01-16 | 1987-07-22 | Rca Corp | Silicon oxynitride passivated semiconductor body and method of making same |
EP1304748A2 (de) * | 2001-10-19 | 2003-04-23 | RWE Solar GmbH | Verfahren zur Herstellung einer Solarzelle |
US20090056800A1 (en) * | 2005-04-14 | 2009-03-05 | Renewable Energy Corporation Asa | Surface Passivation of Silicon Based Wafers |
US20110284068A1 (en) * | 2010-04-23 | 2011-11-24 | Solexel, Inc. | Passivation methods and apparatus for achieving ultra-low surface recombination velocities for high-efficiency solar cells |
Also Published As
Publication number | Publication date |
---|---|
WO2015076678A1 (en) | 2015-05-28 |
US9660130B2 (en) | 2017-05-23 |
JP2017504186A (ja) | 2017-02-02 |
CN105745768B (zh) | 2017-11-24 |
EP3072165A4 (en) | 2017-09-06 |
NO20131549A1 (no) | 2015-05-20 |
CN105745768A (zh) | 2016-07-06 |
MY173674A (en) | 2020-02-14 |
EP3072165B1 (en) | 2020-07-01 |
US20160276519A1 (en) | 2016-09-22 |
EP3072165A1 (en) | 2016-09-28 |
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