NO322291B1 - Innretning for gassavfoling - Google Patents

Innretning for gassavfoling Download PDF

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Publication number
NO322291B1
NO322291B1 NO20005611A NO20005611A NO322291B1 NO 322291 B1 NO322291 B1 NO 322291B1 NO 20005611 A NO20005611 A NO 20005611A NO 20005611 A NO20005611 A NO 20005611A NO 322291 B1 NO322291 B1 NO 322291B1
Authority
NO
Norway
Prior art keywords
microstructure
layer
catalytic
conductive layer
channels
Prior art date
Application number
NO20005611A
Other languages
English (en)
Norwegian (no)
Other versions
NO20005611L (no
NO20005611D0 (no
Inventor
Ingemar Lundstrom
Per Martensson
Original Assignee
Appliedsensor Sweden Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Appliedsensor Sweden Ab filed Critical Appliedsensor Sweden Ab
Publication of NO20005611D0 publication Critical patent/NO20005611D0/no
Publication of NO20005611L publication Critical patent/NO20005611L/no
Publication of NO322291B1 publication Critical patent/NO322291B1/no

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/403Cells and electrode assemblies
    • G01N27/414Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Biochemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Molecular Biology (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
NO20005611A 1998-05-08 2000-11-07 Innretning for gassavfoling NO322291B1 (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
SE9801610A SE514042C2 (sv) 1998-05-08 1998-05-08 Sensoranordning
PCT/SE1999/000760 WO1999058964A1 (en) 1998-05-08 1999-05-06 Device for gas sensing

Publications (3)

Publication Number Publication Date
NO20005611D0 NO20005611D0 (no) 2000-11-07
NO20005611L NO20005611L (no) 2001-01-03
NO322291B1 true NO322291B1 (no) 2006-09-11

Family

ID=20411231

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20005611A NO322291B1 (no) 1998-05-08 2000-11-07 Innretning for gassavfoling

Country Status (7)

Country Link
US (1) US6569779B1 (enExample)
EP (1) EP1076816A1 (enExample)
JP (1) JP2002514760A (enExample)
AU (1) AU4305599A (enExample)
NO (1) NO322291B1 (enExample)
SE (1) SE514042C2 (enExample)
WO (1) WO1999058964A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6004835A (en) * 1997-04-25 1999-12-21 Micron Technology, Inc. Method of forming integrated circuitry, conductive lines, a conductive grid, a conductive network, an electrical interconnection to anode location and an electrical interconnection with a transistor source/drain region
EP1254478A4 (en) * 2000-01-19 2004-12-01 Adrena Inc CHEMICAL DETECTOR USING CHEMICALLY INDUCED ELECTRON HOLE PRODUCTION AT A SCHOTTKY BARRIER
US6903433B1 (en) 2000-01-19 2005-06-07 Adrena, Inc. Chemical sensor using chemically induced electron-hole production at a schottky barrier
US7274082B2 (en) 2000-01-19 2007-09-25 Adrena, Inc. Chemical sensor using chemically induced electron-hole production at a schottky barrier
EP1767934B1 (en) * 2005-09-21 2007-12-05 Adixen Sensistor AB Hydrogen gas sensitive semiconductor sensor
US10739299B2 (en) * 2017-03-14 2020-08-11 Roche Sequencing Solutions, Inc. Nanopore well structures and methods
KR102084734B1 (ko) * 2020-01-07 2020-03-04 주식회사 케이디 배수관로의 수위 및 유량 측정장치

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2857251A (en) 1953-01-28 1958-10-21 Atlantic Refining Co Process and dual-detector apparatus for analyzing gases
US3595621A (en) 1968-09-30 1971-07-27 Anthony John Andreatch Catalytic analyzer
US4169126A (en) 1976-09-03 1979-09-25 Johnson, Matthey & Co., Limited Temperature-responsive device
US4321322A (en) 1979-06-18 1982-03-23 Ahnell Joseph E Pulsed voltammetric detection of microorganisms
DE3151891A1 (de) 1981-12-30 1983-07-14 Zimmer, Günter, Dr.rer. nat., 4600 Dortmund Halbleiter-sensor fuer die messung der konzentration von teilchen in fluiden
CS231026B1 (en) 1982-09-27 1984-09-17 Lubomir Serak Method of voltmetric determination of oxygen and sensor to perform this method
CH665908A5 (de) 1983-08-30 1988-06-15 Cerberus Ag Vorrichtung zum selektiven detektieren der gasfoermigen bestandteile von gasgemischen in luft mittels eines gassensors.
US4897162A (en) 1986-11-14 1990-01-30 The Cleveland Clinic Foundation Pulse voltammetry
DE3729286A1 (de) 1987-09-02 1989-03-16 Draegerwerk Ag Messgeraet zur analyse eines gasgemisches
JPH0695082B2 (ja) 1987-10-08 1994-11-24 新コスモス電機株式会社 吸引式オゾンガス検知器
US5244656A (en) * 1990-05-04 1993-09-14 Wisconsin Alumni Research Foundation Antigen specific plasmacytomas and antibodies derived therefrom
NL9002750A (nl) 1990-12-13 1992-07-01 Imec Inter Uni Micro Electr Sensor van het diode type.
JPH05308107A (ja) * 1991-07-01 1993-11-19 Sumitomo Electric Ind Ltd 半導体装置及びその製作方法
JPH05240838A (ja) 1992-02-27 1993-09-21 Kagome Co Ltd 加工飲食品に含まれるジアセチルの測定方法
US5332681A (en) 1992-06-12 1994-07-26 The United States Of America As Represented By The Secretary Of The Navy Method of making a semiconductor device by forming a nanochannel mask
JP3496307B2 (ja) 1994-02-18 2004-02-09 株式会社デンソー 触媒劣化検知法及び空燃比センサ
SE503265C2 (sv) * 1994-09-23 1996-04-29 Forskarpatent Ab Förfarande och anordning för gasdetektion
US5753934A (en) * 1995-08-04 1998-05-19 Tok Corporation Multilayer thin film, substrate for electronic device, electronic device, and preparation of multilayer oxide thin film
JPH09229945A (ja) * 1996-02-23 1997-09-05 Canon Inc マイクロ構造体を支持するエアブリッジ型構造体の製造方法とその雌型基板、並びに、エアブリッジ型構造体とそれを用いたマイクロ構造体およびトンネル電流または微小力検出用のプローブ
US5691215A (en) 1996-08-26 1997-11-25 Industrial Technology Research Institute Method for fabricating a sub-half micron MOSFET device with insulator filled shallow trenches planarized via use of negative photoresist and de-focus exposure
GB9819821D0 (en) * 1998-09-12 1998-11-04 Secr Defence Improvements relating to micro-machining
US6284671B1 (en) * 1998-11-19 2001-09-04 National Research Council Of Canada Selective electrochemical process for creating semiconductor nano-and micro-patterns
SE524102C2 (sv) 1999-06-04 2004-06-29 Appliedsensor Sweden Ab Mikro-hotplate-anordning med integrerad gaskänslig fälteffektsensor

Also Published As

Publication number Publication date
WO1999058964A1 (en) 1999-11-18
NO20005611L (no) 2001-01-03
EP1076816A1 (en) 2001-02-21
AU4305599A (en) 1999-11-29
NO20005611D0 (no) 2000-11-07
SE514042C2 (sv) 2000-12-18
SE9801610D0 (sv) 1998-05-08
SE9801610L (sv) 1999-11-09
JP2002514760A (ja) 2002-05-21
US6569779B1 (en) 2003-05-27

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