NO20063066L - Anordning og fremgangsmate for avsetningen av ultrafine partikler fra gassfasen - Google Patents

Anordning og fremgangsmate for avsetningen av ultrafine partikler fra gassfasen

Info

Publication number
NO20063066L
NO20063066L NO20063066A NO20063066A NO20063066L NO 20063066 L NO20063066 L NO 20063066L NO 20063066 A NO20063066 A NO 20063066A NO 20063066 A NO20063066 A NO 20063066A NO 20063066 L NO20063066 L NO 20063066L
Authority
NO
Norway
Prior art keywords
gas
pressure vessel
reaction tube
collection cone
gas phase
Prior art date
Application number
NO20063066A
Other languages
English (en)
Inventor
Peter Adler
Wolfgang Pirzl
Raymund Sonnenschein
Original Assignee
Degussa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Degussa filed Critical Degussa
Publication of NO20063066L publication Critical patent/NO20063066L/no

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
    • B01J2219/00076—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements inside the reactor
    • B01J2219/00085—Plates; Jackets; Cylinders
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/00049—Controlling or regulating processes
    • B01J2219/00051—Controlling the temperature
    • B01J2219/00132—Controlling the temperature using electric heating or cooling elements
    • B01J2219/00135—Electric resistance heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0873—Materials to be treated
    • B01J2219/0875—Gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Filtering Materials (AREA)

Abstract

Den foreliggende oppfinnelsen angår en anordning for den termiske spaltningen av flyktige forbindelser og avsetning av partikler som slik er dannet, som minst omfatter de følgende kjennetegnende trekkene: et trykkar (1), minst ett reaksjonsrør (2), den åpne enden (2e) av denne strekker seg inn i trykkaret, og den andre enden av denne er plassert på utsiden av trykkaret og er utstyrt med en gassmater (3), lengdeaksen av reaksjonsrøret er orientert i tyngdekraftsretningen og parallell med lengdeaksen av trykkaret (1d), og reaksjonsrøret kan bli oppvarmet (2a) på gassinnløpssiden og kjølt (2b) på gassutløpssiden, trykkaret (1), i dens nedre del, har en oppsamlingskone (1a), den åpne enden av reaksjonsrøret(ene) (2c) strekker seg inn i gassrommet i oppsamlingskonen (1b), oppsamlingskonen (1a) er forbundet med en utløpslås (6) for pulver (P), og en gassutløpsenhet (7), som er utstyrt med en gasstyrer (7a), hvor gassinnløpsområdet (7b) av denne er i kommunikasjon med gassrommet (1b) i oppsamlingskonen (1a), et filtersystem (8) og et gassutløp (9), som er plassert på utsiden av trykkaret.
NO20063066A 2003-12-06 2006-06-30 Anordning og fremgangsmate for avsetningen av ultrafine partikler fra gassfasen NO20063066L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10357091A DE10357091A1 (de) 2003-12-06 2003-12-06 Vorrichtung und Verfahren zur Abscheidung feinster Partikel aus der Gasphase
PCT/EP2004/052523 WO2005054130A1 (en) 2003-12-06 2004-10-13 Device and process for the deposition of ultrafine particles from the gas phase

Publications (1)

Publication Number Publication Date
NO20063066L true NO20063066L (no) 2006-06-30

Family

ID=34638439

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20063066A NO20063066L (no) 2003-12-06 2006-06-30 Anordning og fremgangsmate for avsetningen av ultrafine partikler fra gassfasen

Country Status (11)

Country Link
US (1) US7799274B2 (no)
EP (1) EP1697040B1 (no)
JP (1) JP4357533B2 (no)
KR (1) KR101047842B1 (no)
CN (1) CN100457614C (no)
DE (1) DE10357091A1 (no)
ES (1) ES2425352T3 (no)
NO (1) NO20063066L (no)
RU (1) RU2377065C2 (no)
UA (1) UA85073C2 (no)
WO (1) WO2005054130A1 (no)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10357091A1 (de) 2003-12-06 2005-07-07 Degussa Ag Vorrichtung und Verfahren zur Abscheidung feinster Partikel aus der Gasphase
DE102004038717A1 (de) * 2004-08-10 2006-02-23 Joint Solar Silicon Gmbh & Co. Kg Herstellungsverfahren für Reaktor zur Zersetzung von Gasen
DE102005046105B3 (de) * 2005-09-27 2007-04-26 Degussa Gmbh Verfahren zur Herstellung von Monosilan
DE102006003464A1 (de) * 2006-01-25 2007-07-26 Degussa Gmbh Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung
NO329968B1 (no) 2007-08-17 2011-01-31 Silansil As Anordning og fremgangsmate for kompaktering av silisiumpulver
DE102007050199A1 (de) * 2007-10-20 2009-04-23 Evonik Degussa Gmbh Entfernung von Fremdmetallen aus anorganischen Silanen
KR101182485B1 (ko) 2011-04-26 2012-09-12 주식회사 예스윈 연속식 다단 스크루 방식의 열분해 반응기
CN103233088B (zh) * 2013-05-02 2015-05-20 莱芜钢铁集团有限公司 一种非真空条件下清洗积碳的方法
KR102317107B1 (ko) 2015-06-04 2021-10-25 크리티테크, 인크. 탁산 입자 및 그것의 용도
DE102017123985A1 (de) * 2017-10-16 2019-04-18 Karlsruher Institut für Technologie Reaktor für Reaktionen unter hohem oder niedrigem Druck
EP3864418A1 (en) * 2018-10-08 2021-08-18 Applied Photophysics Limited System and method for analysing the composition of a quenched flow reaction liquid
CN110526248B (zh) * 2019-09-12 2021-05-07 浙江中宁硅业有限公司 一种硅烷气相热分解制备高纯度纳米级硅粉的方法以及装置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE752280C (de) 1941-03-18 1953-05-26 Gustav Weissenberg Verfahren zur Darstellung von reinstem Silicium
US2488406A (en) * 1947-11-25 1949-11-15 Gulf Research Development Co Method and apparatus for conducting chemical reactions
DE1180346B (de) 1958-03-14 1964-10-29 Gustav Weissenberg Dr H C Dr H Verfahren zum Herstellen hochreiner Kristalle, insbesondere aus Halbleiterstoffen
US3012861A (en) * 1960-01-15 1961-12-12 Du Pont Production of silicon
US4676967A (en) 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4444811A (en) * 1980-03-03 1984-04-24 California Institute Of Technology Fluidized bed silicon deposition from silane
US4444881A (en) * 1981-10-26 1984-04-24 Cpc International Inc. Recovery of organic acids from a fermentation broth
US4642227A (en) * 1982-08-20 1987-02-10 California Institute Of Technology Reactor for producing large particles of materials from gases
US4684513A (en) * 1982-11-05 1987-08-04 Union Carbide Corporation Zone heating for fluidized bed silane pyrolysis
US4818495A (en) * 1982-11-05 1989-04-04 Union Carbide Corporation Reactor for fluidized bed silane decomposition
JPS605013A (ja) 1983-06-22 1985-01-11 Denki Kagaku Kogyo Kk シリコン粉末の製法及びその装置
US5421843A (en) * 1993-09-30 1995-06-06 Basf Corporation Apparatus for removing emissions
DE19654516C1 (de) 1996-12-27 1998-10-01 Degussa Verfahren zur Auftrennung des Produktgasgemisches der katalytischen Synthese von Methylmercaptan
DE10034493C1 (de) 2000-07-15 2001-11-29 Degussa Verfahren zur Herstellung von Organosilylalkylpolysulfanen
DE10243022A1 (de) 2002-09-17 2004-03-25 Degussa Ag Abscheidung eines Feststoffs durch thermische Zersetzung einer gasförmigen Substanz in einem Becherreaktor
DE10330022A1 (de) 2003-07-03 2005-01-20 Degussa Ag Verfahren zur Herstellung von Iow-k dielektrischen Filmen
DE10331952A1 (de) 2003-07-15 2005-02-10 Degussa Ag Vorrichtung und Verfahren zur diskontinuierlichen Polykondensation
DE10357091A1 (de) 2003-12-06 2005-07-07 Degussa Ag Vorrichtung und Verfahren zur Abscheidung feinster Partikel aus der Gasphase
DE102004008042A1 (de) 2004-02-19 2005-09-01 Goldschmidt Gmbh Verfahren zur Herstellung von Aminosäureestern und deren Säure-Additions-Salzen
DE102004038718A1 (de) 2004-08-10 2006-02-23 Joint Solar Silicon Gmbh & Co. Kg Reaktor sowie Verfahren zur Herstellung von Silizium

Also Published As

Publication number Publication date
RU2006123911A (ru) 2008-01-20
US7799274B2 (en) 2010-09-21
KR101047842B1 (ko) 2011-07-11
US20070110619A1 (en) 2007-05-17
UA85073C2 (ru) 2008-12-25
KR20060124611A (ko) 2006-12-05
JP4357533B2 (ja) 2009-11-04
JP2007512949A (ja) 2007-05-24
WO2005054130A1 (en) 2005-06-16
EP1697040A1 (en) 2006-09-06
CN100457614C (zh) 2009-02-04
RU2377065C2 (ru) 2009-12-27
CN1890176A (zh) 2007-01-03
DE10357091A1 (de) 2005-07-07
ES2425352T3 (es) 2013-10-14
EP1697040B1 (en) 2013-06-05

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