NO159995C - Fremgangsm te ved rensing av silicium. - Google Patents

Fremgangsm te ved rensing av silicium.

Info

Publication number
NO159995C
NO159995C NO841890A NO841890A NO159995C NO 159995 C NO159995 C NO 159995C NO 841890 A NO841890 A NO 841890A NO 841890 A NO841890 A NO 841890A NO 159995 C NO159995 C NO 159995C
Authority
NO
Norway
Prior art keywords
procedure
cleaning silicone
silicone
cleaning
Prior art date
Application number
NO841890A
Other languages
English (en)
Other versions
NO159995B (no
NO841890L (no
Inventor
Erich Bildl
Josef Dietl
Rolf Baueregger
Dieter Seifert
Original Assignee
Heliotronic Forsch Entwicklung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heliotronic Forsch Entwicklung filed Critical Heliotronic Forsch Entwicklung
Publication of NO841890L publication Critical patent/NO841890L/no
Publication of NO159995B publication Critical patent/NO159995B/no
Publication of NO159995C publication Critical patent/NO159995C/no

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/037—Purification

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Silicon Compounds (AREA)
NO841890A 1983-05-11 1984-05-10 Fremgangsm te ved rensing av silicium. NO159995C (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833317286 DE3317286A1 (de) 1983-05-11 1983-05-11 Verfahren zur reinigung von silicium durch saeureeinwirkung

Publications (3)

Publication Number Publication Date
NO841890L NO841890L (no) 1984-11-12
NO159995B NO159995B (no) 1988-11-21
NO159995C true NO159995C (no) 1989-03-01

Family

ID=6198782

Family Applications (1)

Application Number Title Priority Date Filing Date
NO841890A NO159995C (no) 1983-05-11 1984-05-10 Fremgangsm te ved rensing av silicium.

Country Status (6)

Country Link
US (1) US4588571A (no)
EP (1) EP0125630A3 (no)
CA (1) CA1240483A (no)
DE (1) DE3317286A1 (no)
ES (1) ES532360A0 (no)
NO (1) NO159995C (no)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4002327A1 (de) * 1990-01-26 1991-08-01 Wacker Chemitronic Verfahren zur nasschemischen behandlung von halbleiteroberflaechen und loesung zu seiner durchfuehrung
JPH05121390A (ja) * 1991-10-29 1993-05-18 Koujiyundo Silicon Kk 酸の除去方法
DE19529518A1 (de) * 1994-08-10 1996-02-15 Tokuyama Corp Polykristallines Silizium und Verfahren zu dessen Herstellung
DE19531031C2 (de) * 1995-08-23 1997-08-21 Ictop Entwicklungsgesellschaft Verfahren zum Trocknen von Silizium
US5714203A (en) * 1995-08-23 1998-02-03 Ictop Entwicklungs Gmbh Procedure for the drying of silicon
DE19618974A1 (de) * 1996-05-10 1997-11-13 Wacker Chemie Gmbh Verfahren zur Behandlung von Halbleitermaterial
US20050053540A1 (en) * 2002-01-18 2005-03-10 Norbert Auner Method for producing amorphous silicon and/or organohalosilanes produced therefrom
US8021483B2 (en) * 2002-02-20 2011-09-20 Hemlock Semiconductor Corporation Flowable chips and methods for the preparation and use of same, and apparatus for use in the methods
KR101119090B1 (ko) * 2004-06-24 2012-03-16 엘지전자 주식회사 식기 세척기의 이물 고착 방지장치 및 그 방법
US7270706B2 (en) * 2004-10-04 2007-09-18 Dow Corning Corporation Roll crusher to produce high purity polycrystalline silicon chips
WO2006094714A1 (de) 2005-03-05 2006-09-14 Joint Solar Silicon Gmbh & Co. Kg Reaktor und verfahren zur herstellung von silizium
WO2007112592A1 (en) * 2006-04-04 2007-10-11 6N Silicon Inc. Method for purifying silicon
DE102007040851A1 (de) * 2007-08-29 2009-03-05 Wacker Chemie Ag Verfahren zum Reinigen von polykristallinem Silicium
CA2700997A1 (en) 2007-10-03 2009-04-09 6N Silicon Inc. Method for processing silicon powder to obtain silicon crystals
DE102008055833A1 (de) * 2008-11-04 2010-05-12 Adensis Gmbh Verfahren zum Entfernen von feinteiligem Siliziummaterial aus einem Silizium-Mahlgut und Einrichtung zur Durchführung des Verfahrens
DE102009014562A1 (de) * 2009-03-16 2010-09-23 Schmid Silicon Technology Gmbh Aufreinigung von metallurgischem Silizium
DE102009016014B3 (de) * 2009-04-02 2010-09-30 Sunicon Ag Verfahren zur Gewinnung von reinem Silizium
DE102009046265A1 (de) * 2009-10-30 2011-05-19 Rheinisch-Westfälische Technische Hochschule Aachen Verfahren zur Aufarbeitung von Sägerückständen aus der Produktion von Silizium-Wafern
US8216539B2 (en) * 2010-04-14 2012-07-10 Calisolar, Inc. Cascading purification
CN102344144A (zh) * 2011-09-30 2012-02-08 巨锋 一种废晶体硅的自动酸碱清洗反应设备
DE102012213869A1 (de) * 2012-08-06 2014-02-06 Wacker Chemie Ag Polykristalline Siliciumbruchstücke und Verfahren zu deren Herstellung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH346532A (de) * 1956-01-19 1960-05-31 Lonza Ag Verfahren zur Herstellung von reinem Siliziummetall
US2973319A (en) * 1959-04-21 1961-02-28 Transvaal & Orange Free State Process of contacting liquids with solids
NO122241B (no) * 1970-05-04 1971-06-07 Spigerverk C
DE2722783A1 (de) * 1977-05-20 1978-11-30 Wacker Chemitronic Verfahren zum reinigen von silicium
DE2933164A1 (de) * 1979-08-16 1981-02-26 Consortium Elektrochem Ind Verfahren zum reinigen von rohsilicium
DE3236276A1 (de) * 1982-09-30 1984-04-05 Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen Neuer werkstoff aus silicium und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
US4588571A (en) 1986-05-13
DE3317286A1 (de) 1984-11-22
EP0125630A2 (de) 1984-11-21
NO159995B (no) 1988-11-21
NO841890L (no) 1984-11-12
ES8502660A1 (es) 1985-01-16
EP0125630A3 (de) 1988-03-02
ES532360A0 (es) 1985-01-16
CA1240483A (en) 1988-08-16

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