US3125532A
(en)
*
|
|
1964-03-17 |
|
Method of doping semiconductor |
US2862160A
(en)
*
|
1955-10-18 |
1958-11-25 |
Hoffmann Electronics Corp |
Light sensitive device and method of making the same
|
CA605440A
(en)
*
|
1955-11-03 |
1960-09-20 |
E. Pardue Turner |
Semiconductor devices and methods of making the same
|
NL215949A
(et)
*
|
1956-04-03 |
|
|
|
US2828232A
(en)
*
|
1956-05-01 |
1958-03-25 |
Hughes Aircraft Co |
Method for producing junctions in semi-conductor device
|
US2989670A
(en)
*
|
1956-06-19 |
1961-06-20 |
Texas Instruments Inc |
Transistor
|
US2938938A
(en)
*
|
1956-07-03 |
1960-05-31 |
Hoffman Electronics Corp |
Photo-voltaic semiconductor apparatus or the like
|
US3129338A
(en)
*
|
1957-01-30 |
1964-04-14 |
Rauland Corp |
Uni-junction coaxial transistor and circuitry therefor
|
BE565907A
(et)
*
|
1957-03-22 |
|
|
|
US3145328A
(en)
*
|
1957-04-29 |
1964-08-18 |
Raytheon Co |
Methods of preventing channel formation on semiconductive bodies
|
US2962394A
(en)
*
|
1957-06-20 |
1960-11-29 |
Motorola Inc |
Process for plating a silicon base semiconductive unit with nickel
|
US2998555A
(en)
*
|
1957-07-23 |
1961-08-29 |
Telefunken Gmbh |
Conductor connected to the alloying area of a crystalode, e. g., a transistor of the lloy type
|
US2983591A
(en)
*
|
1957-11-15 |
1961-05-09 |
Texas Instruments Inc |
Process and composition for etching semiconductor materials
|
US2882465A
(en)
*
|
1957-12-17 |
1959-04-14 |
Texas Instruments Inc |
Transistor
|
NL121250C
(et)
*
|
1958-01-16 |
|
|
|
NL237782A
(et)
*
|
1958-02-04 |
1900-01-01 |
|
|
US3065392A
(en)
*
|
1958-02-07 |
1962-11-20 |
Rca Corp |
Semiconductor devices
|
US2989424A
(en)
*
|
1958-03-31 |
1961-06-20 |
Westinghouse Electric Corp |
Method of providing an oxide protective coating for semiconductors
|
US3016313A
(en)
*
|
1958-05-15 |
1962-01-09 |
Gen Electric |
Semiconductor devices and methods of making the same
|
NL261580A
(et)
*
|
1958-06-14 |
1900-01-01 |
|
|
NL105824C
(et)
*
|
1958-06-26 |
|
|
|
US3019142A
(en)
*
|
1958-07-25 |
1962-01-30 |
Bendix Corp |
Semiconductor device
|
LU37521A1
(et)
*
|
1958-08-11 |
|
|
|
US3019614A
(en)
*
|
1958-09-04 |
1962-02-06 |
Gen Electric |
Dual temperature refrigeration
|
NL242264A
(et)
*
|
1958-09-20 |
1900-01-01 |
|
|
US3104991A
(en)
*
|
1958-09-23 |
1963-09-24 |
Raytheon Co |
Method of preparing semiconductor material
|
US3042565A
(en)
*
|
1959-01-02 |
1962-07-03 |
Sprague Electric Co |
Preparation of a moated mesa and related semiconducting devices
|
DE1071846B
(et)
*
|
1959-01-03 |
1959-12-24 |
|
|
GB921367A
(en)
*
|
1959-04-06 |
1963-03-20 |
Standard Telephones Cables Ltd |
Semiconductor device and method of manufacture
|
US3070466A
(en)
*
|
1959-04-30 |
1962-12-25 |
Ibm |
Diffusion in semiconductor material
|
US3210622A
(en)
*
|
1959-09-11 |
1965-10-05 |
Philips Corp |
Photo-transistor
|
US3041214A
(en)
*
|
1959-09-25 |
1962-06-26 |
Clevite Corp |
Method of forming junction semiconductive devices having thin layers
|
US3053926A
(en)
*
|
1959-12-14 |
1962-09-11 |
Int Rectifier Corp |
Silicon photoelectric cell
|
DE1232265B
(de)
*
|
1960-03-11 |
1967-01-12 |
Philips Patentverwaltung |
Verfahren zur Herstellung eines Legierungsdiffusionstransistors
|
US3172791A
(en)
*
|
1960-03-31 |
1965-03-09 |
|
Crystallography orientation of a cy-
lindrical rod of semiconductor mate-
rial in a vapor deposition process to
obtain a polygonal shaped rod |
DE1133038B
(de)
*
|
1960-05-10 |
1962-07-12 |
Siemens Ag |
Halbleiterbauelement mit einem im wesentlichen einkristallinen Halbleiterkoerper undvier Zonen abwechselnden Leitfaehigkeitstyps
|
US3175929A
(en)
*
|
1960-05-24 |
1965-03-30 |
Bell Telephone Labor Inc |
Solar energy converting apparatus
|
US3141849A
(en)
*
|
1960-07-04 |
1964-07-21 |
Wacker Chemie Gmbh |
Process for doping materials
|
US3035423A
(en)
*
|
1960-07-15 |
1962-05-22 |
Mendez Alfredo |
Booster for refrigerating systems
|
FR1276723A
(fr)
*
|
1960-10-11 |
1961-11-24 |
D Electroniques Et De Physique |
Perfectionnements aux procédés de fabrication de dispositifs photo-électriques semi-conducteurs et à de tels dispositifs
|
US3084079A
(en)
*
|
1960-10-13 |
1963-04-02 |
Pacific Semiconductors Inc |
Manufacture of semiconductor devices
|
DE1156384B
(de)
*
|
1960-12-23 |
1963-10-31 |
Wacker Chemie Gmbh |
Verfahren zum Dotieren von hochreinen Stoffen
|
US3046324A
(en)
*
|
1961-01-16 |
1962-07-24 |
Hoffman Electronics Corp |
Alloyed photovoltaic cell and method of making the same
|
NL99556C
(et)
*
|
1961-03-30 |
|
|
|
US3081370A
(en)
*
|
1961-07-17 |
1963-03-12 |
Raytheon Co |
Solar cells
|
DE1444521B2
(de)
*
|
1962-02-01 |
1971-02-25 |
Siemens AG, 1000 Berlin u 8000 München |
Verfahren zur herstellung einer halbleiteranordnung
|
US3411952A
(en)
*
|
1962-04-02 |
1968-11-19 |
Globe Union Inc |
Photovoltaic cell and solar cell panel
|
DE1211335B
(de)
*
|
1962-07-16 |
1966-02-24 |
Elektronik M B H |
Halbleiterbauelement mit mindestens einem pn-UEbergang und mit einer Oberflaechenschicht aus Siliziumoxyd und Verfahren zum Herstellen
|
JPS4018266Y1
(et)
*
|
1962-08-31 |
1965-06-28 |
|
|
US3204321A
(en)
*
|
1962-09-24 |
1965-09-07 |
Philco Corp |
Method of fabricating passivated mesa transistor without contamination of junctions
|
US3270255A
(en)
*
|
1962-10-17 |
1966-08-30 |
Hitachi Ltd |
Silicon rectifying junction structures for electric power and process of production thereof
|
BE639315A
(et)
*
|
1962-10-31 |
|
|
|
DE1241468B
(de)
*
|
1962-12-01 |
1967-06-01 |
Andrija Fuderer Dr Ing |
Kompressionsverfahren zur Kaelterzeugung
|
GB991263A
(en)
*
|
1963-02-15 |
1965-05-05 |
Standard Telephones Cables Ltd |
Improvements in or relating to semiconductor devices
|
US3255055A
(en)
*
|
1963-03-20 |
1966-06-07 |
Hoffman Electronics Corp |
Semiconductor device
|
US3421943A
(en)
*
|
1964-02-14 |
1969-01-14 |
Westinghouse Electric Corp |
Solar cell panel having cell edge and base metal electrical connections
|
US3359137A
(en)
*
|
1964-03-19 |
1967-12-19 |
Electro Optical Systems Inc |
Solar cell configuration
|
US3343049A
(en)
*
|
1964-06-18 |
1967-09-19 |
Ibm |
Semiconductor devices and passivation thereof
|
US3401448A
(en)
*
|
1964-06-22 |
1968-09-17 |
Globe Union Inc |
Process for making photosensitive semiconductor devices
|
US3371213A
(en)
*
|
1964-06-26 |
1968-02-27 |
Texas Instruments Inc |
Epitaxially immersed lens and photodetectors and methods of making same
|
US3436549A
(en)
*
|
1964-11-06 |
1969-04-01 |
Texas Instruments Inc |
P-n photocell epitaxially deposited on transparent substrate and method for making same
|
US3492174A
(en)
*
|
1966-03-19 |
1970-01-27 |
Sony Corp |
Method of making a semiconductor device
|
US3472698A
(en)
*
|
1967-05-18 |
1969-10-14 |
Nasa |
Silicon solar cell with cover glass bonded to cell by metal pattern
|
BE704470A
(et)
*
|
1967-09-29 |
1968-03-29 |
|
|
BE789331A
(fr)
*
|
1971-09-28 |
1973-01-15 |
Communications Satellite Corp |
Cellule solaire a geometrie fine
|
US3872682A
(en)
*
|
1974-03-18 |
1975-03-25 |
Northfield Freezing Systems In |
Closed system refrigeration or heat exchange
|
US3931056A
(en)
*
|
1974-08-26 |
1976-01-06 |
The Carborundum Company |
Solid diffusion sources for phosphorus doping containing silicon and zirconium pyrophosphates
|
US4151724A
(en)
*
|
1977-06-13 |
1979-05-01 |
Frick Company |
Pressurized refrigerant feed with recirculation for compound compression refrigeration systems
|
FR2412164A1
(fr)
*
|
1977-12-13 |
1979-07-13 |
Radiotechnique Compelec |
Procede de creation, par serigraphie, d'un contact a la surface d'un dispositif semi-conducteur et dispositif obtenu par ce procede
|
US4217760A
(en)
*
|
1978-07-20 |
1980-08-19 |
General Electric Company |
Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
|
US4218890A
(en)
*
|
1978-07-24 |
1980-08-26 |
General Electric Company |
Vapor compression cycle device with multi-component working fluid mixture and improved condensing heat exchanger
|
US4179898A
(en)
*
|
1978-07-31 |
1979-12-25 |
General Electric Company |
Vapor compression cycle device with multi-component working fluid mixture and method of modulating its capacity
|
US4416119A
(en)
*
|
1982-01-08 |
1983-11-22 |
Whirlpool Corporation |
Variable capacity binary refrigerant refrigeration apparatus
|
US4439996A
(en)
*
|
1982-01-08 |
1984-04-03 |
Whirlpool Corporation |
Binary refrigerant system with expansion valve control
|
US4416052A
(en)
*
|
1982-03-29 |
1983-11-22 |
General Dynamics, Convair Division |
Method of making a thin-film solar cell
|
GB2130793B
(en)
*
|
1982-11-22 |
1986-09-03 |
Gen Electric Co Plc |
Forming a doped region in a semiconductor body
|
US4580415A
(en)
*
|
1983-04-22 |
1986-04-08 |
Mitsubishi Denki Kabushiki Kaisha |
Dual refrigerant cooling system
|
US4490192A
(en)
*
|
1983-06-08 |
1984-12-25 |
Allied Corporation |
Stable suspensions of boron, phosphorus, antimony and arsenic dopants
|
US4913714A
(en)
*
|
1987-08-03 |
1990-04-03 |
Nippondenso Co., Ltd. |
Automotive air conditioner
|
US5237828A
(en)
*
|
1989-11-22 |
1993-08-24 |
Nippondenso Co., Ltd. |
Air-conditioner for an automobile with non-azeotropic refrigerant mixture used to generate "cool head" and "warm feet" profile
|
DK170189B1
(da)
*
|
1990-05-30 |
1995-06-06 |
Yakov Safir |
Fremgangsmåde til fremstilling af halvlederkomponenter, samt solcelle fremstillet deraf
|
DE19910816A1
(de)
*
|
1999-03-11 |
2000-10-05 |
Merck Patent Gmbh |
Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern
|
US7790574B2
(en)
*
|
2004-12-20 |
2010-09-07 |
Georgia Tech Research Corporation |
Boron diffusion in silicon devices
|
JP4868079B1
(ja)
*
|
2010-01-25 |
2012-02-01 |
日立化成工業株式会社 |
n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池セルの製造方法
|
JP5447397B2
(ja)
*
|
2010-02-03 |
2014-03-19 |
日立化成株式会社 |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池セルの製造方法
|
US20110195541A1
(en)
*
|
2010-02-05 |
2011-08-11 |
Hitachi Chemical Company, Ltd. |
Composition for forming n-type diffusion layer, method for forming n-type diffusion layer, and method for producing photovoltaic cell
|
US20110212564A1
(en)
*
|
2010-02-05 |
2011-09-01 |
Hitachi Chemical Company, Ltd. |
Method for producing photovoltaic cell
|
JP5626340B2
(ja)
*
|
2010-04-23 |
2014-11-19 |
日立化成株式会社 |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
|
CN102834898B
(zh)
*
|
2010-04-23 |
2016-06-15 |
日立化成工业株式会社 |
n型扩散层形成组成物、n型扩散层的制造方法及太阳能电池元件的制造方法
|
KR101484833B1
(ko)
*
|
2010-04-23 |
2015-01-21 |
히타치가세이가부시끼가이샤 |
n 형 확산층 형성 조성물, n 형 확산층의 제조 방법, 및 태양 전지 소자의 제조 방법
|
TWI483294B
(zh)
|
2010-04-23 |
2015-05-01 |
Hitachi Chemical Co Ltd |
形成n型擴散層的組成物、n型擴散層的製造方法及太陽電池元件的製造方法
|
CN102859659B
(zh)
|
2010-04-23 |
2017-07-28 |
日立化成工业株式会社 |
p型扩散层形成组合物、p型扩散层的制造方法和太阳能电池元件的制造方法
|
WO2011132782A1
(ja)
*
|
2010-04-23 |
2011-10-27 |
日立化成工業株式会社 |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP5803080B2
(ja)
*
|
2010-09-24 |
2015-11-04 |
日立化成株式会社 |
p型拡散層形成組成物、p型拡散層形成組成物の製造方法、p型拡散層の製造方法、及び太陽電池セルの製造方法
|
JPWO2012096018A1
(ja)
*
|
2011-01-13 |
2014-06-09 |
日立化成株式会社 |
p型拡散層形成組成物、p型拡散層の製造方法及び太陽電池素子の製造方法
|
CN103348449A
(zh)
*
|
2011-02-17 |
2013-10-09 |
日立化成株式会社 |
n型扩散层形成用组合物、n型扩散层的制造方法和太阳能电池单元的制造方法
|
JP2012231012A
(ja)
*
|
2011-04-26 |
2012-11-22 |
Hitachi Chem Co Ltd |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP2012234990A
(ja)
*
|
2011-05-02 |
2012-11-29 |
Hitachi Chem Co Ltd |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP2012234989A
(ja)
*
|
2011-05-02 |
2012-11-29 |
Hitachi Chem Co Ltd |
n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池素子の製造方法
|
US20150099352A1
(en)
*
|
2011-07-19 |
2015-04-09 |
Hitachi Chemical Company, Ltd. |
COMPOSITION FOR FORMING n-TYPE DIFFUSION LAYER, METHOD OF PRODUCING n-TYPE DIFFUSION LAYER, AND METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT
|
JP2013026343A
(ja)
*
|
2011-07-19 |
2013-02-04 |
Hitachi Chem Co Ltd |
p型拡散層の製造方法、太陽電池素子の製造方法、および太陽電池素子
|
JP2013026344A
(ja)
*
|
2011-07-19 |
2013-02-04 |
Hitachi Chem Co Ltd |
n型拡散層の製造方法、太陽電池素子の製造方法、および太陽電池素子
|
JP5935254B2
(ja)
*
|
2011-07-21 |
2016-06-15 |
日立化成株式会社 |
不純物拡散層形成組成物、不純物拡散層の製造方法、太陽電池素子の製造方法および太陽電池の製造方法
|
JP5842431B2
(ja)
*
|
2011-07-22 |
2016-01-13 |
日立化成株式会社 |
n型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP5842432B2
(ja)
*
|
2011-07-22 |
2016-01-13 |
日立化成株式会社 |
p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP5935255B2
(ja)
*
|
2011-07-22 |
2016-06-15 |
日立化成株式会社 |
インクジェット用不純物拡散層形成組成物、不純物拡散層の製造方法、太陽電池素子の製造方法及び太陽電池の製造方法
|
EP2728624A4
(en)
*
|
2011-07-25 |
2015-05-27 |
Hitachi Chemical Co Ltd |
SEMICONDUCTOR SUBSTRATE, MANUFACTURING METHOD, SOLAR CELL ELEMENT AND SOLAR CELL
|
CN104081499A
(zh)
*
|
2012-01-10 |
2014-10-01 |
日立化成株式会社 |
n型扩散层形成用组合物、n型扩散层形成用组合物套剂、带n型扩散层的半导体基板的制造方法、以及太阳能电池元件的制造方法
|
US20150107294A1
(en)
*
|
2013-10-22 |
2015-04-23 |
Panasonic Intellectual Property Management Co., Ltd. |
Refrigeration-cycle equipment
|
FR3035740B1
(fr)
*
|
2015-04-28 |
2017-05-12 |
Commissariat Energie Atomique |
Procede de fabrication d'une cellule photovoltaique.
|
JP2015179866A
(ja)
*
|
2015-05-25 |
2015-10-08 |
日立化成株式会社 |
p型拡散層形成組成物、並びに、太陽電池セルおよびその製造方法
|
JP2016006893A
(ja)
*
|
2015-08-03 |
2016-01-14 |
日立化成株式会社 |
n型拡散層形成組成物、n型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP2016021589A
(ja)
*
|
2015-09-14 |
2016-02-04 |
日立化成株式会社 |
p型拡散層形成組成物、p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP2016027665A
(ja)
*
|
2015-09-28 |
2016-02-18 |
日立化成株式会社 |
p型拡散層の製造方法、及び太陽電池素子の製造方法
|
JP2016036034A
(ja)
*
|
2015-09-28 |
2016-03-17 |
日立化成株式会社 |
n型拡散層の製造方法、及び太陽電池素子の製造方法
|
CN106784137B
(zh)
*
|
2016-11-30 |
2019-07-09 |
浙江晶科能源有限公司 |
一种电池片pn结边缘隔离的装置和方法
|
US11703266B2
(en)
*
|
2017-05-11 |
2023-07-18 |
General Electric Company |
Cooling systems and related method
|
JPWO2023079957A1
(et)
*
|
2021-11-05 |
2023-05-11 |
|
|