US3124452A
(en)
*
|
|
1964-03-10 |
|
figure |
US3103455A
(en)
*
|
|
1963-09-10 |
|
N-type |
US2998334A
(en)
*
|
1958-03-07 |
1961-08-29 |
Transitron Electronic Corp |
Method of making transistors
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NL237230A
(xx)
*
|
1958-03-19 |
|
|
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DE1164680B
(de)
*
|
1958-05-21 |
1964-03-05 |
Siemens Ag |
Verfahren zum Herstellen von stabfoermigen Halbleiterkoerpern hoher Reinheit
|
DE1129625B
(de)
*
|
1958-05-23 |
1962-05-17 |
Telefunken Patent |
Drifttransistor, bei dem der spezifische Widerstand in der Basiszone von der Emitter-zur Kollektorzone zunimmt
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NL239104A
(xx)
*
|
1958-05-26 |
1900-01-01 |
Western Electric Co |
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US3099591A
(en)
*
|
1958-12-15 |
1963-07-30 |
Shockley William |
Semiconductive device
|
NL98968C
(xx)
*
|
1959-02-17 |
|
|
|
GB948002A
(en)
*
|
1959-07-23 |
1964-01-29 |
Nat Res Dev |
Improvements in or relating to the preparation of semiconductor materials
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US3117260A
(en)
*
|
1959-09-11 |
1964-01-07 |
Fairchild Camera Instr Co |
Semiconductor circuit complexes
|
DE1208412B
(de)
*
|
1959-11-13 |
1966-01-05 |
Siemens Ag |
Elektrisches Halbleiterbauelement mit mindestens einem an die Oberflaeche des Halbleiterkoerpers tretenden pn-UEbergang und Verfahren zum Herstellen eines solchen Bauelements
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DE1166937B
(de)
*
|
1959-12-16 |
1964-04-02 |
Siemens Ag |
Verfahren zum Herstellen von Halbleiterbauelementen
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US3206340A
(en)
*
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1960-06-22 |
1965-09-14 |
Westinghouse Electric Corp |
Process for treating semiconductors
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NL295918A
(xx)
*
|
1962-07-31 |
|
|
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US3246214A
(en)
*
|
1963-04-22 |
1966-04-12 |
Siliconix Inc |
Horizontally aligned junction transistor structure
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GB1034503A
(en)
*
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1963-05-14 |
1966-06-29 |
Nat Res Dev |
Improvements in or relating to the production of crystalline material
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US3292129A
(en)
*
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1963-10-07 |
1966-12-13 |
Grace W R & Co |
Silicon thermistors
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US3336159A
(en)
*
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1963-10-07 |
1967-08-15 |
Ncr Co |
Method for growing single thin film crystals
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US3335038A
(en)
*
|
1964-03-30 |
1967-08-08 |
Ibm |
Methods of producing single crystals on polycrystalline substrates and devices using same
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GB1095143A
(en)
*
|
1964-03-31 |
1967-12-13 |
Nat Res Dev |
Improvements in or relating to the production of single crystal material
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US3236698A
(en)
*
|
1964-04-08 |
1966-02-22 |
Clevite Corp |
Semiconductive device and method of making the same
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GB1088052A
(en)
*
|
1964-08-13 |
1967-10-18 |
Johnson Matthey Co Ltd |
Improvements in and relating to the bonding of dissimilar metals to one another
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US3396059A
(en)
*
|
1964-09-14 |
1968-08-06 |
Nat Res Corp |
Process of growing silicon carbide p-nu junction electroluminescing diodes using a modified travelling solvent method
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US3530011A
(en)
*
|
1964-12-07 |
1970-09-22 |
North American Rockwell |
Process for epitaxially growing germanium on gallium arsenide
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US3765956A
(en)
*
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1965-09-28 |
1973-10-16 |
C Li |
Solid-state device
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US4371406A
(en)
*
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1965-09-28 |
1983-02-01 |
Li Chou H |
Solid-state device
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DE1300164B
(de)
*
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1967-01-26 |
1969-07-31 |
Itt Ind Gmbh Deutsche |
Verfahren zum Herstellen von Zenerdioden
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(en)
*
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1972-03-15 |
1976-07-06 |
Globe-Union Inc. |
Epitazy of heterojunction devices
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US4136435A
(en)
*
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1973-10-10 |
1979-01-30 |
Li Chou H |
Method for making solid-state device
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US3897277A
(en)
*
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1973-10-30 |
1975-07-29 |
Gen Electric |
High aspect ratio P-N junctions by the thermal gradient zone melting technique
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US3936319A
(en)
*
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1973-10-30 |
1976-02-03 |
General Electric Company |
Solar cell
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US3904442A
(en)
*
|
1973-10-30 |
1975-09-09 |
Gen Electric |
Method of making isolation grids in bodies of semiconductor material
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US3988763A
(en)
*
|
1973-10-30 |
1976-10-26 |
General Electric Company |
Isolation junctions for semiconductors devices
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US4024566A
(en)
*
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1973-10-30 |
1977-05-17 |
General Electric Company |
Deep diode device
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US3902925A
(en)
*
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1973-10-30 |
1975-09-02 |
Gen Electric |
Deep diode device and method
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US3956023A
(en)
*
|
1973-10-30 |
1976-05-11 |
General Electric Company |
Process for making a deep power diode by thermal migration of dopant
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US3899362A
(en)
*
|
1973-10-30 |
1975-08-12 |
Gen Electric |
Thermomigration of metal-rich liquid wires through semiconductor materials
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(en)
*
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1973-10-30 |
1976-05-11 |
General Electric Company |
Making a deep diode varactor by thermal migration
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US3988764A
(en)
*
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1973-10-30 |
1976-10-26 |
General Electric Company |
Deep diode solid state inductor coil
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(en)
*
|
1973-10-30 |
1975-07-22 |
Gen Electric |
Semiconductor device production
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US3982268A
(en)
*
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1973-10-30 |
1976-09-21 |
General Electric Company |
Deep diode lead throughs
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US3899361A
(en)
*
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1973-10-30 |
1975-08-12 |
Gen Electric |
Stabilized droplet method of making deep diodes having uniform electrical properties
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1973-10-30 |
1976-09-07 |
General Electric Company |
Method of making isolation grids in bodies of semiconductor material
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US4024565A
(en)
*
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1973-10-30 |
1977-05-17 |
General Electric Company |
Deep diode solid state transformer
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US3972742A
(en)
*
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1973-10-30 |
1976-08-03 |
General Electric Company |
Deep power diode
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(en)
*
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1973-10-30 |
1975-08-26 |
Gen Electric |
Method of making deep diode devices
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(en)
*
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1973-10-30 |
1978-02-21 |
General Electric Company |
Deep diode devices and method and apparatus
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(en)
*
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1973-10-30 |
1977-06-14 |
General Electric Company |
High aspect ratio P-N junctions by the thermal gradient zone melting technique
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(en)
*
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1973-10-30 |
1977-03-08 |
General Electric Company |
Deep power diode
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US3956024A
(en)
*
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1973-10-30 |
1976-05-11 |
General Electric Company |
Process for making a semiconductor varistor embodying a lamellar structure
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US3975213A
(en)
*
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1973-10-30 |
1976-08-17 |
General Electric Company |
High voltage diodes
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(en)
*
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1973-10-30 |
1975-10-07 |
Gen Electric |
High velocity thermal migration method of making deep diodes
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(en)
*
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1973-10-30 |
1976-10-26 |
General Electric Company |
Deep diode zeners
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(en)
*
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1973-10-30 |
1975-08-05 |
Gen Electric |
High velocity thermomigration method of making deep diodes
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(en)
*
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1973-10-30 |
1976-10-26 |
General Electric Company |
Deep diode silicon controlled rectifier
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(en)
*
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1973-10-30 |
1976-11-30 |
General Electric Company |
Isolation junctions for semiconductor devices
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US3988770A
(en)
*
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1973-12-14 |
1976-10-26 |
General Electric Company |
Deep finger diodes
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(en)
*
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1973-12-14 |
1976-08-31 |
General Electric Company |
Deep finger diodes
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(en)
*
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1974-04-29 |
1976-08-03 |
General Electric Company |
Multiple p-n junction formation with an alloy droplet
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US3988766A
(en)
*
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1974-04-29 |
1976-10-26 |
General Electric Company |
Multiple P-N junction formation with an alloy droplet
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US4031607A
(en)
*
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1974-05-28 |
1977-06-28 |
General Electric Company |
Minority carrier isolation barriers for semiconductor devices
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US3988771A
(en)
*
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1974-05-28 |
1976-10-26 |
General Electric Company |
Spatial control of lifetime in semiconductor device
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(en)
*
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1974-05-28 |
1976-10-26 |
General Electric Company |
Minority carrier isolation barriers for semiconductor devices
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US3988772A
(en)
*
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1974-05-28 |
1976-10-26 |
General Electric Company |
Current isolation means for integrated power devices
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US4063965A
(en)
*
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1974-10-30 |
1977-12-20 |
General Electric Company |
Making deep power diodes
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US3979820A
(en)
*
|
1974-10-30 |
1976-09-14 |
General Electric Company |
Deep diode lead throughs
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GB1524854A
(en)
*
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1974-11-01 |
1978-09-13 |
Gen Electric |
Semiconductors
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US4091257A
(en)
*
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1975-02-24 |
1978-05-23 |
General Electric Company |
Deep diode devices and method and apparatus
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US4032364A
(en)
*
|
1975-02-28 |
1977-06-28 |
General Electric Company |
Deep diode silicon controlled rectifier
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US4040869A
(en)
*
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1975-03-10 |
1977-08-09 |
General Electric Company |
High voltage deep diode power semiconductor switch
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US4032965A
(en)
*
|
1975-03-10 |
1977-06-28 |
General Electric Company |
Semiconductor varistor embodying a lamellar structure
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US4040171A
(en)
*
|
1975-04-17 |
1977-08-09 |
General Electric Company |
Deep diode zeners
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US4001047A
(en)
*
|
1975-05-19 |
1977-01-04 |
General Electric Company |
Temperature gradient zone melting utilizing infrared radiation
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US4010534A
(en)
*
|
1975-06-27 |
1977-03-08 |
General Electric Company |
Process for making a deep diode atomic battery
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US4024420A
(en)
*
|
1975-06-27 |
1977-05-17 |
General Electric Company |
Deep diode atomic battery
|
US4021269A
(en)
*
|
1975-11-26 |
1977-05-03 |
General Electric Company |
Post diffusion after temperature gradient zone melting
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US4006040A
(en)
*
|
1975-12-31 |
1977-02-01 |
General Electric Company |
Semiconductor device manufacture
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US3998662A
(en)
*
|
1975-12-31 |
1976-12-21 |
General Electric Company |
Migration of fine lines for bodies of semiconductor materials having a (100) planar orientation of a major surface
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US3998661A
(en)
*
|
1975-12-31 |
1976-12-21 |
General Electric Company |
Uniform migration of an annular shaped molten zone through a solid body
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US4012236A
(en)
*
|
1975-12-31 |
1977-03-15 |
General Electric Company |
Uniform thermal migration utilizing noncentro-symmetric and secondary sample rotation
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US4032370A
(en)
*
|
1976-02-11 |
1977-06-28 |
International Audio Visual, Inc. |
Method of forming an epitaxial layer on a crystalline substrate
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US4032955A
(en)
*
|
1976-08-09 |
1977-06-28 |
General Electric Company |
Deep diode transistor
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US4033786A
(en)
*
|
1976-08-30 |
1977-07-05 |
General Electric Company |
Temperature gradient zone melting utilizing selective radiation coatings
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US4035199A
(en)
*
|
1976-08-30 |
1977-07-12 |
General Electric Company |
Process for thermal gradient zone melting utilizing a guard ring radiation coating
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US4157564A
(en)
*
|
1976-11-19 |
1979-06-05 |
General Electric Company |
Deep diode devices
|
US4076559A
(en)
*
|
1977-03-18 |
1978-02-28 |
General Electric Company |
Temperature gradient zone melting through an oxide layer
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CH632356A5
(de)
*
|
1977-12-15 |
1982-09-30 |
Bbc Brown Boveri & Cie |
Verfahren zur herstellung von metallmustern auf siliziumscheiben fuer die thermomigration.
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US4188245A
(en)
*
|
1978-09-18 |
1980-02-12 |
General Electric Company |
Selective open tube aluminum diffusion
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US4159216A
(en)
*
|
1978-09-21 |
1979-06-26 |
General Electric Company |
Enhanced line stability by alloying of deposition
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US4184897A
(en)
*
|
1978-09-21 |
1980-01-22 |
General Electric Company |
Droplet migration doping using carrier droplets
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US4159215A
(en)
*
|
1978-09-21 |
1979-06-26 |
General Electric Company |
Droplet migration doping using reactive carriers and dopants
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US4207670A
(en)
*
|
1978-09-28 |
1980-06-17 |
General Electric Company |
Method for making a solid state neuron
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US4198247A
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*
|
1978-12-07 |
1980-04-15 |
General Electric Company |
Sealant films for materials having high intrinsic vapor pressure
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US4170491A
(en)
*
|
1978-12-07 |
1979-10-09 |
General Electric Company |
Near-surface thermal gradient enhancement with opaque coatings
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US4168992A
(en)
*
|
1978-12-07 |
1979-09-25 |
General Electric Company |
Process for thermal gradient zone melting utilizing a beveled wafer and a beveled guard ring
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US4190467A
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*
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1978-12-15 |
1980-02-26 |
Western Electric Co., Inc. |
Semiconductor device production
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US4257824A
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*
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1979-07-31 |
1981-03-24 |
Bell Telephone Laboratories, Incorporated |
Photo-induced temperature gradient zone melting
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GB2090465B
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*
|
1980-12-29 |
1985-11-13 |
Gen Electric |
Production of p-n junctions by the electromigration method
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US4381598A
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*
|
1981-06-11 |
1983-05-03 |
General Electric Company |
Method of making anode and cathode connections for electromigration
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US4549912A
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*
|
1981-06-11 |
1985-10-29 |
General Electric Company |
Anode and cathode connections for the practice of electromigration
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US4411060A
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1981-07-06 |
1983-10-25 |
Western Electric Co., Inc. |
Method of manufacturing dielectrically-isolated single-crystal semiconductor substrates
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US4394183A
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1981-11-18 |
1983-07-19 |
Bell Telephone Laboratories, Incorporated |
Solidification of molten materials
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US4398974A
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*
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1982-04-09 |
1983-08-16 |
Hughes Aircraft Company |
Temperature gradient zone melting process employing a buffer layer
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EP0101762B1
(de)
*
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1982-08-24 |
1987-04-08 |
BBC Aktiengesellschaft Brown, Boveri & Cie. |
Verfahren zur Thermomigration flüssiger Phasen und Vorrichtung zur Durchführung des Verfahrens
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US4595428A
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1984-01-03 |
1986-06-17 |
General Electric Company |
Method for producing high-aspect ratio hollow diffused regions in a semiconductor body
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FR2597884B1
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1986-04-28 |
1994-03-18 |
Commissariat A Energie Atomique |
Procede et dispositif de controle en continu de la surfusion du front de solidification d'un monocristal en cours d'elaboration et application au controle de la croissance d'un crital
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JP3186096B2
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1990-06-14 |
2001-07-11 |
アジレント・テクノロジーズ・インク |
感光素子アレイの製造方法
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1995-06-07 |
2004-07-29 |
Li Chou H. |
Integrated circuit device
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US6193141B1
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2000-04-25 |
2001-02-27 |
Siemens Westinghouse Power Corporation |
Single crystal turbine components made using a moving zone transient liquid phase bonded sandwich construction
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2000-09-27 |
2010-11-04 |
Li Choa H |
Solid-state circuit device
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2000-09-27 |
2006-10-10 |
Li Chou H |
Method of making atomic integrated circuit device
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2003-06-26 |
2007-01-30 |
Advent Solar, Inc. |
Fabrication of back-contacted silicon solar cells using thermomigration to create conductive vias
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2004-02-05 |
2005-08-11 |
Advent Solar, Inc. |
Contact fabrication of emitter wrap-through back contact silicon solar cells
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DE102004028933B4
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2004-06-15 |
2009-11-26 |
Infineon Technologies Ag |
Verfahren zur Herstellung einer vergrabenen metallischen Schicht in einem Halbleiterkörper und Halbleiterbauelement mit einer vergrabenen metallischen Schicht
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2019-05-07 |
2021-02-23 |
Fox Enterprises, Inc. |
Resonators and devices with pixel based electrodes operating across a gap
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2019-05-07 |
2021-05-11 |
Fox Enterprises, Inc. |
Resonators and devices with a pixel electrode operating across a gap
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