NL8702156A - Inrichting voor het detecteren van defecten aan het oppervlak van een uit kunststof bestaande moederplaat en het meten van de dikte van de uit kunststof bestaande bekledingslaag. - Google Patents

Inrichting voor het detecteren van defecten aan het oppervlak van een uit kunststof bestaande moederplaat en het meten van de dikte van de uit kunststof bestaande bekledingslaag. Download PDF

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Publication number
NL8702156A
NL8702156A NL8702156A NL8702156A NL8702156A NL 8702156 A NL8702156 A NL 8702156A NL 8702156 A NL8702156 A NL 8702156A NL 8702156 A NL8702156 A NL 8702156A NL 8702156 A NL8702156 A NL 8702156A
Authority
NL
Netherlands
Prior art keywords
plastic
light beam
thickness
disc
detecting
Prior art date
Application number
NL8702156A
Other languages
English (en)
Dutch (nl)
Original Assignee
Pioneer Electronic Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Electronic Corp filed Critical Pioneer Electronic Corp
Publication of NL8702156A publication Critical patent/NL8702156A/nl

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Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/002—Recording, reproducing or erasing systems characterised by the shape or form of the carrier
    • G11B7/0037—Recording, reproducing or erasing systems characterised by the shape or form of the carrier with discs
    • G11B7/00375—Recording, reproducing or erasing systems characterised by the shape or form of the carrier with discs arrangements for detection of physical defects, e.g. of recording layer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
    • G01B11/0633—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection using one or more discrete wavelengths
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
NL8702156A 1986-09-10 1987-09-10 Inrichting voor het detecteren van defecten aan het oppervlak van een uit kunststof bestaande moederplaat en het meten van de dikte van de uit kunststof bestaande bekledingslaag. NL8702156A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP21334586 1986-09-10
JP61213345A JPS6367549A (ja) 1986-09-10 1986-09-10 光ディスク用レジスト原盤の欠陥検査及び膜厚測定装置

Publications (1)

Publication Number Publication Date
NL8702156A true NL8702156A (nl) 1988-04-05

Family

ID=16637617

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8702156A NL8702156A (nl) 1986-09-10 1987-09-10 Inrichting voor het detecteren van defecten aan het oppervlak van een uit kunststof bestaande moederplaat en het meten van de dikte van de uit kunststof bestaande bekledingslaag.

Country Status (3)

Country Link
US (1) US4865445A (ja)
JP (1) JPS6367549A (ja)
NL (1) NL8702156A (ja)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0781958B2 (ja) * 1989-06-23 1995-09-06 三菱電機株式会社 微細粒子測定装置
US5248889A (en) * 1990-08-14 1993-09-28 Tencor Instruments, Inc. Laser apparatus and method for measuring stress in a thin film using multiple wavelengths
US5134303A (en) * 1990-08-14 1992-07-28 Flexus, Inc. Laser apparatus and method for measuring stress in a thin film using multiple wavelengths
US5189481A (en) * 1991-07-26 1993-02-23 Tencor Instruments Particle detector for rough surfaces
IT1252969B (it) * 1991-11-29 1995-07-07 Eidon Ricerca Sviluppo Documen Procedimento per rilevare le fibre sintetiche nella lavorazione del cascame di seta e relativa apparecchiatura
US5416594A (en) * 1993-07-20 1995-05-16 Tencor Instruments Surface scanner with thin film gauge
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US6734967B1 (en) * 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
JPH09128818A (ja) * 1995-11-02 1997-05-16 Sony Corp 露光装置
EP0865605B1 (en) * 1996-09-05 2004-03-24 WEA Manufacturing, Inc. Device and process for inspecting a surface of a glass master
JPH10221272A (ja) * 1997-02-03 1998-08-21 Mitsubishi Chem Corp 磁気ディスクの検査方法及び装置
US6355570B1 (en) * 1998-03-04 2002-03-12 Hitachi, Ltd. Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses
JP3833810B2 (ja) * 1998-03-04 2006-10-18 株式会社日立製作所 半導体の製造方法並びにプラズマ処理方法およびその装置
US6020957A (en) * 1998-04-30 2000-02-01 Kla-Tencor Corporation System and method for inspecting semiconductor wafers
US6052191A (en) * 1998-10-13 2000-04-18 Northrop Grumman Corporation Coating thickness measurement system and method of measuring a coating thickness
US7106425B1 (en) * 2000-09-20 2006-09-12 Kla-Tencor Technologies Corp. Methods and systems for determining a presence of defects and a thin film characteristic of a specimen
US6919957B2 (en) * 2000-09-20 2005-07-19 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension, a presence of defects, and a thin film characteristic of a specimen
US6806951B2 (en) * 2000-09-20 2004-10-19 Kla-Tencor Technologies Corp. Methods and systems for determining at least one characteristic of defects on at least two sides of a specimen
US6891627B1 (en) 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US6782337B2 (en) * 2000-09-20 2004-08-24 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension an a presence of defects on a specimen
US7130029B2 (en) * 2000-09-20 2006-10-31 Kla-Tencor Technologies Corp. Methods and systems for determining an adhesion characteristic and a thickness of a specimen
US7349090B2 (en) * 2000-09-20 2008-03-25 Kla-Tencor Technologies Corp. Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography
JP4505982B2 (ja) * 2000-11-30 2010-07-21 三菱電機株式会社 光ヘッド装置、記録及び／又は再生装置並びに記録及び／又は再生方法
JP3754003B2 (ja) * 2001-06-21 2006-03-08 株式会社リコー 欠陥検査装置及びその方法
DE60334825D1 (de) * 2002-10-10 2010-12-16 Sony Corp Verfahren zur herstellung eines originals für optische datenträgerbenutzung und verfahren zur herstellung eines optischen datenträgers
EP1554725A1 (en) * 2002-10-14 2005-07-20 Koninklijke Philips Electronics N.V. Method and apparatus for recording and/or reproducing information
EP1564734B1 (en) * 2002-11-20 2011-08-24 Sony Corporation Method for producing stamper used for producing optical disc and optical disc producing method
US7302148B2 (en) * 2005-01-13 2007-11-27 Komag, Inc. Test head for optically inspecting workpieces
US8472020B2 (en) * 2005-02-15 2013-06-25 Cinram Group, Inc. Process for enhancing dye polymer recording yields by pre-scanning coated substrate for defects
US10732129B2 (en) 2018-06-08 2020-08-04 Samasung Electronics Co., Ltd. Apparatus for and method of performing inspection and metrology process

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3492491A (en) * 1967-03-03 1970-01-27 Optomechanisms Inc Thickness monitor for coating silicon wafer
US3841761A (en) * 1973-10-24 1974-10-15 Neotec Corp Method and apparatus for detecting faults in fabric
JPS6026174B2 (ja) * 1976-05-19 1985-06-22 株式会社日立製作所 欠陥検出装置
US4310250A (en) * 1980-02-01 1982-01-12 Erwin Sick Gmbh Apparatus for monitoring for faults in translucent strip material
US4391524A (en) * 1981-03-16 1983-07-05 Rca Corporation Method for determining the quality of light scattering material
JPS57179648A (en) * 1981-04-28 1982-11-05 Kansai Coke & Chem Co Ltd Reflectivity measuring apparatus
JPS5855705A (ja) * 1981-09-29 1983-04-02 Fujitsu Ltd 膜厚検出方法
US4454001A (en) * 1982-08-27 1984-06-12 At&T Bell Laboratories Interferometric method and apparatus for measuring etch rate and fabricating devices
JPS61201107A (ja) * 1985-03-05 1986-09-05 Toshiba Corp 透明な膜の表面検査方法
US4676646A (en) * 1985-10-15 1987-06-30 Energy Conversion Devices, Inc. Method and apparatus for controlling thickness of a layer of an optical data storage device by measuring an optical property of the layer
US4676883A (en) * 1986-03-03 1987-06-30 Sierracin Corporation Optical disk transmission monitor for deposited films

Also Published As

Publication number Publication date
JPH0575262B2 (ja) 1993-10-20
JPS6367549A (ja) 1988-03-26
US4865445A (en) 1989-09-12

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