NL8602177A - Electronen detectie met energie discriminatie. - Google Patents
Electronen detectie met energie discriminatie. Download PDFInfo
- Publication number
- NL8602177A NL8602177A NL8602177A NL8602177A NL8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A
- Authority
- NL
- Netherlands
- Prior art keywords
- electrons
- field
- lens
- energy
- magnetic
- Prior art date
Links
- 238000001514 detection method Methods 0.000 title claims description 24
- 230000005291 magnetic effect Effects 0.000 claims description 34
- 230000003287 optical effect Effects 0.000 claims description 16
- 238000010894 electron beam technology Methods 0.000 claims description 8
- 230000005686 electrostatic field Effects 0.000 claims description 8
- 230000000694 effects Effects 0.000 claims description 5
- 230000007246 mechanism Effects 0.000 claims description 4
- 238000011896 sensitive detection Methods 0.000 claims description 2
- 230000007423 decrease Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 claims 1
- 238000005259 measurement Methods 0.000 description 11
- 238000001228 spectrum Methods 0.000 description 10
- 238000006073 displacement reaction Methods 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 230000000979 retarding effect Effects 0.000 description 5
- 230000002349 favourable effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 2
- 230000005294 ferromagnetic effect Effects 0.000 description 2
- 238000010606 normalization Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 229910025794 LaB6 Inorganic materials 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Tests Of Electronic Circuits (AREA)
- Measurement Of Radiation (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8602177A NL8602177A (nl) | 1986-08-27 | 1986-08-27 | Electronen detectie met energie discriminatie. |
| DE8787201510T DE3767252D1 (de) | 1986-08-27 | 1987-08-07 | Elektronen-nachweis mit energie-unterscheidung. |
| EP87201510A EP0259907B1 (en) | 1986-08-27 | 1987-08-07 | Electron detection with energy discrimination |
| JP62212645A JPH0828196B2 (ja) | 1986-08-27 | 1987-08-26 | 電子検出装置 |
| US07/342,704 US4882486A (en) | 1986-08-27 | 1989-04-21 | Electron detection with energy discrimination |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8602177 | 1986-08-27 | ||
| NL8602177A NL8602177A (nl) | 1986-08-27 | 1986-08-27 | Electronen detectie met energie discriminatie. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| NL8602177A true NL8602177A (nl) | 1988-03-16 |
Family
ID=19848463
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL8602177A NL8602177A (nl) | 1986-08-27 | 1986-08-27 | Electronen detectie met energie discriminatie. |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4882486A (ja) |
| EP (1) | EP0259907B1 (ja) |
| JP (1) | JPH0828196B2 (ja) |
| DE (1) | DE3767252D1 (ja) |
| NL (1) | NL8602177A (ja) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8801163A (nl) * | 1988-05-04 | 1989-12-01 | Philips Nv | Auger spectrometrie. |
| NL8801208A (nl) * | 1988-05-09 | 1989-12-01 | Philips Nv | Geladen deeltjes bundel apparaat. |
| JP2739485B2 (ja) * | 1988-11-05 | 1998-04-15 | セイコーインスツルメンツ株式会社 | 走査型電子線装置 |
| US4983833A (en) * | 1988-11-21 | 1991-01-08 | Siemens Aktiengesellschaft | Device for the detecting of charged secondary particles |
| JP2772821B2 (ja) * | 1989-05-30 | 1998-07-09 | セイコーインスツルメンツ株式会社 | 電子線装置 |
| US5063296A (en) * | 1990-05-31 | 1991-11-05 | Shimadzu Corporation | Electron-optical system for making a pseudoparallel micro electron-beam |
| JPH07120516B2 (ja) * | 1990-07-26 | 1995-12-20 | 株式会社東芝 | 低エネルギ−電子の照射方法および照射装置 |
| JP4179390B2 (ja) * | 1995-10-19 | 2008-11-12 | 株式会社日立製作所 | 走査形電子顕微鏡 |
| DE19605855A1 (de) * | 1996-02-16 | 1997-08-21 | Act Advanced Circuit Testing | Detektorobjektiv für Korpuskularstrahlgeräte |
| EP0821393B1 (en) * | 1996-07-25 | 1999-06-16 | ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH | Detector objective lens |
| US5798524A (en) * | 1996-08-07 | 1998-08-25 | Gatan, Inc. | Automated adjustment of an energy filtering transmission electron microscope |
| US6184524B1 (en) | 1996-08-07 | 2001-02-06 | Gatan, Inc. | Automated set up of an energy filtering transmission electron microscope |
| KR20000034962A (ko) * | 1998-11-19 | 2000-06-26 | 하이든 마틴 | 하전입자의 이중-모드 검출 장치 및 방법 |
| DE69903439T2 (de) * | 1999-11-12 | 2003-07-03 | Advantest Corp., Tokio/Tokyo | Ablenkeinheit zur Separation zweier Teilchenstrahlen |
| KR100494300B1 (ko) * | 2000-03-31 | 2005-06-10 | 가부시끼가이샤 히다치 세이사꾸쇼 | 주사 전자현미경 |
| US6847038B2 (en) | 2002-07-15 | 2005-01-25 | Hitachi, Ltd. | Scanning electron microscope |
| DE10044199B9 (de) | 2000-09-07 | 2005-07-28 | Carl Zeiss Smt Ag | Ablenkanordnung und Projektionssystem für geladene Teilchen |
| DE10109965A1 (de) | 2001-03-01 | 2002-09-12 | Zeiss Carl | Teilchenoptische Linsenanordnung und Verfahren unter Einsatz einer solchen Linsenanordnung |
| JP4073839B2 (ja) * | 2003-07-22 | 2008-04-09 | 株式会社神戸製鋼所 | 分析装置用磁場発生装置 |
| DE602005006967D1 (de) * | 2005-03-17 | 2008-07-03 | Integrated Circuit Testing | Analyse-System und Teilchenstrahlgerät |
| US20070090288A1 (en) * | 2005-10-20 | 2007-04-26 | Dror Shemesh | Method and system for enhancing resolution of a scanning electron microscope |
| EP2105944A1 (en) | 2008-03-28 | 2009-09-30 | FEI Company | Environmental cell for a particle-optical apparatus |
| US7755042B1 (en) * | 2008-04-18 | 2010-07-13 | Kla-Tencor Corporation | Auger electron spectrometer with applied magnetic field at target surface |
| US8283631B2 (en) * | 2008-05-08 | 2012-10-09 | Kla-Tencor Corporation | In-situ differential spectroscopy |
| JP2014127224A (ja) * | 2012-12-25 | 2014-07-07 | Hitachi Ltd | 分析装置 |
| DE102013006535A1 (de) * | 2013-04-15 | 2014-10-30 | Carl Zeiss Microscopy Gmbh | Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem |
| DE102017205231B3 (de) * | 2017-03-28 | 2018-08-09 | Carl Zeiss Microscopy Gmbh | Teilchenoptische Vorrichtung und Teilchenstrahlsystem |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1128107A (en) * | 1965-06-23 | 1968-09-25 | Hitachi Ltd | Scanning electron microscope |
| US3628014A (en) * | 1969-12-22 | 1971-12-14 | Boeing Co | Scanning electron microscope with color display means |
| DE3138901A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Verbessertes gegenfeld-spektrometer fuer die elektronenstrahl-messtechnik |
| DE3236273A1 (de) * | 1982-09-30 | 1984-04-05 | Siemens AG, 1000 Berlin und 8000 München | Spektrometerobjektiv mit parallelen objektiv- und spektrometerfeldern fuer die potentialmesstechnik |
| GB8327737D0 (en) * | 1983-10-17 | 1983-11-16 | Texas Instruments Ltd | Electron detector |
| JPS60212953A (ja) * | 1984-04-06 | 1985-10-25 | Hitachi Ltd | 電子線装置 |
| JPH0736321B2 (ja) * | 1985-06-14 | 1995-04-19 | イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング | 定量的電位測定用スペクトロメ−タ−対物レンズ装置 |
| GB2183898A (en) * | 1985-11-05 | 1987-06-10 | Texas Instruments Ltd | Checking voltages in integrated circuit by means of an electron detector |
-
1986
- 1986-08-27 NL NL8602177A patent/NL8602177A/nl not_active Application Discontinuation
-
1987
- 1987-08-07 DE DE8787201510T patent/DE3767252D1/de not_active Expired - Lifetime
- 1987-08-07 EP EP87201510A patent/EP0259907B1/en not_active Expired
- 1987-08-26 JP JP62212645A patent/JPH0828196B2/ja not_active Expired - Lifetime
-
1989
- 1989-04-21 US US07/342,704 patent/US4882486A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0828196B2 (ja) | 1996-03-21 |
| DE3767252D1 (de) | 1991-02-14 |
| EP0259907A1 (en) | 1988-03-16 |
| JPS6369135A (ja) | 1988-03-29 |
| US4882486A (en) | 1989-11-21 |
| EP0259907B1 (en) | 1991-01-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A1B | A search report has been drawn up | ||
| BV | The patent application has lapsed |