NL8602177A - Electronen detectie met energie discriminatie. - Google Patents

Electronen detectie met energie discriminatie. Download PDF

Info

Publication number
NL8602177A
NL8602177A NL8602177A NL8602177A NL8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A NL 8602177 A NL8602177 A NL 8602177A
Authority
NL
Netherlands
Prior art keywords
electrons
field
lens
energy
magnetic
Prior art date
Application number
NL8602177A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8602177A priority Critical patent/NL8602177A/nl
Priority to DE8787201510T priority patent/DE3767252D1/de
Priority to EP87201510A priority patent/EP0259907B1/de
Priority to JP62212645A priority patent/JPH0828196B2/ja
Publication of NL8602177A publication Critical patent/NL8602177A/nl
Priority to US07/342,704 priority patent/US4882486A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2448—Secondary particle detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2449—Detector devices with moving charges in electric or magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Measurement Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
NL8602177A 1986-08-27 1986-08-27 Electronen detectie met energie discriminatie. NL8602177A (nl)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL8602177A NL8602177A (nl) 1986-08-27 1986-08-27 Electronen detectie met energie discriminatie.
DE8787201510T DE3767252D1 (de) 1986-08-27 1987-08-07 Elektronen-nachweis mit energie-unterscheidung.
EP87201510A EP0259907B1 (de) 1986-08-27 1987-08-07 Elektronen-Nachweis mit Energie-Unterscheidung
JP62212645A JPH0828196B2 (ja) 1986-08-27 1987-08-26 電子検出装置
US07/342,704 US4882486A (en) 1986-08-27 1989-04-21 Electron detection with energy discrimination

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8602177A NL8602177A (nl) 1986-08-27 1986-08-27 Electronen detectie met energie discriminatie.
NL8602177 1986-08-27

Publications (1)

Publication Number Publication Date
NL8602177A true NL8602177A (nl) 1988-03-16

Family

ID=19848463

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8602177A NL8602177A (nl) 1986-08-27 1986-08-27 Electronen detectie met energie discriminatie.

Country Status (5)

Country Link
US (1) US4882486A (de)
EP (1) EP0259907B1 (de)
JP (1) JPH0828196B2 (de)
DE (1) DE3767252D1 (de)
NL (1) NL8602177A (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8801163A (nl) * 1988-05-04 1989-12-01 Philips Nv Auger spectrometrie.
NL8801208A (nl) * 1988-05-09 1989-12-01 Philips Nv Geladen deeltjes bundel apparaat.
JP2739485B2 (ja) * 1988-11-05 1998-04-15 セイコーインスツルメンツ株式会社 走査型電子線装置
US4983833A (en) * 1988-11-21 1991-01-08 Siemens Aktiengesellschaft Device for the detecting of charged secondary particles
JP2772821B2 (ja) * 1989-05-30 1998-07-09 セイコーインスツルメンツ株式会社 電子線装置
US5063296A (en) * 1990-05-31 1991-11-05 Shimadzu Corporation Electron-optical system for making a pseudoparallel micro electron-beam
JPH07120516B2 (ja) * 1990-07-26 1995-12-20 株式会社東芝 低エネルギ−電子の照射方法および照射装置
JP4179390B2 (ja) * 1995-10-19 2008-11-12 株式会社日立製作所 走査形電子顕微鏡
DE19605855A1 (de) * 1996-02-16 1997-08-21 Act Advanced Circuit Testing Detektorobjektiv für Korpuskularstrahlgeräte
EP0821393B1 (de) * 1996-07-25 1999-06-16 ACT Advanced Circuit Testing Gesellschaft für Testsystementwicklung mbH Detektor-Objektivlinse
US5798524A (en) * 1996-08-07 1998-08-25 Gatan, Inc. Automated adjustment of an energy filtering transmission electron microscope
US6184524B1 (en) 1996-08-07 2001-02-06 Gatan, Inc. Automated set up of an energy filtering transmission electron microscope
KR20000034962A (ko) * 1998-11-19 2000-06-26 하이든 마틴 하전입자의 이중-모드 검출 장치 및 방법
DE69903439T2 (de) * 1999-11-12 2003-07-03 Advantest Corp Ablenkeinheit zur Separation zweier Teilchenstrahlen
US6847038B2 (en) 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
DE60042758D1 (de) 2000-03-31 2009-09-24 Hitachi Ltd Abtast-elektronenmikroskop
DE10044199B9 (de) 2000-09-07 2005-07-28 Carl Zeiss Smt Ag Ablenkanordnung und Projektionssystem für geladene Teilchen
DE10109965A1 (de) 2001-03-01 2002-09-12 Zeiss Carl Teilchenoptische Linsenanordnung und Verfahren unter Einsatz einer solchen Linsenanordnung
JP4073839B2 (ja) * 2003-07-22 2008-04-09 株式会社神戸製鋼所 分析装置用磁場発生装置
EP1703537B9 (de) * 2005-03-17 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Analyse-System und Teilchenstrahlgerät
US20070090288A1 (en) * 2005-10-20 2007-04-26 Dror Shemesh Method and system for enhancing resolution of a scanning electron microscope
EP2105944A1 (de) 2008-03-28 2009-09-30 FEI Company "Environmental Cell" für eine TeilchenoptischeVorrichtung
US7755042B1 (en) * 2008-04-18 2010-07-13 Kla-Tencor Corporation Auger electron spectrometer with applied magnetic field at target surface
US8283631B2 (en) * 2008-05-08 2012-10-09 Kla-Tencor Corporation In-situ differential spectroscopy
JP2014127224A (ja) * 2012-12-25 2014-07-07 Hitachi Ltd 分析装置
DE102013006535A1 (de) * 2013-04-15 2014-10-30 Carl Zeiss Microscopy Gmbh Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem
DE102017205231B3 (de) * 2017-03-28 2018-08-09 Carl Zeiss Microscopy Gmbh Teilchenoptische Vorrichtung und Teilchenstrahlsystem

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1128107A (en) * 1965-06-23 1968-09-25 Hitachi Ltd Scanning electron microscope
US3628014A (en) * 1969-12-22 1971-12-14 Boeing Co Scanning electron microscope with color display means
DE3138901A1 (de) * 1981-09-30 1983-04-14 Siemens AG, 1000 Berlin und 8000 München Verbessertes gegenfeld-spektrometer fuer die elektronenstrahl-messtechnik
DE3236273A1 (de) * 1982-09-30 1984-04-05 Siemens AG, 1000 Berlin und 8000 München Spektrometerobjektiv mit parallelen objektiv- und spektrometerfeldern fuer die potentialmesstechnik
GB8327737D0 (en) * 1983-10-17 1983-11-16 Texas Instruments Ltd Electron detector
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JPH0736321B2 (ja) * 1985-06-14 1995-04-19 イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング 定量的電位測定用スペクトロメ−タ−対物レンズ装置
GB2183898A (en) * 1985-11-05 1987-06-10 Texas Instruments Ltd Checking voltages in integrated circuit by means of an electron detector

Also Published As

Publication number Publication date
EP0259907A1 (de) 1988-03-16
EP0259907B1 (de) 1991-01-09
JPS6369135A (ja) 1988-03-29
DE3767252D1 (de) 1991-02-14
US4882486A (en) 1989-11-21
JPH0828196B2 (ja) 1996-03-21

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BV The patent application has lapsed