NL8401172A - Halfgeleiderlaser. - Google Patents

Halfgeleiderlaser. Download PDF

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Publication number
NL8401172A
NL8401172A NL8401172A NL8401172A NL8401172A NL 8401172 A NL8401172 A NL 8401172A NL 8401172 A NL8401172 A NL 8401172A NL 8401172 A NL8401172 A NL 8401172A NL 8401172 A NL8401172 A NL 8401172A
Authority
NL
Netherlands
Prior art keywords
layer
region
strip
semiconductor laser
active
Prior art date
Application number
NL8401172A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL8401172A priority Critical patent/NL8401172A/nl
Priority to US06/714,228 priority patent/US4677634A/en
Priority to EP85200505A priority patent/EP0161016B1/fr
Priority to DE8585200505T priority patent/DE3565442D1/de
Priority to JP60073627A priority patent/JP2572371B2/ja
Priority to CA000478928A priority patent/CA1241422A/fr
Publication of NL8401172A publication Critical patent/NL8401172A/nl

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227—Buried mesa structure ; Striped active layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/2054—Methods of obtaining the confinement
    • H01S5/2059—Methods of obtaining the confinement by means of particular conductivity zones, e.g. obtained by particle bombardment or diffusion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/227—Buried mesa structure ; Striped active layer
    • H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
    • H01S5/2277—Buried mesa structure ; Striped active layer mesa created by etching double channel planar buried heterostructure [DCPBH] laser
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
    • H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
    • H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
    • H01S5/32391—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers based on In(Ga)(As)P

Landscapes

  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
NL8401172A 1984-04-12 1984-04-12 Halfgeleiderlaser. NL8401172A (nl)

Priority Applications (6)

Application Number Priority Date Filing Date Title
NL8401172A NL8401172A (nl) 1984-04-12 1984-04-12 Halfgeleiderlaser.
US06/714,228 US4677634A (en) 1984-04-12 1985-03-21 Double heterojunction semiconductor laser having improved high-frequency characteristics
EP85200505A EP0161016B1 (fr) 1984-04-12 1985-04-01 Laser à semi-conducteur
DE8585200505T DE3565442D1 (en) 1984-04-12 1985-04-01 Semiconductor laser
JP60073627A JP2572371B2 (ja) 1984-04-12 1985-04-09 半導体レ−ザ
CA000478928A CA1241422A (fr) 1984-04-12 1985-04-11 Laser a semiconducteur

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8401172 1984-04-12
NL8401172A NL8401172A (nl) 1984-04-12 1984-04-12 Halfgeleiderlaser.

Publications (1)

Publication Number Publication Date
NL8401172A true NL8401172A (nl) 1985-11-01

Family

ID=19843795

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8401172A NL8401172A (nl) 1984-04-12 1984-04-12 Halfgeleiderlaser.

Country Status (6)

Country Link
US (1) US4677634A (fr)
EP (1) EP0161016B1 (fr)
JP (1) JP2572371B2 (fr)
CA (1) CA1241422A (fr)
DE (1) DE3565442D1 (fr)
NL (1) NL8401172A (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62266039A (ja) * 1986-05-14 1987-11-18 株式会社東芝 超音波診断装置
NL8603009A (nl) * 1986-11-27 1988-06-16 Philips Nv Halfgeleiderlaser en werkwijze ter vervaardiging daarvan.
JP2539416B2 (ja) * 1987-03-25 1996-10-02 株式会社日立製作所 半導体レ−ザ装置
NL8702233A (nl) * 1987-09-18 1989-04-17 Philips Nv Dcpbh laser met goede temperatuurstabiliteit.
NL8802936A (nl) * 1988-11-29 1990-06-18 Koninkl Philips Electronics Nv Electroluminescerende diode met lage capaciteit.
FR2679388B1 (fr) * 1991-07-19 1995-02-10 Cit Alcatel Laser semi-conducteur a double canal et son procede de realisation.
KR0141057B1 (ko) * 1994-11-19 1998-07-15 이헌조 반도체 레이저 제조방법
JP5028640B2 (ja) * 2004-03-26 2012-09-19 日亜化学工業株式会社 窒化物半導体レーザ素子
JP5858659B2 (ja) * 2011-06-21 2016-02-10 キヤノン株式会社 フォトニック結晶面発光レーザおよびその製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5413315B2 (fr) * 1974-09-18 1979-05-30
US3984262A (en) * 1974-12-09 1976-10-05 Xerox Corporation Method of making a substrate striped planar laser
FR2465337A1 (fr) * 1979-09-11 1981-03-20 Landreau Jean Procede de fabrication d'un laser a semi-conducteur a confinements transverses optique et electrique et laser obtenu par ce procede
US4340967A (en) * 1980-06-02 1982-07-20 Bell Telephone Laboratories, Incorporated Semiconductor lasers with stable higher-order modes parallel to the junction plane
FR2502847A1 (fr) * 1981-03-25 1982-10-01 Western Electric Co Dispositif emetteur de lumiere a semi-conducteurs comportant une structure de canalisation du courant
US4525841A (en) * 1981-10-19 1985-06-25 Nippon Electric Co., Ltd. Double channel planar buried heterostructure laser
JPS5871685A (ja) * 1981-10-23 1983-04-28 Fujitsu Ltd 半導体発光装置
JPS5957486A (ja) * 1982-09-27 1984-04-03 Nec Corp 埋め込み形半導体レ−ザ
JPS59198785A (ja) * 1983-04-26 1984-11-10 Nec Corp 半導体レ−ザ素子およびその製造方法

Also Published As

Publication number Publication date
JPS60247988A (ja) 1985-12-07
JP2572371B2 (ja) 1997-01-16
DE3565442D1 (en) 1988-11-10
CA1241422A (fr) 1988-08-30
EP0161016A1 (fr) 1985-11-13
US4677634A (en) 1987-06-30
EP0161016B1 (fr) 1988-10-05

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BV The patent application has lapsed