NL8300941A - Werkwijze en inrichting voor het vervaardigen van een fotovoltaische inrichting. - Google Patents

Werkwijze en inrichting voor het vervaardigen van een fotovoltaische inrichting. Download PDF

Info

Publication number
NL8300941A
NL8300941A NL8300941A NL8300941A NL8300941A NL 8300941 A NL8300941 A NL 8300941A NL 8300941 A NL8300941 A NL 8300941A NL 8300941 A NL8300941 A NL 8300941A NL 8300941 A NL8300941 A NL 8300941A
Authority
NL
Netherlands
Prior art keywords
chamber
chambers
substrate material
deposition
substrate
Prior art date
Application number
NL8300941A
Other languages
English (en)
Dutch (nl)
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/359,825 external-priority patent/US4492181A/en
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Publication of NL8300941A publication Critical patent/NL8300941A/nl

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54Apparatus specially adapted for continuous coating
    • C23C16/545Apparatus specially adapted for continuous coating for coating elongated substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/206Particular processes or apparatus for continuous treatment of the devices, e.g. roll-to roll processes, multi-chamber deposition
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02ATECHNOLOGIES FOR ADAPTATION TO CLIMATE CHANGE
    • Y02A40/00Adaptation technologies in agriculture, forestry, livestock or agroalimentary production
    • Y02A40/90Adaptation technologies in agriculture, forestry, livestock or agroalimentary production in food processing or handling, e.g. food conservation
    • Y02A40/963Off-grid food refrigeration
    • Y02A40/966Powered by renewable energy sources
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Plasma & Fusion (AREA)
  • Photovoltaic Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Preparation Of Compounds By Using Micro-Organisms (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
NL8300941A 1982-03-19 1983-03-15 Werkwijze en inrichting voor het vervaardigen van een fotovoltaische inrichting. NL8300941A (nl)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US35982582 1982-03-19
US06/359,825 US4492181A (en) 1982-03-19 1982-03-19 Apparatus for continuously producing tandem amorphous photovoltaic cells
US46062983 1983-01-24
US06/460,629 US4485125A (en) 1982-03-19 1983-01-24 Method for continuously producing tandem amorphous photovoltaic cells

Publications (1)

Publication Number Publication Date
NL8300941A true NL8300941A (nl) 1983-10-17

Family

ID=27000645

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8300941A NL8300941A (nl) 1982-03-19 1983-03-15 Werkwijze en inrichting voor het vervaardigen van een fotovoltaische inrichting.

Country Status (19)

Country Link
US (1) US4485125A (sv)
KR (1) KR840004311A (sv)
AU (1) AU1241483A (sv)
BR (1) BR8301264A (sv)
CA (1) CA1188398A (sv)
DE (1) DE3309079A1 (sv)
EG (1) EG15199A (sv)
ES (1) ES520583A0 (sv)
FR (1) FR2542137A1 (sv)
GB (1) GB2117800B (sv)
GR (1) GR82635B (sv)
IE (1) IE54229B1 (sv)
IL (1) IL68248A (sv)
IN (1) IN157932B (sv)
IT (1) IT1160801B (sv)
MX (1) MX153415A (sv)
NL (1) NL8300941A (sv)
PH (1) PH19696A (sv)
SE (1) SE8301364L (sv)

Families Citing this family (72)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60119784A (ja) * 1983-12-01 1985-06-27 Kanegafuchi Chem Ind Co Ltd 絶縁金属基板の製法およびそれに用いる装置
US5258075A (en) * 1983-06-30 1993-11-02 Canon Kabushiki Kaisha Process for producing photoconductive member and apparatus for producing the same
DE3429899A1 (de) * 1983-08-16 1985-03-07 Canon K.K., Tokio/Tokyo Verfahren zur bildung eines abscheidungsfilms
US6784033B1 (en) 1984-02-15 2004-08-31 Semiconductor Energy Laboratory Co., Ltd. Method for the manufacture of an insulated gate field effect semiconductor device
JPS60170234A (ja) * 1984-02-15 1985-09-03 Semiconductor Energy Lab Co Ltd 気相反応装置および気相反応被膜作製方法
DE3427057A1 (de) * 1984-07-23 1986-01-23 Standard Elektrik Lorenz Ag, 7000 Stuttgart Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum
JPS6179755A (ja) * 1984-09-28 1986-04-23 Nisshin Steel Co Ltd 溶融めつき真空蒸着めつき兼用の連続めつき装置
US4759947A (en) * 1984-10-08 1988-07-26 Canon Kabushiki Kaisha Method for forming deposition film using Si compound and active species from carbon and halogen compound
US6113701A (en) 1985-02-14 2000-09-05 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device, manufacturing method, and system
US4726963A (en) * 1985-02-19 1988-02-23 Canon Kabushiki Kaisha Process for forming deposited film
US4784874A (en) * 1985-02-20 1988-11-15 Canon Kabushiki Kaisha Process for forming deposited film
US5244698A (en) * 1985-02-21 1993-09-14 Canon Kabushiki Kaisha Process for forming deposited film
US4818563A (en) * 1985-02-21 1989-04-04 Canon Kabushiki Kaisha Process for forming deposited film
US4853251A (en) * 1985-02-22 1989-08-01 Canon Kabushiki Kaisha Process for forming deposited film including carbon as a constituent element
US4801468A (en) * 1985-02-25 1989-01-31 Canon Kabushiki Kaisha Process for forming deposited film
JP2537175B2 (ja) * 1985-03-27 1996-09-25 キヤノン株式会社 機能性堆積膜の製造装置
US4664951A (en) * 1985-07-31 1987-05-12 Energy Conversion Devices, Inc. Method provided for corrective lateral displacement of a longitudinally moving web held in a planar configuration
US6673722B1 (en) 1985-10-14 2004-01-06 Semiconductor Energy Laboratory Co., Ltd. Microwave enhanced CVD system under magnetic field
US6230650B1 (en) 1985-10-14 2001-05-15 Semiconductor Energy Laboratory Co., Ltd. Microwave enhanced CVD system under magnetic field
JPH0647727B2 (ja) * 1985-12-24 1994-06-22 キヤノン株式会社 堆積膜形成法
JPH084071B2 (ja) * 1985-12-28 1996-01-17 キヤノン株式会社 堆積膜形成法
JPS62271418A (ja) * 1986-05-20 1987-11-25 Matsushita Electric Ind Co Ltd 非晶質シリコン半導体素子の製造方法
US4763601A (en) * 1987-09-02 1988-08-16 Nippon Steel Corporation Continuous composite coating apparatus for coating strip
US4842892A (en) * 1987-09-29 1989-06-27 Xerox Corporation Method for depositing an n+ amorphous silicon layer onto contaminated substrate
IT1227877B (it) * 1988-11-25 1991-05-14 Eniricerche S P A Agip S P A Procedimento per la deposizione via plasma di strati multipli dimate riale amorfo a composizione variabile
JPH0340447A (ja) * 1989-07-07 1991-02-21 Sankyo Seiki Mfg Co Ltd リール制御方法
US5176758A (en) * 1991-05-20 1993-01-05 United Solar Systems Corporation Translucent photovoltaic sheet material and panels
US5246506A (en) * 1991-07-16 1993-09-21 Solarex Corporation Multijunction photovoltaic device and fabrication method
DE4324320B4 (de) * 1992-07-24 2006-08-31 Fuji Electric Co., Ltd., Kawasaki Verfahren und Vorrichtung zur Herstellung einer als dünne Schicht ausgebildeten fotovoltaischen Umwandlungsvorrichtung
US5946587A (en) * 1992-08-06 1999-08-31 Canon Kabushiki Kaisha Continuous forming method for functional deposited films
DE4313284A1 (de) * 1993-04-23 1994-10-27 Leybold Ag Spaltschleuse für das Ein- oder Ausbringen von Substraten von der einen in eine benachbarte Behandlungskammer
US5333771A (en) * 1993-07-19 1994-08-02 Advance Systems, Inc. Web threader having an endless belt formed from a thin metal strip
DE9407482U1 (de) * 1994-05-05 1994-10-06 Balzers und Leybold Deutschland Holding AG, 63450 Hanau Funktionseinrichtung für eine Vakuumanlage für die Behandlung von scheibenförmigen Werkstücken
US5563095A (en) * 1994-12-01 1996-10-08 Frey; Jeffrey Method for manufacturing semiconductor devices
US6273955B1 (en) 1995-08-28 2001-08-14 Canon Kabushiki Kaisha Film forming apparatus
JP3332700B2 (ja) 1995-12-22 2002-10-07 キヤノン株式会社 堆積膜形成方法及び堆積膜形成装置
US5920078A (en) * 1996-06-20 1999-07-06 Frey; Jeffrey Optoelectronic device using indirect-bandgap semiconductor material
US6362020B1 (en) 1998-01-30 2002-03-26 Canon Kabushiki Kaisha Process of forming deposited film, process of producing semiconductor element substrate, and process of producing photovoltaic element
JP2000077402A (ja) * 1998-09-02 2000-03-14 Tokyo Electron Ltd プラズマ処理方法および半導体装置
JP2000204478A (ja) 1998-11-11 2000-07-25 Canon Inc 基板処理装置及び基板処理方法
JP4387573B2 (ja) * 1999-10-26 2009-12-16 東京エレクトロン株式会社 プロセス排気ガスモニタ装置及び方法、半導体製造装置、及び半導体製造装置管理システム及び方法
JP2002080151A (ja) 2000-03-28 2002-03-19 Canon Inc ウェブ搬送装置及び搬送方法、並びに電析装置及び電析方法
JP2002020863A (ja) 2000-05-01 2002-01-23 Canon Inc 堆積膜の形成方法及び形成装置、及び基板処理方法
JP4562152B2 (ja) 2000-07-11 2010-10-13 キヤノン株式会社 基板処理方法
TW565812B (en) * 2000-07-21 2003-12-11 Ebauchesfabrik Eta Ag Display assembly including an electro-optical cell and a photovoltaic cell
US20030044539A1 (en) * 2001-02-06 2003-03-06 Oswald Robert S. Process for producing photovoltaic devices
US20040020430A1 (en) * 2002-07-26 2004-02-05 Metal Oxide Technologies, Inc. Method and apparatus for forming a thin film on a tape substrate
US20040040506A1 (en) * 2002-08-27 2004-03-04 Ovshinsky Herbert C. High throughput deposition apparatus
DE502004009821D1 (de) * 2004-04-13 2009-09-10 Applied Materials Gmbh & Co Kg Führungsanordnung mit mindestens einer Führungswalze für die Führung von Bändern in Bandbehandlungsanlagen
US7176543B2 (en) * 2005-01-26 2007-02-13 United Solar Ovonic Corp. Method of eliminating curl for devices on thin flexible substrates, and devices made thereby
EP1884981A1 (en) * 2006-08-03 2008-02-06 STMicroelectronics Ltd (Malta) Removable wafer expander for die bonding equipment.
US9103033B2 (en) * 2006-10-13 2015-08-11 Solopower Systems, Inc. Reel-to-reel reaction of precursor film to form solar cell absorber
JP4831061B2 (ja) * 2007-12-26 2011-12-07 パナソニック株式会社 電子部品実装用装置および電子部品実装用装置の非常停止方法
US20100028533A1 (en) * 2008-03-04 2010-02-04 Brent Bollman Methods and Devices for Processing a Precursor Layer in a Group VIA Environment
EP2296215A4 (en) * 2008-06-24 2011-07-20 Panasonic Elec Works Co Ltd COLOR-SENSITIZED SOLAR CELL
US20100024729A1 (en) * 2008-08-04 2010-02-04 Xinmin Cao Methods and apparatuses for uniform plasma generation and uniform thin film deposition
CN102113092A (zh) * 2008-08-04 2011-06-29 美国迅力光能公司 具有实时在线iv测量的卷对卷连续式薄膜pv制造工艺及设备
JP5435267B2 (ja) * 2008-10-01 2014-03-05 日本電気硝子株式会社 ガラスロール、ガラスロールの製造装置、及びガラスロールの製造方法
JP5532507B2 (ja) * 2008-10-01 2014-06-25 日本電気硝子株式会社 ガラスロール及びガラスロールの処理方法
JP5532506B2 (ja) * 2008-10-01 2014-06-25 日本電気硝子株式会社 ガラスロール
JP5691148B2 (ja) 2008-10-01 2015-04-01 日本電気硝子株式会社 ガラスロール、ガラスロールの製造装置、及びガラスロールの製造方法
US20110081487A1 (en) * 2009-03-04 2011-04-07 Brent Bollman Methods and devices for processing a precursor layer in a group via environment
US8481355B2 (en) * 2009-12-15 2013-07-09 Primestar Solar, Inc. Modular system and process for continuous deposition of a thin film layer on a substrate
US8247255B2 (en) * 2009-12-15 2012-08-21 PrimeStar, Inc. Modular system and process for continuous deposition of a thin film layer on a substrate
CN102869810A (zh) * 2010-02-03 2013-01-09 美国迅力光能公司 一种隔离腔室及使用该种隔离腔室制备太阳电池材料的方法
CN102983216B (zh) * 2012-11-22 2015-11-25 深圳首创光伏有限公司 制造cigs薄膜太阳能电池的吸收层的反应装置及方法
US9449824B2 (en) 2013-04-24 2016-09-20 Natcore Technology, Inc. Method for patterned doping of a semiconductor
DE102014105747B4 (de) * 2014-04-23 2024-02-22 Uwe Beier Modulare Vorrichtung zum Bearbeiten von flexiblen Substraten
DE102014113036A1 (de) * 2014-09-10 2015-08-20 Von Ardenne Gmbh Anordnung und Verfahren zur Beschichtung eines bandförmigen Substrats
KR102622868B1 (ko) * 2016-11-28 2024-01-08 엘지디스플레이 주식회사 열충격이 방지된 롤투롤 제조장치
JP2021527170A (ja) * 2018-06-14 2021-10-11 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated フレキシブル基板を誘導するためのローラデバイス、フレキシブル基板を搬送するためのローラデバイスの使用、真空処理装置、及びフレキシブル基板を処理する方法
US20230407469A1 (en) * 2022-06-17 2023-12-21 Raytheon Technologies Corporation Continuous atmospheric pressure cvd tow coater process with in-situ air leak monitoring

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB724799A (en) * 1953-02-20 1955-02-23 Ohio Commw Eng Co Method and apparatus for continuously plating irregularly shaped objects
US2862705A (en) * 1956-08-13 1958-12-02 Time Inc Threading mechanism
US3083926A (en) * 1959-06-17 1963-04-02 Herr Equipment Corp Strip handling
ES378214A1 (es) * 1969-05-19 1973-01-01 Ibm Un sistema para tratar material, especialmente semiconduc- tor.
US4015558A (en) * 1972-12-04 1977-04-05 Optical Coating Laboratory, Inc. Vapor deposition apparatus
JPS55125680A (en) * 1979-03-20 1980-09-27 Yoshihiro Hamakawa Photovoltaic element
US4410558A (en) * 1980-05-19 1983-10-18 Energy Conversion Devices, Inc. Continuous amorphous solar cell production system
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
US4369730A (en) * 1981-03-16 1983-01-25 Energy Conversion Devices, Inc. Cathode for generating a plasma
US4438723A (en) * 1981-09-28 1984-03-27 Energy Conversion Devices, Inc. Multiple chamber deposition and isolation system and method
US4379943A (en) * 1981-12-14 1983-04-12 Energy Conversion Devices, Inc. Current enhanced photovoltaic device

Also Published As

Publication number Publication date
PH19696A (en) 1986-06-13
US4485125A (en) 1984-11-27
EG15199A (en) 1986-03-31
GB8306966D0 (en) 1983-04-20
IE54229B1 (en) 1989-07-19
SE8301364L (sv) 1983-09-20
DE3309079A1 (de) 1983-09-29
SE8301364D0 (sv) 1983-03-14
GB2117800A (en) 1983-10-19
BR8301264A (pt) 1983-11-22
KR840004311A (ko) 1984-10-10
ES8403247A1 (es) 1984-03-01
CA1188398A (en) 1985-06-04
GB2117800B (en) 1986-06-18
IT8320045A1 (it) 1984-09-11
AU1241483A (en) 1983-10-20
IN157932B (sv) 1986-07-26
MX153415A (es) 1986-10-07
IT8320045A0 (it) 1983-03-11
IT1160801B (it) 1987-03-11
FR2542137A1 (fr) 1984-09-07
IE830541L (en) 1983-09-19
ES520583A0 (es) 1984-03-01
IL68248A (en) 1986-08-31
GR82635B (sv) 1985-02-07

Similar Documents

Publication Publication Date Title
NL8300941A (nl) Werkwijze en inrichting voor het vervaardigen van een fotovoltaische inrichting.
JPH0432533B2 (sv)
EP0406690B1 (en) Process for continuously forming a large area functional deposited film by microwave PCVD method and an apparatus suitable for practicing the same
US4841908A (en) Multi-chamber deposition system
EP0411317B1 (en) Method and apparatus for continuously forming functional deposited films with a large area by microwave plasma CVD
Mahan et al. Evidence for microstructure in glow discharge hydrogenated amorphous Si-C alloys
EP0166383A2 (en) Continuous deposition of activated process gases
Takano et al. Light-weight and large-area solar cell production technology
Kilper et al. Oxygen and nitrogen impurities in microcrystalline silicon deposited under optimized conditions: Influence on material properties and solar cell performance
JPS6257270B2 (sv)
CA1293162C (en) Method for forming deposited film
US6660094B2 (en) Apparatus and method for forming deposited film
Chu et al. Deposition and photoconductivity of hydrogenated amorphous silicon films by the pyrolysis of disilane
AU669221B2 (en) Photoelectrical conversion device and generating system using the same
EP0258966B1 (en) Multi-chamber deposition system
Hazra et al. Highly photosensitive helium diluted amorphous silicon 1.5 eV band gap: Role of pressure
JPH11243222A (ja) 半導体膜形成装置、半導体膜の製造方法及び光起電力素子の製造方法
JPH09324275A (ja) 可撓性フィルム用プラズマcvd装置
Myong et al. High quality microcrystalline silicon-carbide films prepared by photo-CVD method using ethylene gas as a carbon source
JP2000192245A (ja) マイクロ波プラズマcvd法による堆積膜形成方法
Mahan et al. Why the Photoconductivity Decreases in a-SiC: H and a-SiGe: H when the Amount of Alloying Increases
Merdzhanova et al. Critical concentrations of atmospheric contaminants in a-Si: H and μc-Si: H solar cells
Chahed et al. Studies of the density of states at the band edges and in the pseudo-gap in a-SiGe: H alloys by combined photothermal deflection spectroscopy and X-ray spectroscopy
Wang et al. Material properties of polysilicon layers deposited by atmospheric pressure iodine vapor transport
JPS63234513A (ja) 堆積膜形成法

Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed