NL8201938A - Inrichting voor het reinigen van halfgeleiderplaatjes. - Google Patents

Inrichting voor het reinigen van halfgeleiderplaatjes. Download PDF

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Publication number
NL8201938A
NL8201938A NL8201938A NL8201938A NL8201938A NL 8201938 A NL8201938 A NL 8201938A NL 8201938 A NL8201938 A NL 8201938A NL 8201938 A NL8201938 A NL 8201938A NL 8201938 A NL8201938 A NL 8201938A
Authority
NL
Netherlands
Prior art keywords
end plate
mandrel
cleaning
wafer
semiconductor
Prior art date
Application number
NL8201938A
Other languages
English (en)
Dutch (nl)
Original Assignee
Gca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gca Corp filed Critical Gca Corp
Publication of NL8201938A publication Critical patent/NL8201938A/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
NL8201938A 1981-05-15 1982-05-12 Inrichting voor het reinigen van halfgeleiderplaatjes. NL8201938A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/264,097 US4401131A (en) 1981-05-15 1981-05-15 Apparatus for cleaning semiconductor wafers
US26409781 1981-05-15

Publications (1)

Publication Number Publication Date
NL8201938A true NL8201938A (nl) 1982-12-01

Family

ID=23004566

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8201938A NL8201938A (nl) 1981-05-15 1982-05-12 Inrichting voor het reinigen van halfgeleiderplaatjes.

Country Status (6)

Country Link
US (1) US4401131A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5825237A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3217891A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2505673B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2099951B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8201938A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (49)

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DK63284A (da) * 1984-02-13 1985-08-14 Ajax Internationel Machinery & Fremgangsmaade til fremkaldelse af et billede og en maskine til udoevelse af fremgangsmaaden
US4602184A (en) * 1984-10-29 1986-07-22 Ford Motor Company Apparatus for applying high frequency ultrasonic energy to cleaning and etching solutions
JPS61147534A (ja) * 1984-12-21 1986-07-05 Shimada Phys & Chem Ind Co Ltd 超音波化学処理方法
USD301779S (en) 1986-05-16 1989-06-20 Eastman Kodak Company Acoustical cleaning system
US4924890A (en) * 1986-05-16 1990-05-15 Eastman Kodak Company Method and apparatus for cleaning semiconductor wafers
WO1987006862A1 (en) * 1986-05-16 1987-11-19 Eastman Kodak Company Ultrasonic cleaning method and apparatus
US4686406A (en) * 1986-11-06 1987-08-11 Ford Motor Company Apparatus for applying high frequency ultrasonic energy to cleaning and etching solutions
JPH01156787U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * 1988-04-22 1989-10-27
US4854337A (en) * 1988-05-24 1989-08-08 Eastman Kodak Company Apparatus for treating wafers utilizing megasonic energy
US5009240A (en) * 1989-07-07 1991-04-23 United States Of America Wafer cleaning method
DE3937442A1 (de) * 1989-11-10 1991-05-16 Nokia Unterhaltungselektronik Verfahren zum bereichsweisen entfernen von schichten von einem substrat
US5038808A (en) * 1990-03-15 1991-08-13 S&K Products International, Inc. High frequency ultrasonic system
US5052422A (en) * 1990-04-16 1991-10-01 Safety Kleen Corporation All weather apparatus for cleaning pipe threads
US5090432A (en) * 1990-10-16 1992-02-25 Verteq, Inc. Single wafer megasonic semiconductor wafer processing system
FR2682126B1 (fr) * 1991-10-07 1994-12-23 Siderurgie Fse Inst Rech Procede et dispositif de decapage des rives d'une tole immergee dans une solution reactive, notamment de toles laminees a chaud.
US5368054A (en) * 1993-12-17 1994-11-29 International Business Machines Corporation Ultrasonic jet semiconductor wafer cleaning apparatus
US5931721A (en) 1994-11-07 1999-08-03 Sumitomo Heavy Industries, Ltd. Aerosol surface processing
US5967156A (en) * 1994-11-07 1999-10-19 Krytek Corporation Processing a surface
US6039059A (en) * 1996-09-30 2000-03-21 Verteq, Inc. Wafer cleaning system
US5922136A (en) * 1997-03-28 1999-07-13 Taiwan Semiconductor Manufacturing Company, Ltd. Post-CMP cleaner apparatus and method
JPH1154471A (ja) 1997-08-05 1999-02-26 Tokyo Electron Ltd 処理装置及び処理方法
WO2000021692A1 (en) * 1998-10-14 2000-04-20 Busnaina Ahmed A Fast single-article megasonic cleaning process
US20010013355A1 (en) * 1998-10-14 2001-08-16 Busnaina Ahmed A. Fast single-article megasonic cleaning process for single-sided or dual-sided cleaning
US6241427B1 (en) * 1998-11-20 2001-06-05 Seagate Technology, Inc. System and method for substantially touchless hydrodynamic transport of objects
US6276370B1 (en) 1999-06-30 2001-08-21 International Business Machines Corporation Sonic cleaning with an interference signal
US6539952B2 (en) 2000-04-25 2003-04-01 Solid State Equipment Corp. Megasonic treatment apparatus
EP1295314A2 (en) * 2000-06-26 2003-03-26 Applied Materials, Inc. Method and apparatus for wafer cleaning
US7451774B2 (en) 2000-06-26 2008-11-18 Applied Materials, Inc. Method and apparatus for wafer cleaning
JP2004507360A (ja) * 2000-09-13 2004-03-11 コモンウェルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガニゼイション 固液混合物を処理するプロセス
US6923192B2 (en) 2001-06-12 2005-08-02 Goldfinger Technologies, Llc Stackable process chambers
US7100304B2 (en) * 2001-06-12 2006-09-05 Akrion Technologies, Inc. Megasonic cleaner and dryer
US6679272B2 (en) * 2001-08-03 2004-01-20 Verteq, Inc. Megasonic probe energy attenuator
ATE506702T1 (de) * 2001-11-02 2011-05-15 Product Systems Inc Radialleistungs-megasonic-wandler
US6843257B2 (en) * 2002-04-25 2005-01-18 Samsung Electronics Co., Ltd. Wafer cleaning system
KR100468110B1 (ko) * 2002-07-12 2005-01-26 삼성전자주식회사 웨이퍼 처리 장치
CN100369187C (zh) * 2003-06-24 2008-02-13 Sez股份公司 湿处理盘状基片的部件和方法
US7418525B2 (en) * 2004-10-29 2008-08-26 International Business Machines Corporation Shared simultaneously-connected removable drives and servers each housing an I/O controller which maintains an uninterrupted protocol connection
TWI366222B (en) * 2004-11-23 2012-06-11 Lam Res Ag Apparatus and method for wet treatment of wafers
US7784478B2 (en) * 2006-01-20 2010-08-31 Akrion Systems Llc Acoustic energy system, method and apparatus for processing flat articles
WO2007085022A2 (en) * 2006-01-20 2007-07-26 Akrion Technologies, Inc. System, apparatus and methods for processing substrates using acoustic energy
CN101438383A (zh) * 2006-05-05 2009-05-20 Sez股份公司 用于湿处理碟状基材的装置及方法
WO2008008921A2 (en) * 2006-07-12 2008-01-17 Akrion Technologies, Inc. Tranducer assembly incorporating a transmitter having through holes, and method of cleaning
WO2008097634A2 (en) 2007-02-08 2008-08-14 Fontana Technology Particle removal method and composition
CN103776477A (zh) * 2014-01-24 2014-05-07 深圳市华星光电技术有限公司 一种摇摆式传感器组件
US10933891B2 (en) * 2018-10-16 2021-03-02 International Business Machines Corporation Railway station platform enhancement
RU191310U1 (ru) * 2018-12-26 2019-08-01 федеральное государственное автономное образовательное учреждение высшего образования "Московский физико-технический институт (национальный исследовательский университет)" Устройство для ультразвуковой очистки нанокалориметрических сенсоров
CN112495922B (zh) * 2020-11-10 2024-11-05 芯米(厦门)半导体设备有限公司 光刻胶收集装置自动清洗系统
US12198944B2 (en) 2020-11-11 2025-01-14 Applied Materials, Inc. Substrate handling in a modular polishing system with single substrate cleaning chambers

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445092A (en) * 1968-02-28 1969-05-20 Bausch & Lomb Ultrasonic cleaning device
US4064885A (en) * 1976-10-26 1977-12-27 Branson Ultrasonics Corporation Apparatus for cleaning workpieces by ultrasonic energy
US4103519A (en) * 1977-03-18 1978-08-01 Byron W. Boyd Apparatus for ultrasonic cleaning of carpet, upholstery, and similar materials
US4183011A (en) * 1977-12-22 1980-01-08 Fred M. Dellorfano, Jr. Ultrasonic cleaning systems
US4326553A (en) * 1980-08-28 1982-04-27 Rca Corporation Megasonic jet cleaner apparatus

Also Published As

Publication number Publication date
US4401131A (en) 1983-08-30
FR2505673B1 (fr) 1986-02-28
JPS5825237A (ja) 1983-02-15
FR2505673A1 (fr) 1982-11-19
GB2099951A (en) 1982-12-15
GB2099951B (en) 1984-12-12
DE3217891A1 (de) 1982-12-02
JPH0322691B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1991-03-27

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Legal Events

Date Code Title Description
A85 Still pending on 85-01-01
BV The patent application has lapsed