NL8101679A - Werkwijze voor het verhitten van materiaal op sio2-basis. - Google Patents

Werkwijze voor het verhitten van materiaal op sio2-basis. Download PDF

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Publication number
NL8101679A
NL8101679A NL8101679A NL8101679A NL8101679A NL 8101679 A NL8101679 A NL 8101679A NL 8101679 A NL8101679 A NL 8101679A NL 8101679 A NL8101679 A NL 8101679A NL 8101679 A NL8101679 A NL 8101679A
Authority
NL
Netherlands
Prior art keywords
laser
compaction
phosphosilicate glass
flow
laser beam
Prior art date
Application number
NL8101679A
Other languages
English (en)
Dutch (nl)
Original Assignee
Fairchild Camera Instr Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fairchild Camera Instr Co filed Critical Fairchild Camera Instr Co
Publication of NL8101679A publication Critical patent/NL8101679A/nl

Links

Classifications

    • H10P34/42—
    • H10P95/00—

Landscapes

  • Glass Compositions (AREA)
  • Formation Of Insulating Films (AREA)
  • Silicon Compounds (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
NL8101679A 1980-04-28 1981-04-03 Werkwijze voor het verhitten van materiaal op sio2-basis. NL8101679A (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14398380A 1980-04-28 1980-04-28
US14398380 1980-04-28

Publications (1)

Publication Number Publication Date
NL8101679A true NL8101679A (nl) 1981-11-16

Family

ID=22506554

Family Applications (1)

Application Number Title Priority Date Filing Date
NL8101679A NL8101679A (nl) 1980-04-28 1981-04-03 Werkwijze voor het verhitten van materiaal op sio2-basis.

Country Status (8)

Country Link
US (1) US4443493A (esLanguage)
JP (1) JPS56167334A (esLanguage)
CA (1) CA1174285A (esLanguage)
DE (1) DE3108146A1 (esLanguage)
FR (1) FR2481517B1 (esLanguage)
GB (1) GB2075749B (esLanguage)
IT (1) IT1144106B (esLanguage)
NL (1) NL8101679A (esLanguage)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56160050A (en) * 1980-05-14 1981-12-09 Fujitsu Ltd Semiconductor device and manufacture thereof
US4349584A (en) * 1981-04-28 1982-09-14 Rca Corporation Process for tapering openings in ternary glass coatings
US4431900A (en) * 1982-01-15 1984-02-14 Fairchild Camera & Instrument Corporation Laser induced flow Ge-O based materials
US4474831A (en) * 1982-08-27 1984-10-02 Varian Associates, Inc. Method for reflow of phosphosilicate glass
US4472456A (en) * 1982-11-18 1984-09-18 Texas Instruments Incorporated Absorption optimized laser annealing
US5098854A (en) * 1984-07-09 1992-03-24 National Semiconductor Corporation Process for forming self-aligned silicide base contact for bipolar transistor
DE3437072A1 (de) * 1984-10-09 1986-04-10 Dieter Prof. Dr. Linz Bäuerle Verfahren zur herstellung von leiterbahnen und/oder elektroden auf dielektrischem material
US5080962A (en) * 1985-02-25 1992-01-14 University Of Florida Method for making silica optical devices and devices produced thereby
NL8500931A (nl) * 1985-03-29 1986-10-16 Philips Nv Werkwijze voor het omzetten van polykristallijn halfgeleidermateriaal in monokristallijn halfgeleidermateriaal.
US4729962A (en) * 1986-03-24 1988-03-08 The United States Of America As Represented By The United States Department Of Energy Semiconductor junction formation by directed heat
US5221422A (en) * 1988-06-06 1993-06-22 Digital Equipment Corporation Lithographic technique using laser scanning for fabrication of electronic components and the like
DE69029046T2 (de) * 1989-03-16 1997-03-06 Sgs Thomson Microelectronics Kontakte für Halbleiter-Vorrichtungen
US5427825A (en) * 1993-02-09 1995-06-27 Rutgers, The State University Localized surface glazing of ceramic articles
US6946412B2 (en) * 2001-05-09 2005-09-20 Glen Raven, Inc. Flame-resistant, high visibility, anti-static fabric and apparel formed therefrom
US6787228B2 (en) * 2001-05-09 2004-09-07 Glen Raven, Inc. Flame-resistant and high visibility fabric and apparel formed therefrom
US6706650B2 (en) 2001-05-09 2004-03-16 Glen Raven, Inc. Flame-resistant and high visibility fabric and apparel formed therefrom
US7419922B2 (en) * 2001-05-09 2008-09-02 Gibson Richard M Flame-resistant, high visibility, anti-static fabric and apparel formed therefrom
KR101042871B1 (ko) * 2006-05-11 2011-06-20 아사히 가라스 가부시키가이샤 용융 유리의 거품 제거 방법 및 제거 장치, 그리고 유리의제조 방법
FR2951281B1 (fr) * 2009-10-12 2012-03-23 Commissariat Energie Atomique Procede de microdeformation de la face avant d'une piece mince, par modification de la face arriere ou de la peripherie de la piece
US11508808B2 (en) * 2018-10-11 2022-11-22 Actron Technology Corporation Rectifier device, rectifier, generator device, and powertrain for vehicle

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2040180B2 (de) * 1970-01-22 1977-08-25 Intel Corp, Mountain View, Calif. (V.St.A.) Verfahren zur verhinderung von mechanischen bruechen einer duennen, die oberflaeche eines halbleiterkoerpers ueberdeckende isolierschichten ueberziehenden elektrisch leitenden schicht
US3912558A (en) * 1974-05-03 1975-10-14 Fairchild Camera Instr Co Method of MOS circuit fabrication
FR2277430A1 (fr) * 1974-07-03 1976-01-30 Labo Electronique Physique Galette de microcanaux avec face d'entree des canaux arrondie et procede de fabrication
US4151008A (en) * 1974-11-15 1979-04-24 Spire Corporation Method involving pulsed light processing of semiconductor devices
US3920483A (en) * 1974-11-25 1975-11-18 Ibm Method of ion implantation through a photoresist mask
GB1571795A (en) * 1975-12-01 1980-07-16 Manuf Belge D Aiguilles Sa Smoothing the eyes of metal needles
JPS5280779A (en) * 1975-12-27 1977-07-06 Fujitsu Ltd Production of simiconductor device
CA1095387A (en) * 1976-02-17 1981-02-10 Conrad M. Banas Skin melting
US4258078A (en) * 1978-06-22 1981-03-24 Bell Telephone Laboratories, Incorporated Metallization for integrated circuits
GB2023926B (en) * 1978-06-22 1983-03-16 Western Electric Co Conductors for semiconductor devices
JPS5526619A (en) * 1978-08-15 1980-02-26 Toshiba Corp Method of producing semiconductor device
JPS5534444A (en) * 1978-08-31 1980-03-11 Fujitsu Ltd Preparation of semiconductor device
WO1980001121A1 (en) * 1978-11-28 1980-05-29 Western Electric Co Dual wavelength laser annealing of materials
IT1140645B (it) * 1979-03-05 1986-10-01 Rca Corp Materiale composito di passivazione per un dispositivo semiconduttore comprendente uno strato di nitruro di silicio (si alla terza in alla quarta) ed uno strato di vetro al fosfosilicato (psg) e metodo di fabbricazione delle stesso
DE2937993A1 (de) * 1979-09-20 1981-04-02 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von integrierten mos-halbleiterschaltungen nach der silizium-gate-technologie
US4284659A (en) * 1980-05-12 1981-08-18 Bell Telephone Laboratories Insulation layer reflow

Also Published As

Publication number Publication date
JPS56167334A (en) 1981-12-23
IT1144106B (it) 1986-10-29
DE3108146C2 (esLanguage) 1989-05-18
FR2481517A1 (fr) 1981-10-30
CA1174285A (en) 1984-09-11
GB2075749B (en) 1984-08-30
GB2075749A (en) 1981-11-18
IT8167249A0 (it) 1981-02-23
US4443493A (en) 1984-04-17
DE3108146A1 (de) 1981-12-24
FR2481517B1 (fr) 1985-11-22

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
A85 Still pending on 85-01-01
BV The patent application has lapsed