JPS56167334A - Method of heating material with sio2 as base - Google Patents
Method of heating material with sio2 as baseInfo
- Publication number
- JPS56167334A JPS56167334A JP6511581A JP6511581A JPS56167334A JP S56167334 A JPS56167334 A JP S56167334A JP 6511581 A JP6511581 A JP 6511581A JP 6511581 A JP6511581 A JP 6511581A JP S56167334 A JPS56167334 A JP S56167334A
- Authority
- JP
- Japan
- Prior art keywords
- sio2
- base
- heating material
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Glass Compositions (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US14398380A | 1980-04-28 | 1980-04-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56167334A true JPS56167334A (en) | 1981-12-23 |
Family
ID=22506554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6511581A Pending JPS56167334A (en) | 1980-04-28 | 1981-04-28 | Method of heating material with sio2 as base |
Country Status (8)
Country | Link |
---|---|
US (1) | US4443493A (ja) |
JP (1) | JPS56167334A (ja) |
CA (1) | CA1174285A (ja) |
DE (1) | DE3108146A1 (ja) |
FR (1) | FR2481517B1 (ja) |
GB (1) | GB2075749B (ja) |
IT (1) | IT1144106B (ja) |
NL (1) | NL8101679A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103346A (ja) * | 1982-11-18 | 1984-06-14 | テキサス・インスツルメンツ・インコ−ポレイテツド | 半導体装置上の絶縁物層を選択的に加熱する方法 |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56160050A (en) * | 1980-05-14 | 1981-12-09 | Fujitsu Ltd | Semiconductor device and manufacture thereof |
US4349584A (en) * | 1981-04-28 | 1982-09-14 | Rca Corporation | Process for tapering openings in ternary glass coatings |
US4431900A (en) * | 1982-01-15 | 1984-02-14 | Fairchild Camera & Instrument Corporation | Laser induced flow Ge-O based materials |
US4474831A (en) * | 1982-08-27 | 1984-10-02 | Varian Associates, Inc. | Method for reflow of phosphosilicate glass |
US5098854A (en) * | 1984-07-09 | 1992-03-24 | National Semiconductor Corporation | Process for forming self-aligned silicide base contact for bipolar transistor |
DE3437072A1 (de) * | 1984-10-09 | 1986-04-10 | Dieter Prof. Dr. Linz Bäuerle | Verfahren zur herstellung von leiterbahnen und/oder elektroden auf dielektrischem material |
US5080962A (en) * | 1985-02-25 | 1992-01-14 | University Of Florida | Method for making silica optical devices and devices produced thereby |
NL8500931A (nl) * | 1985-03-29 | 1986-10-16 | Philips Nv | Werkwijze voor het omzetten van polykristallijn halfgeleidermateriaal in monokristallijn halfgeleidermateriaal. |
US4729962A (en) * | 1986-03-24 | 1988-03-08 | The United States Of America As Represented By The United States Department Of Energy | Semiconductor junction formation by directed heat |
US5221422A (en) * | 1988-06-06 | 1993-06-22 | Digital Equipment Corporation | Lithographic technique using laser scanning for fabrication of electronic components and the like |
EP0388075B1 (en) * | 1989-03-16 | 1996-11-06 | STMicroelectronics, Inc. | Contacts for semiconductor devices |
US5427825A (en) * | 1993-02-09 | 1995-06-27 | Rutgers, The State University | Localized surface glazing of ceramic articles |
US7419922B2 (en) * | 2001-05-09 | 2008-09-02 | Gibson Richard M | Flame-resistant, high visibility, anti-static fabric and apparel formed therefrom |
US6946412B2 (en) * | 2001-05-09 | 2005-09-20 | Glen Raven, Inc. | Flame-resistant, high visibility, anti-static fabric and apparel formed therefrom |
US6787228B2 (en) * | 2001-05-09 | 2004-09-07 | Glen Raven, Inc. | Flame-resistant and high visibility fabric and apparel formed therefrom |
US6706650B2 (en) | 2001-05-09 | 2004-03-16 | Glen Raven, Inc. | Flame-resistant and high visibility fabric and apparel formed therefrom |
KR101042871B1 (ko) * | 2006-05-11 | 2011-06-20 | 아사히 가라스 가부시키가이샤 | 용융 유리의 거품 제거 방법 및 제거 장치, 그리고 유리의제조 방법 |
FR2951281B1 (fr) * | 2009-10-12 | 2012-03-23 | Commissariat Energie Atomique | Procede de microdeformation de la face avant d'une piece mince, par modification de la face arriere ou de la peripherie de la piece |
US11508808B2 (en) * | 2018-10-11 | 2022-11-22 | Actron Technology Corporation | Rectifier device, rectifier, generator device, and powertrain for vehicle |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5280779A (en) * | 1975-12-27 | 1977-07-06 | Fujitsu Ltd | Production of simiconductor device |
JPS5526619A (en) * | 1978-08-15 | 1980-02-26 | Toshiba Corp | Method of producing semiconductor device |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2040180B2 (de) * | 1970-01-22 | 1977-08-25 | Intel Corp, Mountain View, Calif. (V.St.A.) | Verfahren zur verhinderung von mechanischen bruechen einer duennen, die oberflaeche eines halbleiterkoerpers ueberdeckende isolierschichten ueberziehenden elektrisch leitenden schicht |
US3912558A (en) * | 1974-05-03 | 1975-10-14 | Fairchild Camera Instr Co | Method of MOS circuit fabrication |
FR2277430A1 (fr) * | 1974-07-03 | 1976-01-30 | Labo Electronique Physique | Galette de microcanaux avec face d'entree des canaux arrondie et procede de fabrication |
US4151008A (en) * | 1974-11-15 | 1979-04-24 | Spire Corporation | Method involving pulsed light processing of semiconductor devices |
US3920483A (en) * | 1974-11-25 | 1975-11-18 | Ibm | Method of ion implantation through a photoresist mask |
GB1571795A (en) * | 1975-12-01 | 1980-07-16 | Manuf Belge D Aiguilles Sa | Smoothing the eyes of metal needles |
CA1095387A (en) * | 1976-02-17 | 1981-02-10 | Conrad M. Banas | Skin melting |
GB2023926B (en) * | 1978-06-22 | 1983-03-16 | Western Electric Co | Conductors for semiconductor devices |
US4258078A (en) * | 1978-06-22 | 1981-03-24 | Bell Telephone Laboratories, Incorporated | Metallization for integrated circuits |
JPS5534444A (en) * | 1978-08-31 | 1980-03-11 | Fujitsu Ltd | Preparation of semiconductor device |
GB2056769B (en) * | 1978-11-28 | 1983-03-30 | Western Electric Co | Dual wavelength laser annealing of material |
IT1140645B (it) * | 1979-03-05 | 1986-10-01 | Rca Corp | Materiale composito di passivazione per un dispositivo semiconduttore comprendente uno strato di nitruro di silicio (si alla terza in alla quarta) ed uno strato di vetro al fosfosilicato (psg) e metodo di fabbricazione delle stesso |
DE2937993A1 (de) * | 1979-09-20 | 1981-04-02 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von integrierten mos-halbleiterschaltungen nach der silizium-gate-technologie |
US4284659A (en) * | 1980-05-12 | 1981-08-18 | Bell Telephone Laboratories | Insulation layer reflow |
-
1981
- 1981-01-28 CA CA000369491A patent/CA1174285A/en not_active Expired
- 1981-02-06 GB GB8103773A patent/GB2075749B/en not_active Expired
- 1981-02-23 IT IT67249/81A patent/IT1144106B/it active
- 1981-03-04 DE DE19813108146 patent/DE3108146A1/de active Granted
- 1981-04-03 NL NL8101679A patent/NL8101679A/nl not_active Application Discontinuation
- 1981-04-24 FR FR8108222A patent/FR2481517B1/fr not_active Expired
- 1981-04-28 JP JP6511581A patent/JPS56167334A/ja active Pending
-
1982
- 1982-01-15 US US06/339,600 patent/US4443493A/en not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5280779A (en) * | 1975-12-27 | 1977-07-06 | Fujitsu Ltd | Production of simiconductor device |
JPS5526619A (en) * | 1978-08-15 | 1980-02-26 | Toshiba Corp | Method of producing semiconductor device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59103346A (ja) * | 1982-11-18 | 1984-06-14 | テキサス・インスツルメンツ・インコ−ポレイテツド | 半導体装置上の絶縁物層を選択的に加熱する方法 |
Also Published As
Publication number | Publication date |
---|---|
DE3108146A1 (de) | 1981-12-24 |
FR2481517B1 (fr) | 1985-11-22 |
FR2481517A1 (fr) | 1981-10-30 |
IT8167249A0 (it) | 1981-02-23 |
NL8101679A (nl) | 1981-11-16 |
DE3108146C2 (ja) | 1989-05-18 |
IT1144106B (it) | 1986-10-29 |
GB2075749B (en) | 1984-08-30 |
CA1174285A (en) | 1984-09-11 |
US4443493A (en) | 1984-04-17 |
GB2075749A (en) | 1981-11-18 |
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