NL7908159A - Oplossing van lage concentratie voor het elektrolytisch afzetten van driewaardig chroom, en werkwijzen voor afzetting van dunne, resp. dikke chroomlagen. - Google Patents
Oplossing van lage concentratie voor het elektrolytisch afzetten van driewaardig chroom, en werkwijzen voor afzetting van dunne, resp. dikke chroomlagen. Download PDFInfo
- Publication number
- NL7908159A NL7908159A NL7908159A NL7908159A NL7908159A NL 7908159 A NL7908159 A NL 7908159A NL 7908159 A NL7908159 A NL 7908159A NL 7908159 A NL7908159 A NL 7908159A NL 7908159 A NL7908159 A NL 7908159A
- Authority
- NL
- Netherlands
- Prior art keywords
- chromium
- solution
- concentration
- bath
- thiocyanate
- Prior art date
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 124
- 238000000151 deposition Methods 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 23
- 230000008021 deposition Effects 0.000 title claims description 20
- 239000011651 chromium Substances 0.000 claims description 109
- 229910052804 chromium Inorganic materials 0.000 claims description 106
- 239000000243 solution Substances 0.000 claims description 76
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 13
- CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 claims description 12
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 claims description 12
- 235000003704 aspartic acid Nutrition 0.000 claims description 12
- OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 claims description 12
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 claims description 12
- 238000009713 electroplating Methods 0.000 claims description 11
- 238000007747 plating Methods 0.000 claims description 9
- 238000005246 galvanizing Methods 0.000 claims description 8
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 7
- 239000004327 boric acid Substances 0.000 claims description 7
- 239000011780 sodium chloride Substances 0.000 claims description 7
- 235000001014 amino acid Nutrition 0.000 claims description 6
- 150000001413 amino acids Chemical class 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 claims description 6
- YRTKBCIAQCXVCM-UHFFFAOYSA-K chromium(3+);trithiocyanate Chemical compound [Cr+3].[S-]C#N.[S-]C#N.[S-]C#N YRTKBCIAQCXVCM-UHFFFAOYSA-K 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 239000003446 ligand Substances 0.000 claims description 3
- 239000000080 wetting agent Substances 0.000 claims description 3
- 238000002310 reflectometry Methods 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 11
- 238000005259 measurement Methods 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 5
- 239000008151 electrolyte solution Substances 0.000 description 5
- 229940021013 electrolyte solution Drugs 0.000 description 5
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000010959 steel Substances 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- CKLJMWTZIZZHCS-UHFFFAOYSA-N Aspartic acid Chemical compound OC(=O)C(N)CC(O)=O CKLJMWTZIZZHCS-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- 239000004471 Glycine Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 241001085205 Prenanthella exigua Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000011067 equilibration Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 150000001242 acetic acid derivatives Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001510 aspartic acids Chemical class 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
- 150000001845 chromium compounds Chemical class 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 150000004675 formic acid derivatives Chemical class 0.000 description 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 1
- 230000009931 harmful effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 102000004196 processed proteins & peptides Human genes 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 238000011084 recovery Methods 0.000 description 1
- RROSXLCQOOGZBR-UHFFFAOYSA-N sodium;isothiocyanate Chemical compound [Na+].[N-]=C=S RROSXLCQOOGZBR-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7844177 | 1978-11-11 | ||
GB7844177A GB2033427B (en) | 1978-11-11 | 1978-11-11 | Chromium electroplating |
GB7922791A GB2051861B (en) | 1979-06-29 | 1979-06-29 | Deposition of thick chromium films from trivalent chromium plating solutions |
GB7922791 | 1979-06-29 | ||
GB7932300A GB2038361B (en) | 1978-11-11 | 1979-09-18 | Trivalent chromium plating bath |
GB7932300 | 1979-09-18 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7908159A true NL7908159A (nl) | 1980-05-13 |
Family
ID=27260618
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7908159A NL7908159A (nl) | 1978-11-11 | 1979-11-07 | Oplossing van lage concentratie voor het elektrolytisch afzetten van driewaardig chroom, en werkwijzen voor afzetting van dunne, resp. dikke chroomlagen. |
Country Status (6)
Country | Link |
---|---|
AT (1) | AT370782B (cs) |
DE (1) | DE2944142A1 (cs) |
IE (1) | IE49204B1 (cs) |
IN (1) | IN153802B (cs) |
IT (1) | IT1165359B (cs) |
NL (1) | NL7908159A (cs) |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1431639A (en) * | 1974-12-11 | 1976-04-14 | Ibm Uk | Electroplating chromium and its alloys |
GB1596995A (en) * | 1977-06-14 | 1981-09-03 | Ibm | Electroplating chromium and its alloys |
GB1571193A (en) * | 1976-12-16 | 1980-07-09 | Ibm Uk | Electroplating chromium and its alloys |
GB1591051A (en) * | 1977-01-26 | 1981-06-10 | Ibm | Electroplating chromium and its alloys |
-
1979
- 1979-10-03 IN IN699/DEL/79A patent/IN153802B/en unknown
- 1979-11-02 DE DE19792944142 patent/DE2944142A1/de active Granted
- 1979-11-05 AT AT0710279A patent/AT370782B/de not_active IP Right Cessation
- 1979-11-06 IT IT27054/79A patent/IT1165359B/it active
- 1979-11-07 NL NL7908159A patent/NL7908159A/nl not_active Application Discontinuation
- 1979-11-09 IE IE2160/79A patent/IE49204B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE2944142C2 (cs) | 1990-03-01 |
AT370782B (de) | 1983-05-10 |
IT1165359B (it) | 1987-04-22 |
DE2944142A1 (de) | 1980-05-29 |
IT7927054A0 (it) | 1979-11-06 |
IN153802B (cs) | 1984-08-18 |
IE792160L (en) | 1980-05-11 |
IE49204B1 (en) | 1985-08-21 |
ATA710279A (de) | 1982-09-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
A85 | Still pending on 85-01-01 | ||
BC | A request for examination has been filed | ||
BV | The patent application has lapsed |