NL7906932A - Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag. - Google Patents

Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag. Download PDF

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Publication number
NL7906932A
NL7906932A NL7906932A NL7906932A NL7906932A NL 7906932 A NL7906932 A NL 7906932A NL 7906932 A NL7906932 A NL 7906932A NL 7906932 A NL7906932 A NL 7906932A NL 7906932 A NL7906932 A NL 7906932A
Authority
NL
Netherlands
Prior art keywords
resist material
material according
layer
carbazole
formula
Prior art date
Application number
NL7906932A
Other languages
English (en)
Dutch (nl)
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Priority to NL7906932A priority Critical patent/NL7906932A/nl
Priority to US06/183,521 priority patent/US4348472A/en
Priority to JP12785780A priority patent/JPS5651736A/ja
Priority to EP80200870A priority patent/EP0025633B1/en
Priority to DE8080200870T priority patent/DE3064426D1/de
Publication of NL7906932A publication Critical patent/NL7906932A/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G03F7/0125—Macromolecular azides; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the macromolecular azides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F126/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen
    • C08F126/06—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a single or double bond to nitrogen or by a heterocyclic ring containing nitrogen by a heterocyclic ring containing nitrogen
    • C08F126/12—N-Vinyl-carbazole
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/12—Esters of monohydric alcohols or phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/108—Polyolefin or halogen containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/167—X-ray

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
NL7906932A 1979-09-18 1979-09-18 Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag. NL7906932A (nl)

Priority Applications (5)

Application Number Priority Date Filing Date Title
NL7906932A NL7906932A (nl) 1979-09-18 1979-09-18 Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.
US06/183,521 US4348472A (en) 1979-09-18 1980-09-02 Method of applying a layer in accordance with a pattern on a substrate, a negative resist material and a substrate coated with the resist
JP12785780A JPS5651736A (en) 1979-09-18 1980-09-13 Substrateecopying film deposition system* negative resist* and substrate covered with same resist film
EP80200870A EP0025633B1 (en) 1979-09-18 1980-09-16 A method of applying a layer in accordance with a pattern on a substrate
DE8080200870T DE3064426D1 (en) 1979-09-18 1980-09-16 A method of applying a layer in accordance with a pattern on a substrate

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL7906932A NL7906932A (nl) 1979-09-18 1979-09-18 Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.
NL7906932 1979-09-18

Publications (1)

Publication Number Publication Date
NL7906932A true NL7906932A (nl) 1981-03-20

Family

ID=19833863

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7906932A NL7906932A (nl) 1979-09-18 1979-09-18 Negatief resist-materiaal, drager met resist-materiaal en werkwijze voor het volgens een patroon aanbrengen van een laag.

Country Status (5)

Country Link
US (1) US4348472A (ko)
EP (1) EP0025633B1 (ko)
JP (1) JPS5651736A (ko)
DE (1) DE3064426D1 (ko)
NL (1) NL7906932A (ko)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3109809C2 (de) * 1981-03-13 1986-07-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Resiststrukturen
DE3109728C2 (de) * 1981-03-13 1986-08-14 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Resiststrukturen
US4474869A (en) * 1981-05-29 1984-10-02 Hughes Aircraft Company Polyvinylpyridine radiation resists
JPS58122532A (ja) * 1982-01-18 1983-07-21 Fujitsu Ltd ホログラム記録材料
US4556625A (en) * 1982-07-09 1985-12-03 Armstrong World Industries, Inc. Development of a colored image on a cellulosic material with monosulfonyl azides
US4515886A (en) * 1983-02-16 1985-05-07 Toyo Soda Manufacturing Co., Ltd. Photosensitive compositions
US4596761A (en) * 1983-11-02 1986-06-24 Hughes Aircraft Company Graft polymerized SiO2 lithographic masks
US4640885A (en) * 1983-11-25 1987-02-03 Armstrong World Industries, Inc. Mono-sulfonyl azide composition used to photolytically develop a colored image on a cellulosic material
US5240795A (en) * 1988-07-04 1993-08-31 Canon Kabushiki Kaisha Volume phase type hologram film and photosensitive resin composition employed therefor
JPH0442229A (ja) * 1990-06-08 1992-02-12 Fujitsu Ltd レジスト材料およびパターンの形成方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3284198A (en) * 1963-09-11 1966-11-08 Martin Marietta Corp Method for making photolithographic plate
US3421891A (en) * 1964-06-18 1969-01-14 Matsushita Electric Ind Co Ltd Electrophotographic materials comprising brominated poly-n-vinyl carbazoles
US3538125A (en) * 1967-11-13 1970-11-03 Motorola Inc Photosensitizer
JPS495066B1 (ko) * 1969-07-18 1974-02-05
JPS5139915B2 (ko) * 1973-02-09 1976-10-30
JPS576573B2 (ko) * 1973-11-05 1982-02-05
JPS5315153A (en) * 1976-07-27 1978-02-10 Canon Inc Hologram

Also Published As

Publication number Publication date
JPS6332374B2 (ko) 1988-06-29
JPS5651736A (en) 1981-05-09
DE3064426D1 (en) 1983-09-01
EP0025633B1 (en) 1983-07-27
EP0025633A1 (en) 1981-03-25
US4348472A (en) 1982-09-07

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BV The patent application has lapsed