NL7207246A - - Google Patents
Info
- Publication number
- NL7207246A NL7207246A NL7207246A NL7207246A NL7207246A NL 7207246 A NL7207246 A NL 7207246A NL 7207246 A NL7207246 A NL 7207246A NL 7207246 A NL7207246 A NL 7207246A NL 7207246 A NL7207246 A NL 7207246A
- Authority
- NL
- Netherlands
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/84—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body
- H01L21/86—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being other than a semiconductor body, e.g. being an insulating body the insulating body being sapphire, e.g. silicon on sapphire structure, i.e. SOS
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0248—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
- H01L27/0251—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
- H01L27/0255—Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/053—Field effect transistors fets
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17779071A | 1971-09-03 | 1971-09-03 |
Publications (1)
Publication Number | Publication Date |
---|---|
NL7207246A true NL7207246A (xx) | 1973-03-06 |
Family
ID=22650002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL7207246A NL7207246A (xx) | 1971-09-03 | 1972-05-29 |
Country Status (11)
Country | Link |
---|---|
US (1) | US3728591A (xx) |
JP (1) | JPS5138588B2 (xx) |
AU (1) | AU459838B2 (xx) |
BE (1) | BE788269A (xx) |
CA (1) | CA966935A (xx) |
DE (1) | DE2226613C3 (xx) |
FR (1) | FR2150684B1 (xx) |
GB (1) | GB1339250A (xx) |
IT (1) | IT955274B (xx) |
NL (1) | NL7207246A (xx) |
SE (1) | SE376116B (xx) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA941515A (en) * | 1971-07-12 | 1974-02-05 | Rca Corporation | Gate protective device for insulated gate field-effect transistors |
US3865653A (en) * | 1971-10-12 | 1975-02-11 | Karl Goser | Logic circuit having a switching transistor and a load transistor, in particular for a semiconductor storage element |
DE2335333B1 (de) * | 1973-07-11 | 1975-01-16 | Siemens Ag | Verfahren zur Herstellung von einer Anordnung mit Feldeffekttransistoren in Komplementaer-MOS-Technik |
US3922703A (en) * | 1974-04-03 | 1975-11-25 | Rca Corp | Electroluminescent semiconductor device |
JPS5623709Y2 (xx) * | 1975-05-16 | 1981-06-03 | ||
JPS5299786A (en) * | 1976-02-18 | 1977-08-22 | Agency Of Ind Science & Technol | Mos integrated circuit |
US4312114A (en) * | 1977-02-24 | 1982-01-26 | The United States Of America As Represented By The Secretary Of The Navy | Method of preparing a thin-film, single-crystal photovoltaic detector |
JPS5763854A (en) * | 1980-10-07 | 1982-04-17 | Toshiba Corp | Semiconductor device |
JPS57130476A (en) * | 1981-02-05 | 1982-08-12 | Sony Corp | Semiconductor device |
JPS57141962A (en) * | 1981-02-27 | 1982-09-02 | Hitachi Ltd | Semiconductor integrated circuit device |
JPS5825264A (ja) * | 1981-08-07 | 1983-02-15 | Hitachi Ltd | 絶縁ゲート型半導体装置 |
EP0102696B1 (en) * | 1982-06-30 | 1989-09-13 | Kabushiki Kaisha Toshiba | Dynamic semiconductor memory and manufacturing method thereof |
KR890004495B1 (ko) * | 1984-11-29 | 1989-11-06 | 가부시끼가이샤 도오시바 | 반도체 장치 |
DE3855533T2 (de) * | 1987-12-28 | 1997-01-23 | Fuji Electric Co Ltd | Halbleiteranordnung mit isoliertem Gate |
JPH0473970A (ja) * | 1990-07-16 | 1992-03-09 | Fuji Electric Co Ltd | Mos型半導体装置 |
JP3001173U (ja) * | 1994-02-18 | 1994-08-23 | 有限会社野々川商事 | 染毛用ブラシ |
JP2768265B2 (ja) * | 1994-04-15 | 1998-06-25 | 株式会社デンソー | 半導体装置 |
JP2803565B2 (ja) * | 1994-04-15 | 1998-09-24 | 株式会社デンソー | 半導体装置の製造方法 |
US6146913A (en) * | 1998-08-31 | 2000-11-14 | Lucent Technologies Inc. | Method for making enhanced performance field effect devices |
FR2789226B1 (fr) * | 1999-01-29 | 2002-06-14 | Commissariat Energie Atomique | Dispositif de protection contre les decharges electrostatiques pour composants microelectroniques sur substrat du type soi |
JP2002208702A (ja) * | 2001-01-10 | 2002-07-26 | Mitsubishi Electric Corp | パワー半導体装置 |
DE102006023429B4 (de) * | 2006-05-18 | 2011-03-10 | Infineon Technologies Ag | ESD-Schutz-Element zur Verwendung in einem elektrischen Schaltkreis |
DE102014105790B4 (de) * | 2014-04-24 | 2019-08-29 | Infineon Technologies Dresden Gmbh | Halbleitervorrichtung mit elektrostatischer Entladungsschutzstruktur |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3469155A (en) * | 1966-09-23 | 1969-09-23 | Westinghouse Electric Corp | Punch-through means integrated with mos type devices for protection against insulation layer breakdown |
US3470390A (en) * | 1968-02-02 | 1969-09-30 | Westinghouse Electric Corp | Integrated back-to-back diodes to prevent breakdown of mis gate dielectric |
US3567508A (en) * | 1968-10-31 | 1971-03-02 | Gen Electric | Low temperature-high vacuum contact formation process |
US3636418A (en) * | 1969-08-06 | 1972-01-18 | Rca Corp | Epitaxial semiconductor device having adherent bonding pads |
-
1971
- 1971-09-03 US US00177790A patent/US3728591A/en not_active Expired - Lifetime
-
1972
- 1972-05-01 CA CA141,016A patent/CA966935A/en not_active Expired
- 1972-05-06 IT IT24028/72A patent/IT955274B/it active
- 1972-05-25 GB GB2469772A patent/GB1339250A/en not_active Expired
- 1972-05-26 AU AU42791/72A patent/AU459838B2/en not_active Expired
- 1972-05-29 NL NL7207246A patent/NL7207246A/xx unknown
- 1972-05-31 DE DE2226613A patent/DE2226613C3/de not_active Expired
- 1972-06-01 SE SE7207184A patent/SE376116B/xx unknown
- 1972-06-01 FR FR7219732A patent/FR2150684B1/fr not_active Expired
- 1972-06-02 JP JP47055556A patent/JPS5138588B2/ja not_active Expired
- 1972-08-31 BE BE788269A patent/BE788269A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
GB1339250A (en) | 1973-11-28 |
IT955274B (it) | 1973-09-29 |
FR2150684B1 (xx) | 1977-07-22 |
JPS4837084A (xx) | 1973-05-31 |
DE2226613A1 (de) | 1973-03-15 |
FR2150684A1 (xx) | 1973-04-13 |
AU4279172A (en) | 1973-11-29 |
BE788269A (fr) | 1972-12-18 |
DE2226613B2 (de) | 1977-12-22 |
CA966935A (en) | 1975-04-29 |
US3728591A (en) | 1973-04-17 |
SE376116B (xx) | 1975-05-05 |
AU459838B2 (en) | 1975-04-10 |
JPS5138588B2 (xx) | 1976-10-22 |
DE2226613C3 (de) | 1978-08-24 |