NL7207131A - - Google Patents

Info

Publication number
NL7207131A
NL7207131A NL7207131A NL7207131A NL7207131A NL 7207131 A NL7207131 A NL 7207131A NL 7207131 A NL7207131 A NL 7207131A NL 7207131 A NL7207131 A NL 7207131A NL 7207131 A NL7207131 A NL 7207131A
Authority
NL
Netherlands
Application number
NL7207131A
Other versions
NL171264C (nl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US00148238A external-priority patent/US3823130A/en
Application filed filed Critical
Publication of NL7207131A publication Critical patent/NL7207131A/xx
Application granted granted Critical
Publication of NL171264C publication Critical patent/NL171264C/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
NL7207131A 1971-05-28 1972-05-26 Werkwijze voor het bereiden van een lichtgevoelig naftochinon-1,2-diazide-(2)-5-sulfonzuurderivaat, werkwijze voor het bereiden van een lichtgevoelig preparaat dat een aldus bereid derivaat bevat, alsmede lichtgevoelig materiaal geschikt voor de vervaardiging van een lithografische drukplaat. NL171264C (nl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US00148238A US3823130A (en) 1971-05-28 1971-05-28 Light sensitive esters of naphthoquinone-1,2-diazide-(2)-5-sulfonicacids with cyclohexylmethanol or secondary or tertiary alkanols of up to six carbon atoms
US16413171A 1971-07-19 1971-07-19
US16955171A 1971-08-05 1971-08-05

Publications (2)

Publication Number Publication Date
NL7207131A true NL7207131A (fr) 1972-11-30
NL171264C NL171264C (nl) 1983-03-01

Family

ID=27386662

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7207131A NL171264C (nl) 1971-05-28 1972-05-26 Werkwijze voor het bereiden van een lichtgevoelig naftochinon-1,2-diazide-(2)-5-sulfonzuurderivaat, werkwijze voor het bereiden van een lichtgevoelig preparaat dat een aldus bereid derivaat bevat, alsmede lichtgevoelig materiaal geschikt voor de vervaardiging van een lithografische drukplaat.

Country Status (9)

Country Link
JP (2) JPS5724341B1 (fr)
BE (1) BE783962A (fr)
CA (1) CA977338A (fr)
CH (1) CH566574A5 (fr)
FR (1) FR2139981B1 (fr)
GB (1) GB1398641A (fr)
IT (1) IT958100B (fr)
NL (1) NL171264C (fr)
SE (1) SE394811B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5820393Y2 (ja) * 1980-12-19 1983-04-27 徳三 長田 ガイドペン
GB2127175A (en) * 1982-09-07 1984-04-04 Letraset International Ltd Manufacture of signs
EP0147596A3 (fr) * 1983-12-30 1987-03-04 International Business Machines Corporation Composition photosensible positive pour réserve lithographique
US5272026A (en) * 1987-12-18 1993-12-21 Ucb S.A. Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
GB8729510D0 (en) * 1987-12-18 1988-02-03 Ucb Sa Photosensitive compositions containing phenolic resins & diazoquinone compounds
JPH0489469A (ja) * 1990-07-27 1992-03-23 Fuji Photo Film Co Ltd 2−ジアゾ−1,2−キノン誘導体、及びそれを用いた画像形成材料

Also Published As

Publication number Publication date
CH566574A5 (fr) 1975-09-15
DE2224843B2 (de) 1976-07-29
SE394811B (sv) 1977-07-11
IT958100B (it) 1973-10-20
CA977338A (en) 1975-11-04
NL171264C (nl) 1983-03-01
DE2224843A1 (de) 1972-12-14
JPS552615B2 (fr) 1980-01-21
BE783962A (fr) 1972-11-27
JPS5494024A (en) 1979-07-25
GB1398641A (en) 1975-06-25
FR2139981B1 (fr) 1973-07-13
FR2139981A1 (fr) 1973-01-12
JPS5724341B1 (fr) 1982-05-24

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Legal Events

Date Code Title Description
BA A request for search or an international-type search has been filed
BB A search report has been drawn up
BC A request for examination has been filed
V1 Lapsed because of non-payment of the annual fee