NL7104800A - - Google Patents

Info

Publication number
NL7104800A
NL7104800A NL7104800A NL7104800A NL7104800A NL 7104800 A NL7104800 A NL 7104800A NL 7104800 A NL7104800 A NL 7104800A NL 7104800 A NL7104800 A NL 7104800A NL 7104800 A NL7104800 A NL 7104800A
Authority
NL
Netherlands
Application number
NL7104800A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of NL7104800A publication Critical patent/NL7104800A/xx

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00Interconnections in chips, wafers or substrates
    • H10W20/40Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00Encapsulations, e.g. protective coatings
    • H10W74/40Encapsulations, e.g. protective coatings characterised by their materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/113Nitrides of boron or aluminum or gallium
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/114Nitrides of silicon
NL7104800A 1970-04-27 1971-04-08 NL7104800A (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2020531A DE2020531C2 (de) 1970-04-27 1970-04-27 Verfahren zur Herstellung von Silizium-Höchstfrequenz-Planartransistoren

Publications (1)

Publication Number Publication Date
NL7104800A true NL7104800A (https=) 1971-10-29

Family

ID=5769521

Family Applications (1)

Application Number Title Priority Date Filing Date
NL7104800A NL7104800A (https=) 1970-04-27 1971-04-08

Country Status (8)

Country Link
US (1) US3798080A (https=)
JP (1) JPS5652444B1 (https=)
CA (1) CA918307A (https=)
CH (1) CH522291A (https=)
DE (1) DE2020531C2 (https=)
FR (1) FR2086373B1 (https=)
GB (1) GB1308764A (https=)
NL (1) NL7104800A (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3977920A (en) * 1970-10-30 1976-08-31 Hitachi, Ltd. Method of fabricating semiconductor device using at least two sorts of insulating films different from each other
US3860466A (en) * 1971-10-22 1975-01-14 Texas Instruments Inc Nitride composed masking for integrated circuits
JPS6028397B2 (ja) * 1978-10-26 1985-07-04 株式会社東芝 半導体装置の製造方法
US4402128A (en) * 1981-07-20 1983-09-06 Rca Corporation Method of forming closely spaced lines or contacts in semiconductor devices
JPS6192150U (https=) * 1984-11-22 1986-06-14
JP6900727B2 (ja) 2017-03-28 2021-07-07 横河電機株式会社 エンジニアリング支援システム、エンジニアリング支援方法、クライアント装置、及びクライアントプログラム
JP6897452B2 (ja) 2017-09-22 2021-06-30 横河電機株式会社 情報収集システム
JP2019057196A (ja) 2017-09-22 2019-04-11 横河電機株式会社 情報収集装置、情報収集方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3477886A (en) * 1964-12-07 1969-11-11 Motorola Inc Controlled diffusions in semiconductive materials
US3597667A (en) * 1966-03-01 1971-08-03 Gen Electric Silicon oxide-silicon nitride coatings for semiconductor devices
DE158928C (https=) * 1966-09-26
DE1614435B2 (de) * 1967-02-23 1979-05-23 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen von aus Germanium bestehenden, doppeldiffundierten Halbleiteranordnungen
US3475234A (en) * 1967-03-27 1969-10-28 Bell Telephone Labor Inc Method for making mis structures
NL6807952A (https=) * 1967-07-06 1969-01-08
FR2020020B1 (https=) * 1968-10-07 1974-09-20 Ibm
US3615940A (en) * 1969-03-24 1971-10-26 Motorola Inc Method of forming a silicon nitride diffusion mask

Also Published As

Publication number Publication date
CA918307A (en) 1973-01-02
DE2020531C2 (de) 1982-10-21
CH522291A (de) 1972-06-15
JPS5652444B1 (https=) 1981-12-12
GB1308764A (en) 1973-03-07
DE2020531A1 (de) 1971-11-18
FR2086373B1 (https=) 1977-08-05
US3798080A (en) 1974-03-19
FR2086373A1 (https=) 1971-12-31

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