NL292373A - - Google Patents

Info

Publication number
NL292373A
NL292373A NL292373DA NL292373A NL 292373 A NL292373 A NL 292373A NL 292373D A NL292373D A NL 292373DA NL 292373 A NL292373 A NL 292373A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL292373A publication Critical patent/NL292373A/xx

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01GCOMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G15/00Compounds of gallium, indium or thallium
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02Epitaxial-layer growth
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00Metal treatment
    • Y10S148/072Heterojunctions

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Led Devices (AREA)
NL292373D 1962-07-09 NL292373A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US208365A US3197411A (en) 1962-07-09 1962-07-09 Process for growing gallium phosphide and gallium arsenide crystals from a ga o and hydrogen vapor mixture

Publications (1)

Publication Number Publication Date
NL292373A true NL292373A (de)

Family

ID=22774325

Family Applications (1)

Application Number Title Priority Date Filing Date
NL292373D NL292373A (de) 1962-07-09

Country Status (7)

Country Link
US (1) US3197411A (de)
CH (1) CH443232A (de)
DE (1) DE1250789B (de)
ES (1) ES287732A1 (de)
GB (1) GB1042933A (de)
NL (1) NL292373A (de)
SE (1) SE309632B (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1242580B (de) * 1963-10-28 1967-06-22 Philips Nv Verfahren zum Herstellen oder Umkristallisieren von Borphosphid
DE1544259A1 (de) * 1965-02-05 1970-07-09 Siemens Ag Verfahren zum Herstellen von gleichmaessigen epitaktischen Aufwachsschichten
US3523045A (en) * 1965-03-01 1970-08-04 North American Rockwell Coherent radiation device
US3397094A (en) * 1965-03-25 1968-08-13 James E. Webb Method of changing the conductivity of vapor deposited gallium arsenide by the introduction of water into the vapor deposition atmosphere
DE1289830B (de) * 1965-08-05 1969-02-27 Siemens Ag Verfahren zum Herstellen epitaktischer Aufwachsschichten aus halbleitenden A B-Verbindungen
US3476593A (en) * 1967-01-24 1969-11-04 Fairchild Camera Instr Co Method of forming gallium arsenide films by vacuum deposition techniques
DE1901319A1 (de) * 1969-01-11 1970-08-06 Siemens Ag Verfahren zur Herstellung von hochreinem Galliumarsenid
GB2205328B (en) * 1987-05-25 1991-08-21 Nippon Sheet Glass Co Ltd Method of manufacturing phosphorus compound film
US5348911A (en) * 1987-06-30 1994-09-20 Aixtron Gmbh Material-saving process for fabricating mixed crystals
DE3721638A1 (de) * 1987-06-30 1989-01-12 Aixtron Gmbh Materialsparendes verfahren zur herstellung von mischkristallen
JP5575482B2 (ja) 2006-11-22 2014-08-20 ソイテック 単結晶iii−v族半導体材料のエピタキシャル堆積法、及び堆積システム
US9580836B2 (en) * 2006-11-22 2017-02-28 Soitec Equipment for high volume manufacture of group III-V semiconductor materials
EP2094406B1 (de) 2006-11-22 2015-10-14 Soitec Verfahren, vorrichtung und absperrventil für die herstellung von einkristallinen gruppe iii-v halbleiter material

Also Published As

Publication number Publication date
CH443232A (de) 1967-09-15
ES287732A1 (es) 1963-12-16
SE309632B (de) 1969-03-31
GB1042933A (en) 1966-09-21
US3197411A (en) 1965-07-27
DE1250789B (de) 1967-09-28

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