NL2024436A - Direct drive reticle safety latch - Google Patents

Direct drive reticle safety latch Download PDF

Info

Publication number
NL2024436A
NL2024436A NL2024436A NL2024436A NL2024436A NL 2024436 A NL2024436 A NL 2024436A NL 2024436 A NL2024436 A NL 2024436A NL 2024436 A NL2024436 A NL 2024436A NL 2024436 A NL2024436 A NL 2024436A
Authority
NL
Netherlands
Prior art keywords
reticle
safety
safety latch
rotating shaft
latch
Prior art date
Application number
NL2024436A
Other languages
English (en)
Dutch (nl)
Inventor
Robert Burroughs John
Chavez Isaac
Original Assignee
Asml Holding Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv filed Critical Asml Holding Nv
Publication of NL2024436A publication Critical patent/NL2024436A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Accessory Devices And Overall Control Thereof (AREA)
  • Pile Receivers (AREA)
NL2024436A 2018-12-21 2019-12-12 Direct drive reticle safety latch NL2024436A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US201862783896P 2018-12-21 2018-12-21

Publications (1)

Publication Number Publication Date
NL2024436A true NL2024436A (en) 2020-07-07

Family

ID=69055987

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2024436A NL2024436A (en) 2018-12-21 2019-12-12 Direct drive reticle safety latch

Country Status (4)

Country Link
JP (1) JP7455844B2 (zh)
CN (1) CN113227903A (zh)
NL (1) NL2024436A (zh)
WO (1) WO2020126813A2 (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117561481A (zh) * 2021-07-14 2024-02-13 Asml控股股份有限公司 光刻设备、锁定装置和方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5485679A (en) * 1977-12-20 1979-07-07 Canon Inc Wafer aligning unit
US6027148A (en) * 1998-06-12 2000-02-22 Shoemaker; Rodney Security device for a movable closure and method therefor
US6783299B2 (en) * 1999-07-26 2004-08-31 Ovadia Meron Latch for detachably attaching and mounting a semiconductor wafer to a support ring
JP2001092141A (ja) * 1999-09-17 2001-04-06 Fuji Photo Film Co Ltd 印刷版自動露光装置、印刷版運搬用台車及び印刷版自動露光装置用台車の受け渡し構造
KR100340154B1 (ko) * 1999-12-06 2002-06-10 김광교 웨이퍼를 스피닝하기 위한 웨이퍼 척
BR0300148B1 (pt) * 2003-01-10 2012-12-11 aperfeiçoamento em mecanismo de segurança para janela ou porta de correr ou similar.
KR100495819B1 (ko) * 2003-06-14 2005-06-16 미래산업 주식회사 반도체 소자 테스트 핸들러의 소자 안착장치
TWI245170B (en) * 2003-07-22 2005-12-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
DE102004012766A1 (de) * 2004-03-15 2005-10-13 Mirae Corp., Cheonan Trägermodul für Halbleitervorrichtungstesthandler
KR100551993B1 (ko) * 2004-12-03 2006-02-20 미래산업 주식회사 반도체 소자 테스트 핸들러용 캐리어 모듈
KR100707241B1 (ko) * 2005-05-23 2007-04-13 (주)티에스이 반도체 패키지 수납용 인서트
US20180040502A1 (en) * 2016-08-05 2018-02-08 Lam Research Ag Apparatus for processing wafer-shaped articles
KR101943057B1 (ko) * 2017-05-22 2019-04-17 오세덕 반도체 제조설비의 웨이퍼 맵핑장치

Also Published As

Publication number Publication date
WO2020126813A2 (en) 2020-06-25
CN113227903A (zh) 2021-08-06
JP2022515746A (ja) 2022-02-22
WO2020126813A3 (en) 2020-09-17
JP7455844B2 (ja) 2024-03-26

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