NL2010457C2 - Hartmann wavefront measuring instrument adapted for non-uniform light illumination. - Google Patents

Hartmann wavefront measuring instrument adapted for non-uniform light illumination. Download PDF

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Publication number
NL2010457C2
NL2010457C2 NL2010457A NL2010457A NL2010457C2 NL 2010457 C2 NL2010457 C2 NL 2010457C2 NL 2010457 A NL2010457 A NL 2010457A NL 2010457 A NL2010457 A NL 2010457A NL 2010457 C2 NL2010457 C2 NL 2010457C2
Authority
NL
Netherlands
Prior art keywords
wavefront
slope
reconstruction
reconstruction matrix
measuring instrument
Prior art date
Application number
NL2010457A
Other languages
English (en)
Dutch (nl)
Other versions
NL2010457A (en
Inventor
Jie Mu
Xuejun Rao
Changhui Rao
Xiaoyu Ma
Original Assignee
Inst Optics & Elect Cn Acad
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Inst Optics & Elect Cn Acad filed Critical Inst Optics & Elect Cn Acad
Publication of NL2010457A publication Critical patent/NL2010457A/en
Application granted granted Critical
Publication of NL2010457C2 publication Critical patent/NL2010457C2/en

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4228—Photometry, e.g. photographic exposure meter using electric radiation detectors arrangements with two or more detectors, e.g. for sensitivity compensation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
NL2010457A 2012-03-19 2013-03-15 Hartmann wavefront measuring instrument adapted for non-uniform light illumination. NL2010457C2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN201210072934.7A CN102589720B (zh) 2012-03-19 2012-03-19 一种适用于非均匀光照明的哈特曼波前测量仪
CN201210072934 2012-03-19

Publications (2)

Publication Number Publication Date
NL2010457A NL2010457A (en) 2013-09-23
NL2010457C2 true NL2010457C2 (en) 2014-03-03

Family

ID=46478683

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2010457A NL2010457C2 (en) 2012-03-19 2013-03-15 Hartmann wavefront measuring instrument adapted for non-uniform light illumination.

Country Status (2)

Country Link
CN (1) CN102589720B (zh)
NL (1) NL2010457C2 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105842848A (zh) * 2016-06-15 2016-08-10 中国科学院长春光学精密机械与物理研究所 哈特曼波前探测器电子倍增增益的自适应控制方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104239740B (zh) * 2014-09-26 2018-04-13 中国科学院光电技术研究所 一种基于哈特曼波前传感器的模式波前复原方法
CN106644059B (zh) * 2016-09-14 2018-07-31 苏州大学 一种光束的双关联函数的测量方法
CN106441084B (zh) * 2016-11-21 2019-02-01 深圳大学 基于微全息阵列的波前传感器、波前探测方法及系统
CN108151888B (zh) * 2017-11-22 2019-09-27 中国科学院长春光学精密机械与物理研究所 一种用于扫描哈特曼检测装置的误差解耦的方法
CN109029719B (zh) * 2018-06-25 2020-12-25 南京理工大学 基于夏克哈特曼法的紫外光能分布探测系统及其探测方法
CN116659686B (zh) * 2023-04-27 2024-06-28 西安工业大学 一种波前重建方法及装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5777719A (en) * 1996-12-23 1998-07-07 University Of Rochester Method and apparatus for improving vision and the resolution of retinal images
US6199986B1 (en) * 1999-10-21 2001-03-13 University Of Rochester Rapid, automatic measurement of the eye's wave aberration
CN100573065C (zh) * 2006-08-07 2009-12-23 中国科学院光电技术研究所 一种基于线性相位反演的波前测量方法
JP2009162614A (ja) * 2008-01-07 2009-07-23 Mitsubishi Electric Corp 光波面計測装置
JP5452032B2 (ja) * 2009-02-13 2014-03-26 株式会社日立製作所 波面収差測定方法及びその装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105842848A (zh) * 2016-06-15 2016-08-10 中国科学院长春光学精密机械与物理研究所 哈特曼波前探测器电子倍增增益的自适应控制方法

Also Published As

Publication number Publication date
NL2010457A (en) 2013-09-23
CN102589720A (zh) 2012-07-18
CN102589720B (zh) 2014-01-01

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