NL2007015C2 - SCINTILLATOR ARRAYS AND METHODS OF MAKING THE SAME. - Google Patents
SCINTILLATOR ARRAYS AND METHODS OF MAKING THE SAME. Download PDFInfo
- Publication number
- NL2007015C2 NL2007015C2 NL2007015A NL2007015A NL2007015C2 NL 2007015 C2 NL2007015 C2 NL 2007015C2 NL 2007015 A NL2007015 A NL 2007015A NL 2007015 A NL2007015 A NL 2007015A NL 2007015 C2 NL2007015 C2 NL 2007015C2
- Authority
- NL
- Netherlands
- Prior art keywords
- layer
- scintillator
- array
- reflectors
- scintiilators
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 29
- 238000009499 grossing Methods 0.000 claims description 24
- 239000002131 composite material Substances 0.000 claims description 20
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 239000003638 chemical reducing agent Substances 0.000 claims description 5
- 238000001465 metallisation Methods 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052703 rhodium Inorganic materials 0.000 claims description 2
- 239000010948 rhodium Substances 0.000 claims description 2
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 2
- 230000003746 surface roughness Effects 0.000 claims description 2
- 239000010410 layer Substances 0.000 claims 22
- 239000012790 adhesive layer Substances 0.000 claims 1
- 239000002355 dual-layer Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 16
- 239000000758 substrate Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000003491 array Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000002591 computed tomography Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000002161 passivation Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 239000002923 metal particle Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000012071 phase Substances 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
- 150000002910 rare earth metals Chemical class 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 239000004593 Epoxy Substances 0.000 description 3
- 229910052765 Lutetium Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000002223 garnet Substances 0.000 description 3
- 238000003384 imaging method Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 description 2
- 229910052688 Gadolinium Inorganic materials 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229920002635 polyurethane Polymers 0.000 description 2
- 239000004814 polyurethane Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000006722 reduction reaction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 229920001169 thermoplastic Polymers 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 238000007704 wet chemistry method Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- MCVAAHQLXUXWLC-UHFFFAOYSA-N [O-2].[O-2].[S-2].[Gd+3].[Gd+3] Chemical compound [O-2].[O-2].[S-2].[Gd+3].[Gd+3] MCVAAHQLXUXWLC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- FNCIDSNKNZQJTJ-UHFFFAOYSA-N alumane;terbium Chemical compound [AlH3].[Tb] FNCIDSNKNZQJTJ-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- SILMSBFCJHBWJS-UHFFFAOYSA-K bis(germine-1-carbonyloxy)bismuthanyl germine-1-carboxylate Chemical compound [Bi+3].[O-]C(=O)[Ge]1=CC=CC=C1.[O-]C(=O)[Ge]1=CC=CC=C1.[O-]C(=O)[Ge]1=CC=CC=C1 SILMSBFCJHBWJS-UHFFFAOYSA-K 0.000 description 1
- XQPRBTXUXXVTKB-UHFFFAOYSA-M caesium iodide Chemical compound [I-].[Cs+] XQPRBTXUXXVTKB-UHFFFAOYSA-M 0.000 description 1
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical compound [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001942 caesium oxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000002059 diagnostic imaging Methods 0.000 description 1
- NKTZYSOLHFIEMF-UHFFFAOYSA-N dioxido(dioxo)tungsten;lead(2+) Chemical compound [Pb+2].[O-][W]([O-])(=O)=O NKTZYSOLHFIEMF-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000001902 propagating effect Effects 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- -1 terbium lutetium aluminum Chemical compound 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
- G01T1/20—Measuring radiation intensity with scintillation detectors
- G01T1/2002—Optical details, e.g. reflecting or diffusing layers
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Measurement Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/826,808 US8247778B2 (en) | 2010-06-30 | 2010-06-30 | Scintillator arrays and methods of making the same |
| US82680810 | 2010-06-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| NL2007015A NL2007015A (en) | 2012-01-02 |
| NL2007015C2 true NL2007015C2 (en) | 2012-12-17 |
Family
ID=44675783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| NL2007015A NL2007015C2 (en) | 2010-06-30 | 2011-06-29 | SCINTILLATOR ARRAYS AND METHODS OF MAKING THE SAME. |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8247778B2 (enExample) |
| JP (1) | JP2012013694A (enExample) |
| DE (1) | DE102011051389A1 (enExample) |
| NL (1) | NL2007015C2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102985845B (zh) * | 2010-07-06 | 2015-11-25 | 皇家飞利浦电子股份有限公司 | 用于产生具有银（Ag）基间隙的闪烁体阵列的方法 |
| EP2428820A3 (en) * | 2010-09-13 | 2012-05-09 | Siemens Aktiengesellschaft | Silicon photomultiplier and radiation detector |
| JP6041594B2 (ja) * | 2012-09-14 | 2016-12-14 | 浜松ホトニクス株式会社 | シンチレータパネル、及び、放射線検出器 |
| JP6298264B2 (ja) * | 2012-10-31 | 2018-03-20 | キヤノン株式会社 | シンチレータ、放射線検出装置、および、それらの製造方法 |
| US8981306B2 (en) * | 2012-12-17 | 2015-03-17 | General Electric Company | Scintillator arrays and methods of making scintillator arrays |
| KR102142962B1 (ko) * | 2013-01-08 | 2020-08-10 | 비바모스 리미티드 | 다층 코팅을 포함하는 x-선 섬광체 |
| JP6090995B2 (ja) * | 2013-04-25 | 2017-03-08 | 国立大学法人 東京大学 | 光子検出装置および放射線測定装置 |
| US9599722B2 (en) * | 2013-05-10 | 2017-03-21 | Koninklijke Philips N.V. | Large-area scintillator element and radiation detectors and radiation absorption event locating systems using same |
| DE102015210361A1 (de) * | 2015-06-05 | 2016-12-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Flächendetektor für EUV- und/oder weiche Röntgenstrahlung |
| DE102015218581B4 (de) | 2015-09-28 | 2019-11-14 | Siemens Healthcare Gmbh | Digital-Analog-Wandler für Mehrschwellenzähler mit Partitionierung der Bits zwischen R-Leiter und Komparator |
| WO2021020491A1 (ja) | 2019-07-31 | 2021-02-04 | キヤノン株式会社 | シンチレータユニット、及び放射線検出器 |
| JP7494040B2 (ja) * | 2019-07-31 | 2024-06-03 | キヤノン株式会社 | シンチレータユニット、及び放射線検出器 |
| KR102767969B1 (ko) * | 2022-05-12 | 2025-02-12 | 중앙대학교 산학협력단 | 섬광 검출기 및 이의 제조 방법 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3002571B2 (ja) * | 1991-08-13 | 2000-01-24 | 株式会社日立製作所 | 放射線検出器 |
| US5519227A (en) * | 1994-08-08 | 1996-05-21 | The University Of Massachusetts Medical Center | Structured scintillation screens |
| JPH10319126A (ja) * | 1997-05-16 | 1998-12-04 | S I I R D Center:Kk | 放射線検出器とその製造方法 |
| JP2001099941A (ja) * | 1999-09-30 | 2001-04-13 | Hitachi Metals Ltd | 放射線遮蔽板、放射線検出器及び放射線遮蔽板の製造方法 |
| JP2002022838A (ja) * | 2000-07-05 | 2002-01-23 | Hitachi Medical Corp | マルチスライス型ｘ線検出器とその製造方法及びこれを用いたｘ線ｃｔ装置 |
| JP2002131438A (ja) * | 2000-10-26 | 2002-05-09 | Canon Inc | 放射線検出装置およびこれを用いた放射線画像形成装置 |
| US6556602B2 (en) | 2000-12-05 | 2003-04-29 | The Boeing Company | Electron beam pumped semiconductor laser screen and associated fabrication method |
| TWI231886B (en) | 2003-01-08 | 2005-05-01 | Silicon Optix Inc | Image projection system and method |
| US7164134B2 (en) | 2003-08-01 | 2007-01-16 | General Electric Company | High performance CT reflector for a scintillator array and method for making same |
| US6898265B1 (en) * | 2003-11-20 | 2005-05-24 | Ge Medical Systems Global Technology Company, Llc | Scintillator arrays for radiation detectors and methods of manufacture |
| US7308074B2 (en) | 2003-12-11 | 2007-12-11 | General Electric Company | Multi-layer reflector for CT detector |
| CN101779145B (zh) * | 2007-08-22 | 2017-11-21 | 皇家飞利浦电子股份有限公司 | 一种辐射探测方法 |
| WO2010075384A2 (en) * | 2008-12-23 | 2010-07-01 | Saint-Gobain Ceramics & Plastics, Inc. | Scintillation separator |
-
2010
- 2010-06-30 US US12/826,808 patent/US8247778B2/en active Active
-
2011
- 2011-06-24 JP JP2011139970A patent/JP2012013694A/ja active Pending
- 2011-06-28 DE DE102011051389A patent/DE102011051389A1/de not_active Ceased
- 2011-06-29 NL NL2007015A patent/NL2007015C2/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012013694A (ja) | 2012-01-19 |
| US20120001078A1 (en) | 2012-01-05 |
| NL2007015A (en) | 2012-01-02 |
| DE102011051389A1 (de) | 2012-03-01 |
| US8247778B2 (en) | 2012-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM | Lapsed because of non-payment of the annual fee |
Effective date: 20210701 |