NL2002003A1 - Inrichting voor het genereren van EUV-straling. - Google Patents

Inrichting voor het genereren van EUV-straling.

Info

Publication number
NL2002003A1
NL2002003A1 NL2002003A NL2002003A NL2002003A1 NL 2002003 A1 NL2002003 A1 NL 2002003A1 NL 2002003 A NL2002003 A NL 2002003A NL 2002003 A NL2002003 A NL 2002003A NL 2002003 A1 NL2002003 A1 NL 2002003A1
Authority
NL
Netherlands
Prior art keywords
euv radiation
generating euv
generating
radiation
euv
Prior art date
Application number
NL2002003A
Other languages
English (en)
Other versions
NL2002003C2 (nl
Inventor
Vladimir Korobochko
Juergen Kleinschmidt
Original Assignee
Xtreme Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Tech Gmbh filed Critical Xtreme Tech Gmbh
Publication of NL2002003A1 publication Critical patent/NL2002003A1/nl
Application granted granted Critical
Publication of NL2002003C2 publication Critical patent/NL2002003C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70083—Non-homogeneous intensity distribution in the mask plane
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
NL2002003A 2007-10-22 2008-09-22 Inrichting voor het genereren van euv-straling. NL2002003C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007051295 2007-10-22
DE102007051295A DE102007051295B4 (de) 2007-10-22 2007-10-22 Anordnung zur Erzeugung von EUV-Strahlung

Publications (2)

Publication Number Publication Date
NL2002003A1 true NL2002003A1 (nl) 2009-04-23
NL2002003C2 NL2002003C2 (nl) 2011-08-30

Family

ID=40459002

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2002003A NL2002003C2 (nl) 2007-10-22 2008-09-22 Inrichting voor het genereren van euv-straling.

Country Status (4)

Country Link
US (1) US9170505B2 (nl)
JP (1) JP4385079B2 (nl)
DE (1) DE102007051295B4 (nl)
NL (1) NL2002003C2 (nl)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5093267B2 (ja) * 2010-03-11 2012-12-12 ウシオ電機株式会社 集光鏡アッセンブリおよびこの集光鏡アッセンブリを用いた極端紫外光光源装置
CN103531263B (zh) * 2013-11-04 2016-07-06 中国科学院光电研究院 一种使用电场降低碎屑的方法、装置和euv光源系统

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6827824B1 (en) * 1996-04-12 2004-12-07 Micron Technology, Inc. Enhanced collimated deposition
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
DE10237901B3 (de) * 2002-08-16 2004-05-27 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von Teilchenemission bei der Strahlungserzeugung einer Röntgenstrahlungsquelle
DE10260458B3 (de) * 2002-12-19 2004-07-22 Xtreme Technologies Gmbh Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung
DE102005020521B4 (de) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
DE102005048670B3 (de) * 2005-10-07 2007-05-24 Xtreme Technologies Gmbh Anordnung zur Unterdrückung von unerwünschten Spektralanteilen bei einer plasmabasierten EUV-Strahlungsquelle

Also Published As

Publication number Publication date
JP2009105399A (ja) 2009-05-14
DE102007051295A1 (de) 2009-04-23
US9170505B2 (en) 2015-10-27
JP4385079B2 (ja) 2009-12-16
NL2002003C2 (nl) 2011-08-30
DE102007051295B4 (de) 2009-08-06
US20090101850A1 (en) 2009-04-23

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AD1A A request for search or an international type search has been filed
SD Assignments of patents

Effective date: 20140214