NL2001798A1 - Werkwijze en inrichting voor het reinigen van optische oppervlakken in op plasma gebaseerde stralingsbronnen. - Google Patents

Werkwijze en inrichting voor het reinigen van optische oppervlakken in op plasma gebaseerde stralingsbronnen.

Info

Publication number
NL2001798A1
NL2001798A1 NL2001798A NL2001798A NL2001798A1 NL 2001798 A1 NL2001798 A1 NL 2001798A1 NL 2001798 A NL2001798 A NL 2001798A NL 2001798 A NL2001798 A NL 2001798A NL 2001798 A1 NL2001798 A1 NL 2001798A1
Authority
NL
Netherlands
Prior art keywords
plasma
radiation sources
optical surfaces
based radiation
cleaning optical
Prior art date
Application number
NL2001798A
Other languages
English (en)
Other versions
NL2001798C2 (nl
Inventor
Guido Schriever
Original Assignee
Xtreme Tech Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xtreme Tech Gmbh filed Critical Xtreme Tech Gmbh
Publication of NL2001798A1 publication Critical patent/NL2001798A1/nl
Application granted granted Critical
Publication of NL2001798C2 publication Critical patent/NL2001798C2/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B5/00—Cleaning by methods involving the use of air flow or gas flow
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H05H1/2443—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube
    • H05H1/245—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes the plasma fluid flowing through a dielectric tube the plasma being activated using internal electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/40—Surface treatments

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Fluid Mechanics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2001798A 2007-07-14 2008-07-14 Werkwijze en inrichting voor het reinigen van optische oppervlakken in op plasma gebaseerde stralingsbronnen. NL2001798C2 (nl)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102007033701 2007-07-14
DE102007033701A DE102007033701A1 (de) 2007-07-14 2007-07-14 Verfahren und Anordnung zur Reinigung von optischen Oberflächen in plasmabasierten Strahlungsquellen

Publications (2)

Publication Number Publication Date
NL2001798A1 true NL2001798A1 (nl) 2009-01-15
NL2001798C2 NL2001798C2 (nl) 2009-05-25

Family

ID=40148993

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2001798A NL2001798C2 (nl) 2007-07-14 2008-07-14 Werkwijze en inrichting voor het reinigen van optische oppervlakken in op plasma gebaseerde stralingsbronnen.

Country Status (4)

Country Link
US (1) US8147647B2 (nl)
JP (1) JP5175626B2 (nl)
DE (1) DE102007033701A1 (nl)
NL (1) NL2001798C2 (nl)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE528692T1 (de) * 2006-07-28 2011-10-15 Media Lario Srl Optische multireflexionssysteme und ihre herstellung
JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
JP2011023712A (ja) * 2009-06-19 2011-02-03 Gigaphoton Inc 極端紫外光源装置
CZ21084U1 (cs) * 2010-05-19 2010-07-02 Výzkumný ústav vodohospodárský, T.G.Masaryka, v.v.i. Zarízení pro fyzikální úpravu odpadu
US20120090880A1 (en) * 2010-10-19 2012-04-19 International Business Machines Corporation Mitigation and elimination of tin whiskers
US8399868B2 (en) * 2011-02-15 2013-03-19 Sematech Inc. Tools, methods and devices for mitigating extreme ultraviolet optics contamination
WO2013189827A2 (en) 2012-06-22 2013-12-27 Asml Netherlands B.V. Radiation source and lithographic apparatus.
US10953441B2 (en) 2013-03-15 2021-03-23 Kla Corporation System and method for cleaning optical surfaces of an extreme ultraviolet optical system
US9810991B2 (en) * 2013-12-23 2017-11-07 Kla-Tencor Corporation System and method for cleaning EUV optical elements
US9539622B2 (en) * 2014-03-18 2017-01-10 Asml Netherlands B.V. Apparatus for and method of active cleaning of EUV optic with RF plasma field
WO2017077641A1 (ja) 2015-11-06 2017-05-11 ギガフォトン株式会社 極端紫外光生成装置
US9888554B2 (en) 2016-01-21 2018-02-06 Asml Netherlands B.V. System, method and apparatus for target material debris cleaning of EUV vessel and EUV collector
US10446373B2 (en) * 2017-03-17 2019-10-15 Cu Aerospace, Llc Cyclotronic plasma actuator with arc-magnet for active flow control
US10332724B2 (en) * 2017-03-17 2019-06-25 Cu Aerospace, Llc Cyclotronic plasma actuator with arc-magnet for active flow control
CN111316171B (zh) * 2017-11-02 2023-05-09 Asml荷兰有限公司 清洁极紫外光源的腔室内的光学器件的表面
DE102017221143A1 (de) * 2017-11-27 2019-05-29 Carl Zeiss Smt Gmbh Anordnung für eine EUV-Lithographieanlage
KR20200096777A (ko) * 2017-12-15 2020-08-13 에이에스엠엘 네델란즈 비.브이. 진공 용기 내의 파편 플럭스 측정 시스템의 재생 방법
CN111712765A (zh) * 2018-02-13 2020-09-25 Asml荷兰有限公司 清洁euv腔室中的结构表面
DE102018211498A1 (de) * 2018-07-11 2019-08-01 Carl Zeiss Smt Gmbh Optische Anordnung
US10990026B2 (en) * 2018-08-14 2021-04-27 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography apparatus and cleaning method thereof
US11048180B2 (en) * 2018-09-25 2021-06-29 Asml Netherlands B.V. Component for use in a patterning device environment
KR20200052124A (ko) 2018-11-06 2020-05-14 삼성전자주식회사 Euv 집광 장치 및 상기 euv 집광 장치를 포함하는 리소그래피 장치
CN109687264B (zh) * 2019-01-16 2024-04-19 核工业理化工程研究院 有效去带电粒子污染的腔镜保护装置、激光器及控制方法
EP3933882A1 (en) 2020-07-01 2022-01-05 Carl Zeiss SMT GmbH Apparatus and method for atomic layer processing
CN113954268B (zh) * 2021-10-28 2023-09-12 益路恒丰衡水沥青科技有限公司 胶粉微波脱硫设备的介质片清洗系统

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19532105C2 (de) * 1994-08-30 2002-11-14 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Behandlung von dreidimensionalen Werkstücken mit einer direkten Barrierenentladung sowie Verfahren zur Herstellung einer mit einer Barriere versehenen Elektrode für diese Barrierenentladung
DE19717698A1 (de) * 1997-04-26 1998-10-29 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Reinigung von Aktivierung von elektrischen Leiterbahnen und Platinenoberflächen
DE19903533A1 (de) * 1999-01-29 2000-08-10 Degussa Verfahren zur selektiven katalytischen Reduktion von Stickoxiden in sauerstoffhaltigen Abgasen
JP3982153B2 (ja) * 1999-07-27 2007-09-26 松下電工株式会社 プラズマ処理装置及びプラズマ処理方法
FR2836158B1 (fr) * 2002-02-19 2005-01-07 Usinor Procede de nettoyage par plasma de la surface d'un materiau enduit d'une substance organique, et installation de mise en oeuvre
JP4092937B2 (ja) * 2002-04-11 2008-05-28 松下電工株式会社 プラズマ処理装置及びプラズマ処理方法
US6968850B2 (en) 2002-07-15 2005-11-29 Intel Corporation In-situ cleaning of light source collector optics
US20040011381A1 (en) 2002-07-17 2004-01-22 Klebanoff Leonard E. Method for removing carbon contamination from optic surfaces
US7288204B2 (en) * 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
DE10257344A1 (de) * 2002-12-06 2004-07-08 OTB Oberflächentechnik in Berlin GmbH & Co. Verfahren zur Konservierung von Metalloberflächen
EP1431828A1 (en) * 2002-12-20 2004-06-23 ASML Netherlands B.V. Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
TWI251117B (en) * 2002-12-20 2006-03-11 Asml Netherlands Bv Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
JP4613167B2 (ja) * 2003-05-22 2011-01-12 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの光学要素を洗浄する方法および装置
WO2005000363A2 (en) * 2003-06-16 2005-01-06 Cerionx, Inc. Atmospheric pressure non-thermal plasma device to clean and sterilize the surface of probes, cannulas, pin tools, pipettes and spray heads
GB0408543D0 (en) 2004-04-16 2004-05-19 Boc Group Plc Cleaning of multi-layer mirrors
JP4565194B2 (ja) * 2004-12-17 2010-10-20 国立大学法人大阪大学 極端紫外光・ｘ線源用ターゲット及びその製造方法
JP2006202671A (ja) * 2005-01-24 2006-08-03 Ushio Inc 極端紫外光光源装置及び極端紫外光光源装置で発生するデブリの除去方法
US7646004B2 (en) * 2005-05-24 2010-01-12 Carl Zeiss Smt Ag Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical element
JP5124452B2 (ja) * 2005-06-21 2013-01-23 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 照射ユニット光学面の二段階クリーニング方法
JP4710463B2 (ja) * 2005-07-21 2011-06-29 ウシオ電機株式会社 極端紫外光発生装置
US8317929B2 (en) * 2005-09-16 2012-11-27 Asml Netherlands B.V. Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7628865B2 (en) * 2006-04-28 2009-12-08 Asml Netherlands B.V. Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
JP2009016640A (ja) * 2007-07-06 2009-01-22 Ushio Inc 極端紫外光光源装置及び極端紫外光集光鏡のクリーニング方法

Also Published As

Publication number Publication date
NL2001798C2 (nl) 2009-05-25
JP2009021566A (ja) 2009-01-29
US20090014027A1 (en) 2009-01-15
US8147647B2 (en) 2012-04-03
DE102007033701A1 (de) 2009-01-22
JP5175626B2 (ja) 2013-04-03

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