NL2000577A1 - Inrichting en werkwijze voor deeltjes bewaking in immersielithografie. - Google Patents
Inrichting en werkwijze voor deeltjes bewaking in immersielithografie.Info
- Publication number
- NL2000577A1 NL2000577A1 NL2000577A NL2000577A NL2000577A1 NL 2000577 A1 NL2000577 A1 NL 2000577A1 NL 2000577 A NL2000577 A NL 2000577A NL 2000577 A NL2000577 A NL 2000577A NL 2000577 A1 NL2000577 A1 NL 2000577A1
- Authority
- NL
- Netherlands
- Prior art keywords
- immersion lithography
- particle monitoring
- particle
- monitoring
- lithography
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/383,912 US7602471B2 (en) | 2006-05-17 | 2006-05-17 | Apparatus and method for particle monitoring in immersion lithography |
US38391206 | 2006-05-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
NL2000577A1 true NL2000577A1 (nl) | 2007-11-20 |
NL2000577C2 NL2000577C2 (nl) | 2007-12-19 |
Family
ID=38711666
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2000577A NL2000577C2 (nl) | 2006-05-17 | 2007-04-05 | Inrichting en werkwijze voor deeltjes bewaking in immersielithografie. |
Country Status (5)
Country | Link |
---|---|
US (1) | US7602471B2 (nl) |
JP (2) | JP2007311751A (nl) |
CN (1) | CN101075095B (nl) |
NL (1) | NL2000577C2 (nl) |
TW (1) | TWI344583B (nl) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8068208B2 (en) * | 2006-12-01 | 2011-11-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | System and method for improving immersion scanner overlay performance |
KR100830586B1 (ko) * | 2006-12-12 | 2008-05-21 | 삼성전자주식회사 | 기판을 노광하는 장치 및 방법 |
JP4366407B2 (ja) * | 2007-02-16 | 2009-11-18 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
NL1035908A1 (nl) * | 2007-09-25 | 2009-03-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
SG151198A1 (en) * | 2007-09-27 | 2009-04-30 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus |
NL1036766A1 (nl) * | 2008-04-25 | 2009-10-27 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus. |
NL2003392A (en) | 2008-09-17 | 2010-03-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
JP5208807B2 (ja) * | 2009-02-27 | 2013-06-12 | 株式会社日立国際電気 | 基板処理システム |
US9784962B2 (en) * | 2012-09-13 | 2017-10-10 | Brandeis University | Cooling systems and methods for cryo super-resolution fluorescence light microscopy and other applications |
KR102482421B1 (ko) | 2018-02-15 | 2022-12-27 | 사이머 엘엘씨 | 가스 관리 시스템 |
US11949203B2 (en) | 2018-02-15 | 2024-04-02 | Cymer, Llc | Gas management system |
CN112782051A (zh) * | 2020-12-29 | 2021-05-11 | 浙江启尔机电技术有限公司 | 一种浸没控制单元的洁净度检测系统及其洁净度检测方法 |
Family Cites Families (32)
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JPS53107895A (en) * | 1977-10-24 | 1978-09-20 | Nishihara Kankiyou Eisei Kenki | Mesuring method and apparatus for concentration of suspensions |
JPS58107895A (ja) * | 1981-12-22 | 1983-06-27 | Mitsubishi Electric Corp | ウエスコポンプ |
JPH01142842U (nl) * | 1988-03-28 | 1989-09-29 | ||
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
JP2982720B2 (ja) * | 1996-04-26 | 1999-11-29 | 日本電気株式会社 | パーティクルモニター装置およびこれを具備した無塵化プロセス装置 |
US5838973A (en) * | 1996-05-03 | 1998-11-17 | Andersen Consulting Llp | System and method for interactively transforming a system or process into a visual representation |
US5974238A (en) * | 1996-08-07 | 1999-10-26 | Compaq Computer Corporation | Automatic data synchronization between a handheld and a host computer using pseudo cache including tags and logical data elements |
US6327586B1 (en) * | 1998-05-27 | 2001-12-04 | Wisdombuilder, L.L.C. | System method and computer program product to automate the management and analysis of heterogeneous data |
US6871220B1 (en) * | 1998-10-28 | 2005-03-22 | Yodlee, Inc. | System and method for distributed storage and retrieval of personal information |
US20010023414A1 (en) * | 1998-12-08 | 2001-09-20 | Srihari Kumar | Interactive calculation and presentation of financial data results through a single interface on a data-packet-network |
US7240067B2 (en) * | 2000-02-08 | 2007-07-03 | Sybase, Inc. | System and methodology for extraction and aggregation of data from dynamic content |
US6847974B2 (en) * | 2001-03-26 | 2005-01-25 | Us Search.Com Inc | Method and apparatus for intelligent data assimilation |
US20040103147A1 (en) * | 2001-11-13 | 2004-05-27 | Flesher Kevin E. | System for enabling collaboration and protecting sensitive data |
WO2003048945A1 (fr) * | 2001-12-05 | 2003-06-12 | Cybird Co., Ltd. | Systeme, procede et programme de partage d'informations de communication |
US6910159B2 (en) * | 2002-02-20 | 2005-06-21 | Microsoft Corporation | System and method for gathering and automatically processing user and debug data for mobile devices |
GB0205130D0 (en) * | 2002-03-06 | 2002-04-17 | Symbian Ltd | A method of enabling a wireless information device to access data services |
US7016978B2 (en) * | 2002-04-29 | 2006-03-21 | Bellsouth Intellectual Property Corporation | Instant messaging architecture and system for interoperability and presence management |
US7818365B2 (en) * | 2002-05-01 | 2010-10-19 | Sybase, Inc. | System, method, and computer program product for online and offline interactive applications on mobile devices |
US20030217098A1 (en) * | 2002-05-15 | 2003-11-20 | Microsoft Corporation | Method and system for supporting the communication of presence information regarding one or more telephony devices |
AU2003214262A1 (en) * | 2002-05-31 | 2003-12-19 | International Business Machines Corporation | System and method for accessing different types of back end data stores |
US7317504B2 (en) * | 2004-04-08 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005136374A (ja) * | 2003-10-06 | 2005-05-26 | Matsushita Electric Ind Co Ltd | 半導体製造装置及びそれを用いたパターン形成方法 |
JP2005334682A (ja) * | 2004-05-24 | 2005-12-08 | Shimada Phys & Chem Ind Co Ltd | 気泡除去装置 |
US7558799B2 (en) * | 2004-06-01 | 2009-07-07 | Microsoft Corporation | Method, system, and apparatus for discovering and connecting to data sources |
US8520184B2 (en) * | 2004-06-09 | 2013-08-27 | Nikon Corporation | Immersion exposure apparatus and device manufacturing method with measuring device |
JP2006024882A (ja) * | 2004-06-11 | 2006-01-26 | Matsushita Electric Ind Co Ltd | 薄膜塗布装置および薄膜塗布方法ならびに液侵露光装置および液侵露光方法 |
KR20060044914A (ko) * | 2004-06-11 | 2006-05-16 | 마츠시타 덴끼 산교 가부시키가이샤 | 박막도포장치 및 박막도포방법 그리고 액침노광장치 및액침노광방법 |
US8341172B2 (en) * | 2004-07-22 | 2012-12-25 | International Business Machines Corporation | Method and system for providing aggregate data access |
JP4772306B2 (ja) * | 2004-09-06 | 2011-09-14 | 株式会社東芝 | 液浸光学装置及び洗浄方法 |
TW200619866A (en) * | 2004-10-13 | 2006-06-16 | Nikon Corp | Aligner, exposing method, and device manufacturing method |
JP4752473B2 (ja) * | 2004-12-09 | 2011-08-17 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
US8561126B2 (en) * | 2004-12-29 | 2013-10-15 | International Business Machines Corporation | Automatic enforcement of obligations according to a data-handling policy |
-
2006
- 2006-05-17 US US11/383,912 patent/US7602471B2/en not_active Expired - Fee Related
- 2006-11-23 TW TW095143349A patent/TWI344583B/zh not_active IP Right Cessation
-
2007
- 2007-01-11 JP JP2007003919A patent/JP2007311751A/ja active Pending
- 2007-02-14 CN CN2007100053009A patent/CN101075095B/zh not_active Expired - Fee Related
- 2007-04-05 NL NL2000577A patent/NL2000577C2/nl active Search and Examination
-
2010
- 2010-11-12 JP JP2010253771A patent/JP5202606B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
NL2000577C2 (nl) | 2007-12-19 |
CN101075095B (zh) | 2010-07-21 |
US20070268469A1 (en) | 2007-11-22 |
JP5202606B2 (ja) | 2013-06-05 |
US7602471B2 (en) | 2009-10-13 |
CN101075095A (zh) | 2007-11-21 |
TW200743913A (en) | 2007-12-01 |
JP2007311751A (ja) | 2007-11-29 |
JP2011035425A (ja) | 2011-02-17 |
TWI344583B (en) | 2011-07-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AD1B | A search report has been drawn up | ||
PD2B | A search report has been drawn up |