NL199484A - - Google Patents

Info

Publication number
NL199484A
NL199484A NL199484DA NL199484A NL 199484 A NL199484 A NL 199484A NL 199484D A NL199484D A NL 199484DA NL 199484 A NL199484 A NL 199484A
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL199484A publication Critical patent/NL199484A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2603/00—Systems containing at least three condensed rings
    • C07C2603/02—Ortho- or ortho- and peri-condensed systems
    • C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
    • C07C2603/22—Ortho- or ortho- and peri-condensed systems containing three rings containing only six-membered rings
    • C07C2603/26—Phenanthrenes; Hydrogenated phenanthrenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
NL199484D 1954-08-20 NL199484A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451294A US2797213A (en) 1954-08-20 1954-08-20 Rosin derivatives of diazonaphthol-and diazophenol-sulfonamides

Publications (1)

Publication Number Publication Date
NL199484A true NL199484A (ja)

Family

ID=23791634

Family Applications (2)

Application Number Title Priority Date Filing Date
NL199484D NL199484A (ja) 1954-08-20
NL95406D NL95406C (ja) 1954-08-20

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL95406D NL95406C (ja) 1954-08-20

Country Status (6)

Country Link
US (1) US2797213A (ja)
BE (1) BE539175A (ja)
CH (1) CH341071A (ja)
DE (1) DE1007773B (ja)
GB (1) GB787360A (ja)
NL (2) NL95406C (ja)

Families Citing this family (67)

* Cited by examiner, † Cited by third party
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GB1116674A (en) * 1966-02-28 1968-06-12 Agfa Gevaert Nv Naphthoquinone diazide sulphofluoride
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US4024122A (en) * 1973-02-12 1977-05-17 Rca Corporation Method of purifying 2,4-bis(6-diazo-5,6-dihydro-5-oxo-1-naphthalenesulfonyloxy benzophenone)
DE3837500A1 (de) * 1988-11-04 1990-05-23 Hoechst Ag Neue, strahlungsempfindliche verbindungen, hiermit hergestelltes strahlungsempfindliches gemisch und aufzeichnungsmaterial
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3290316B2 (ja) 1994-11-18 2002-06-10 富士写真フイルム株式会社 感光性平版印刷版
US5853947A (en) * 1995-12-21 1998-12-29 Clariant Finance (Bvi) Limited Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
JP3506295B2 (ja) 1995-12-22 2004-03-15 富士写真フイルム株式会社 ポジ型感光性平版印刷版
TW502135B (en) 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
EP0852341B1 (en) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Method for the pattern-processing of photosensitive resin composition
US6602274B1 (en) * 1999-01-15 2003-08-05 Light Sciences Corporation Targeted transcutaneous cancer therapy
US6454789B1 (en) * 1999-01-15 2002-09-24 Light Science Corporation Patient portable device for photodynamic therapy
US6511790B2 (en) 2000-08-25 2003-01-28 Fuji Photo Film Co., Ltd. Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
EP1332000B1 (en) 2000-10-30 2012-06-20 Sequenom, Inc. Method for delivery of submicroliter volumes onto a substrate
CN100347609C (zh) * 2000-10-31 2007-11-07 英特尔公司 正性光敏树脂组合物、制备正性光敏树脂组合物的方法及半导体设备
DE60137398D1 (de) 2000-11-30 2009-03-05 Fujifilm Corp Lithographische Druckplattenvorläufer
US20040067435A1 (en) 2002-09-17 2004-04-08 Fuji Photo Film Co., Ltd. Image forming material
EP1400856B1 (en) 2002-09-20 2011-11-02 FUJIFILM Corporation Method of making lithographic printing plate
US6852465B2 (en) * 2003-03-21 2005-02-08 Clariant International Ltd. Photoresist composition for imaging thick films
EP2381308B1 (en) 2003-06-23 2015-07-29 Sumitomo Bakelite Co., Ltd. Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
EP1707588A4 (en) * 2004-01-20 2009-07-01 Asahi Kasei Emd Corp RESIN AND RESIN COMPOSITION
JP4404734B2 (ja) 2004-09-27 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP4800321B2 (ja) 2004-12-09 2011-10-26 コーロン インダストリーズ インク ポジティブ型ドライフィルムフォトレジスト及びこれを製造するための組成物
JP4474296B2 (ja) 2005-02-09 2010-06-02 富士フイルム株式会社 平版印刷版原版
JP4404792B2 (ja) 2005-03-22 2010-01-27 富士フイルム株式会社 平版印刷版原版
JP5034269B2 (ja) 2005-03-31 2012-09-26 大日本印刷株式会社 パターン形成材料、及びポリイミド前駆体樹脂組成物
US20070105040A1 (en) * 2005-11-10 2007-05-10 Toukhy Medhat A Developable undercoating composition for thick photoresist layers
EP1965256B1 (en) 2005-11-30 2014-04-30 Sumitomo Bakelite Co., Ltd. Positive photosensitive resin composition, and use of the same for manufacturing a semiconductor device and a display
EP2056163A4 (en) 2006-08-15 2009-11-11 Asahi Kasei Emd Corp POSITIVE PHOTOSENSITIVE RESIN COMPOSITION
MY151282A (en) 2007-08-10 2014-04-30 Sumitomo Bakelite Co Positive-type photosensitive resin composition, cured film, protective film, insulating film, and semiconductor device
US20090180931A1 (en) 2007-09-17 2009-07-16 Sequenom, Inc. Integrated robotic sample transfer device
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP2009085984A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版原版
JP4890403B2 (ja) 2007-09-27 2012-03-07 富士フイルム株式会社 平版印刷版原版
JP4790682B2 (ja) 2007-09-28 2011-10-12 富士フイルム株式会社 平版印刷版原版
JP4994175B2 (ja) 2007-09-28 2012-08-08 富士フイルム株式会社 平版印刷版原版、及びそれに用いる共重合体の製造方法
CN101855026A (zh) 2007-11-14 2010-10-06 富士胶片株式会社 干燥涂布膜的方法和制造平版印刷版前体的方法
JP2009236355A (ja) 2008-03-26 2009-10-15 Fujifilm Corp 乾燥方法及び装置
JP5164640B2 (ja) 2008-04-02 2013-03-21 富士フイルム株式会社 平版印刷版原版
JP5183380B2 (ja) 2008-09-09 2013-04-17 富士フイルム株式会社 赤外線レーザ用感光性平版印刷版原版
KR101023089B1 (ko) * 2008-09-29 2011-03-24 제일모직주식회사 포지티브형 감광성 수지 조성물
JP5410918B2 (ja) * 2008-10-20 2014-02-05 チェイル インダストリーズ インコーポレイテッド ポジティブ型感光性樹脂組成物
JP2010237435A (ja) 2009-03-31 2010-10-21 Fujifilm Corp 平版印刷版原版
CN105082725B (zh) 2009-09-24 2018-05-04 富士胶片株式会社 平版印刷版原版
KR101333698B1 (ko) * 2009-11-10 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
KR101333704B1 (ko) * 2009-12-29 2013-11-27 제일모직주식회사 포지티브형 감광성 수지 조성물
KR20120066923A (ko) 2010-12-15 2012-06-25 제일모직주식회사 신규 페놀 화합물 및 이를 포함하는 포지티브형 감광성 수지 조성물
KR101423539B1 (ko) 2010-12-20 2014-07-25 삼성전자 주식회사 포지티브형 감광성 수지 조성물
KR101400187B1 (ko) 2010-12-30 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400192B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101400186B1 (ko) 2010-12-31 2014-05-27 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
US20130108956A1 (en) 2011-11-01 2013-05-02 Az Electronic Materials Usa Corp. Nanocomposite positive photosensitive composition and use thereof
KR101423176B1 (ko) 2011-11-29 2014-07-25 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101413076B1 (ko) 2011-12-23 2014-06-30 제일모직 주식회사 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 상기 감광성 수지막을 포함하는 반도체 소자
KR101432603B1 (ko) 2011-12-29 2014-08-21 제일모직주식회사 감광성 노볼락 수지, 이를 포함하는 포지티브형 감광성 수지 조성물, 이를 사용하여 제조된 감광성 수지막 및 이를 포함하는 반도체 소자
KR101423177B1 (ko) 2011-12-30 2014-07-29 제일모직 주식회사 포지티브형 감광성 수지 조성물
KR101413078B1 (ko) 2011-12-30 2014-07-02 제일모직 주식회사 포지티브형 감광성 수지 조성물
JP5490168B2 (ja) 2012-03-23 2014-05-14 富士フイルム株式会社 平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja) 2012-03-30 2014-06-04 富士フイルム株式会社 平版印刷版の作製方法
KR20140086724A (ko) 2012-12-28 2014-07-08 제일모직주식회사 표시장치 절연막용 감광성 수지 조성물, 및 이를 이용한 표시장치 절연막 및 표시장치
KR101667787B1 (ko) 2013-08-13 2016-10-19 제일모직 주식회사 포지티브형 감광성 수지 조성물, 및 이를 이용한 감광성 수지막 및 표시 소자
KR101750463B1 (ko) 2013-11-26 2017-06-23 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
KR101728820B1 (ko) 2013-12-12 2017-04-20 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 표시 소자
KR102090449B1 (ko) 2016-03-31 2020-03-18 아사히 가세이 가부시키가이샤 감광성 수지 조성물, 경화 릴리프 패턴의 제조 방법 및 반도체 장치
CN113341651B (zh) * 2021-06-25 2023-08-25 北京北旭电子材料有限公司 一种光刻胶及图案化方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE865410C (de) * 1943-07-10 1953-02-02 Kalle & Co Ag Lichtempfindliche Verbindungen fuer die Diazotypie
NL78797C (ja) * 1949-07-23
DE872154C (de) * 1950-12-23 1953-03-30 Kalle & Co Ag Photomechanisches Verfahren zur Herstellung von Bildern und Druckformen mit Hilfe von Diazoverbindungen

Also Published As

Publication number Publication date
BE539175A (ja)
GB787360A (en) 1957-12-04
CH341071A (de) 1959-09-15
DE1007773B (de) 1957-05-09
US2797213A (en) 1957-06-25
NL95406C (ja)

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