NL193512B - Elektronenkanonsysteem met veldemissie. - Google Patents
Elektronenkanonsysteem met veldemissie.Info
- Publication number
- NL193512B NL193512B NL8901517A NL8901517A NL193512B NL 193512 B NL193512 B NL 193512B NL 8901517 A NL8901517 A NL 8901517A NL 8901517 A NL8901517 A NL 8901517A NL 193512 B NL193512 B NL 193512B
- Authority
- NL
- Netherlands
- Prior art keywords
- field emission
- electron gun
- gun system
- electron
- emission
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14810588 | 1988-06-17 | ||
JP63148105A JP2796305B2 (ja) | 1988-06-17 | 1988-06-17 | 電界放射電子銃 |
Publications (3)
Publication Number | Publication Date |
---|---|
NL8901517A NL8901517A (nl) | 1990-01-16 |
NL193512B true NL193512B (nl) | 1999-08-02 |
NL193512C NL193512C (nl) | 1999-12-03 |
Family
ID=15445357
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL8901517A NL193512C (nl) | 1988-06-17 | 1989-06-15 | Elektronenkanonsysteem met veldemissie. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4945247A (nl) |
JP (1) | JP2796305B2 (nl) |
DE (1) | DE3919829C2 (nl) |
NL (1) | NL193512C (nl) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5059859A (en) * | 1989-04-14 | 1991-10-22 | Hitachi, Ltd. | Charged particle beam generating apparatus of multi-stage acceleration type |
DE69125229T2 (de) * | 1990-08-10 | 1997-08-28 | Koninkl Philips Electronics Nv | Ladungspartikelstrahlanordnung |
JP3325982B2 (ja) * | 1993-12-27 | 2002-09-17 | 株式会社東芝 | 磁界界浸型電子銃 |
SG74599A1 (en) * | 1997-09-27 | 2000-08-22 | Inst Of Material Res & Enginee | Portable high resolution scanning electron microscope column using permanent magnet electron lenses |
US6392333B1 (en) * | 1999-03-05 | 2002-05-21 | Applied Materials, Inc. | Electron gun having magnetic collimator |
US6797953B2 (en) * | 2001-02-23 | 2004-09-28 | Fei Company | Electron beam system using multiple electron beams |
US6828996B2 (en) | 2001-06-22 | 2004-12-07 | Applied Materials, Inc. | Electron beam patterning with a heated electron source |
JP5364462B2 (ja) * | 2009-06-19 | 2013-12-11 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
US8664622B2 (en) | 2012-04-11 | 2014-03-04 | Taiwan Semiconductor Manufacturing Co., Ltd. | System and method of ion beam source for semiconductor ion implantation |
JP5959326B2 (ja) * | 2012-06-11 | 2016-08-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム発生装置、荷電粒子線装置、高電圧発生装置、および高電位装置 |
JP6647961B2 (ja) * | 2016-05-11 | 2020-02-14 | 日本電子株式会社 | 電子顕微鏡および電子顕微鏡の制御方法 |
US11302509B2 (en) * | 2017-09-07 | 2022-04-12 | Jeol Ltd. | Electron gun and electron beam device |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1291221A (en) * | 1968-07-07 | 1972-10-04 | Smith Kenneth C A | Electron probe forming system |
GB1594465A (en) * | 1977-03-23 | 1981-07-30 | Nat Res Dev | Electron beam apparatus |
JPS5429075A (en) * | 1977-08-09 | 1979-03-03 | Fujitsu Ltd | Reed switch |
FR2527383A1 (fr) * | 1982-05-24 | 1983-11-25 | Univ Reims Champagne Ardenne | Canon a electrons avec cathode a emission de champ et lentille magnetique |
FR2550681B1 (fr) * | 1983-08-12 | 1985-12-06 | Centre Nat Rech Scient | Source d'ions a au moins deux chambres d'ionisation, en particulier pour la formation de faisceaux d'ions chimiquement reactifs |
DE3345573A1 (de) * | 1983-12-16 | 1985-06-27 | Wollnik, Hermann, Prof. Dr., 6301 Fernwald | Einrichtung zur reduzierung des divergenzwinkels einer ionen- oder elektronenquelle |
US4725736A (en) * | 1986-08-11 | 1988-02-16 | Electron Beam Memories | Electrostatic electron gun with integrated electron beam deflection and/or stigmating system |
JPS6381743A (ja) * | 1986-09-26 | 1988-04-12 | Jeol Ltd | 電界放射型電子銃 |
-
1988
- 1988-06-17 JP JP63148105A patent/JP2796305B2/ja not_active Expired - Fee Related
-
1989
- 1989-06-14 US US07/365,827 patent/US4945247A/en not_active Expired - Lifetime
- 1989-06-15 NL NL8901517A patent/NL193512C/nl not_active IP Right Cessation
- 1989-06-16 DE DE3919829A patent/DE3919829C2/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US4945247A (en) | 1990-07-31 |
JPH01319236A (ja) | 1989-12-25 |
JP2796305B2 (ja) | 1998-09-10 |
DE3919829A1 (de) | 1989-12-21 |
NL8901517A (nl) | 1990-01-16 |
DE3919829C2 (de) | 1994-11-03 |
NL193512C (nl) | 1999-12-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
V1 | Lapsed because of non-payment of the annual fee |
Effective date: 20080101 |