NL189607C - Werkwijze ter bereiding van diaryljodoniumzouten. - Google Patents
Werkwijze ter bereiding van diaryljodoniumzouten.Info
- Publication number
- NL189607C NL189607C NLAANVRAGE7713695,A NL7713695A NL189607C NL 189607 C NL189607 C NL 189607C NL 7713695 A NL7713695 A NL 7713695A NL 189607 C NL189607 C NL 189607C
- Authority
- NL
- Netherlands
- Prior art keywords
- preparation
- iodonium salts
- diaryl iodonium
- diaryl
- salts
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/44—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
- C07D207/444—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
- C07D207/448—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
- C07D207/452—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C25/00—Compounds containing at least one halogen atom bound to a six-membered aromatic ring
- C07C25/18—Polycyclic aromatic halogenated hydrocarbons
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/749,116 US4151175A (en) | 1976-12-09 | 1976-12-09 | Method for making diarylhalonium salts |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7713695A NL7713695A (nl) | 1978-06-13 |
NL189607B NL189607B (nl) | 1993-01-04 |
NL189607C true NL189607C (nl) | 1993-06-01 |
Family
ID=25012329
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7713695,A NL189607C (nl) | 1976-12-09 | 1977-12-09 | Werkwijze ter bereiding van diaryljodoniumzouten. |
Country Status (7)
Country | Link |
---|---|
US (1) | US4151175A (de) |
JP (1) | JPS53101331A (de) |
DE (1) | DE2754853A1 (de) |
FR (1) | FR2373505A1 (de) |
GB (1) | GB1572620A (de) |
IT (1) | IT1089957B (de) |
NL (1) | NL189607C (de) |
Families Citing this family (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4196138A (en) * | 1977-05-20 | 1980-04-01 | General Electric Company | Dicarbonyl chelate salts |
US4238394A (en) * | 1978-10-30 | 1980-12-09 | General Electric Company | Method for making diaryliodonium salts |
US4329300A (en) * | 1980-06-27 | 1982-05-11 | General Electric Company | Method for making diaryliodonium polyhalometalloid salts |
US4537725A (en) * | 1982-09-18 | 1985-08-27 | Ciba-Geigy Corporation | Diaryliodosyl salts |
JPS59163336A (ja) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | アルデヒドの製造法 |
JPS59163330A (ja) * | 1983-03-09 | 1984-09-14 | Nippon Petrochem Co Ltd | ジアリ−ルヨ−ドニウム塩の製造方法 |
US4623666A (en) | 1984-11-06 | 1986-11-18 | Kennedy Thomas P | Pharmacological applications of diphenylhalonium ion |
US5310619A (en) * | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
US5362607A (en) * | 1986-06-13 | 1994-11-08 | Microsi, Inc. | Method for making a patterned resist substrate composite |
US4840977A (en) * | 1987-10-01 | 1989-06-20 | General Electric Company | Polymeric iodonium salts, method for making, and heat curable compositions |
US4845159A (en) * | 1987-10-01 | 1989-07-04 | General Electric Company | Photoactive and thermally active polymeric iodonium salts, use, and method for making |
DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
DE69029104T2 (de) | 1989-07-12 | 1997-03-20 | Fuji Photo Film Co Ltd | Polysiloxane und positiv arbeitende Resistmasse |
US5488147A (en) * | 1994-07-21 | 1996-01-30 | Minnesota Mining And Manufacturing Company | Diaryliodonium fluoroalkyl sulfonate salts and a method of making |
JPH0954437A (ja) | 1995-06-05 | 1997-02-25 | Fuji Photo Film Co Ltd | 化学増幅型ポジレジスト組成物 |
EP2236488A1 (de) | 2001-03-30 | 2010-10-06 | The Arizona Board of Regents on behalf of the University of Arizona | Materialien, Verfahren und Verwendungen zur fotochemischen Erzeugung von Säuren und/oder Radikalenspezies |
US7192681B2 (en) | 2001-07-05 | 2007-03-20 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition |
EP1566694B1 (de) | 2004-02-20 | 2014-04-02 | FUJIFILM Corporation | Positiv arbeitende Resistzusammensetzung und Verfahren zur Herstellung von Mustern unter Verwendung dieser Zusammensetzung |
US7504193B2 (en) | 2004-09-02 | 2009-03-17 | Fujifilm Corporation | Positive resist composition and pattern forming method using the same |
GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
CN100577671C (zh) * | 2007-09-05 | 2010-01-06 | 武汉工程大学 | 4,4’-双十二烷基苯碘鎓六氟锑酸盐的合成方法 |
US8975203B2 (en) | 2009-05-08 | 2015-03-10 | Nippon Shokubai Co., Ltd. | Diaryliodonium salt mixture and process for production thereof, and process for production of diaryliodonium compound |
US8343608B2 (en) | 2010-08-31 | 2013-01-01 | General Electric Company | Use of appended dyes in optical data storage media |
CN103608183B (zh) | 2011-06-21 | 2017-05-17 | 巴斯夫欧洲公司 | 在纸或纸板上印刷衍射光栅 |
AU2013276625B2 (en) | 2012-06-14 | 2017-09-14 | Basf Se | Method for manufacturing security elements and holograms |
WO2014041121A1 (en) | 2012-09-17 | 2014-03-20 | Basf Se | Security elements and method for their manufacture |
CN105392851B (zh) | 2013-05-21 | 2018-09-11 | 巴斯夫欧洲公司 | 安全元件及其生产方法 |
US10494766B2 (en) | 2013-10-04 | 2019-12-03 | Basf Se | High gloss metal effect papers |
EP3277884A1 (de) | 2015-03-30 | 2018-02-07 | Basf Se | Hochglänzende metalleffektpapiere und -pappe |
WO2016174043A1 (de) | 2015-04-29 | 2016-11-03 | Bsn Medical Gmbh | Mehrstufiges verfahren zur no-herstellung |
CA2984033C (en) | 2015-04-29 | 2023-08-15 | Bsn Medical Gmbh | Medical bathing equipment |
WO2019206845A1 (en) | 2018-04-25 | 2019-10-31 | Basf Se | Process for the production of strongly adherent (embossed) films on flexible substrates |
WO2020064522A1 (en) | 2018-09-24 | 2020-04-02 | Basf Se | Photocurable composition for use in 3d printing |
CN112639034A (zh) | 2018-09-24 | 2021-04-09 | 巴斯夫欧洲公司 | 用于3d打印的可uv固化组合物 |
US20210402466A1 (en) | 2018-10-25 | 2021-12-30 | Basf Se | Compositions, comprising silver nanoplatelets |
EP3680263A1 (de) | 2019-01-14 | 2020-07-15 | Basf Se | Limonenbasierte (meth)acrylate zur verwendung im 3d-druck |
EP3680274A1 (de) | 2019-01-14 | 2020-07-15 | Basf Se | Hydroxyurethan-(meth)acrylatpräpolymere zur verwendung im 3d-druck |
WO2020152021A1 (en) | 2019-01-21 | 2020-07-30 | Basf Se | Security element |
EP3917703A1 (de) | 2019-01-29 | 2021-12-08 | Basf Se | Sicherheitselement |
EP3965983A1 (de) | 2019-05-06 | 2022-03-16 | Basf Se | Zusammensetzungen mit silbernanoplättchen |
EP4055071A1 (de) | 2019-11-07 | 2022-09-14 | Basf Se | Wasserspülbare zusammensetzungen zur verwendung beim 3d-drucken |
EP4139070A1 (de) | 2020-04-23 | 2023-03-01 | Basf Se | Zusammensetzungen mit plättchenförmigen übergangsmetallpartikeln |
FR3125056A1 (fr) | 2021-07-12 | 2023-01-13 | Bostik Sa | Composition à base de monomères (méth)acrylate |
FR3125055A1 (fr) | 2021-07-12 | 2023-01-13 | Bostik Sa | Composition à base de monomères ( méth )acrylate |
WO2023170132A1 (en) | 2022-03-10 | 2023-09-14 | Basf Se | Casting lacquer for screen printing |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
US3981897A (en) * | 1975-05-02 | 1976-09-21 | General Electric Company | Method for making certain halonium salt photoinitiators |
-
1976
- 1976-12-09 US US05/749,116 patent/US4151175A/en not_active Expired - Lifetime
-
1977
- 1977-12-07 GB GB51044/77A patent/GB1572620A/en not_active Expired
- 1977-12-07 JP JP14769177A patent/JPS53101331A/ja active Granted
- 1977-12-09 IT IT30568/77A patent/IT1089957B/it active
- 1977-12-09 DE DE19772754853 patent/DE2754853A1/de active Granted
- 1977-12-09 FR FR7737221A patent/FR2373505A1/fr active Granted
- 1977-12-09 NL NLAANVRAGE7713695,A patent/NL189607C/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
NL7713695A (nl) | 1978-06-13 |
FR2373505A1 (fr) | 1978-07-07 |
US4151175A (en) | 1979-04-24 |
FR2373505B1 (de) | 1984-03-30 |
NL189607B (nl) | 1993-01-04 |
DE2754853C2 (de) | 1988-03-17 |
GB1572620A (en) | 1980-07-30 |
JPS6236015B2 (de) | 1987-08-05 |
DE2754853A1 (de) | 1978-06-22 |
JPS53101331A (en) | 1978-09-04 |
IT1089957B (it) | 1985-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
A85 | Still pending on 85-01-01 | ||
BC | A request for examination has been filed | ||
V1 | Lapsed because of non-payment of the annual fee |