JPS53101331A - Preparation of diaryliodonium salt - Google Patents

Preparation of diaryliodonium salt

Info

Publication number
JPS53101331A
JPS53101331A JP14769177A JP14769177A JPS53101331A JP S53101331 A JPS53101331 A JP S53101331A JP 14769177 A JP14769177 A JP 14769177A JP 14769177 A JP14769177 A JP 14769177A JP S53101331 A JPS53101331 A JP S53101331A
Authority
JP
Japan
Prior art keywords
preparation
diaryliodonium salt
diaryliodonium
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14769177A
Other languages
English (en)
Other versions
JPS6236015B2 (ja
Inventor
Buinsento Kuribuero Jieimusu
Hinguuwai Ramu Jiyuria
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS53101331A publication Critical patent/JPS53101331A/ja
Publication of JPS6236015B2 publication Critical patent/JPS6236015B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D207/00Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/44Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members
    • C07D207/444Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5
    • C07D207/448Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide
    • C07D207/452Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having three double bonds between ring members or between ring members and non-ring members having two doubly-bound oxygen atoms directly attached in positions 2 and 5 with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms, e.g. maleimide with hydrocarbon radicals, substituted by hetero atoms, directly attached to the ring nitrogen atom
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C25/00Compounds containing at least one halogen atom bound to a six-membered aromatic ring
    • C07C25/18Polycyclic aromatic halogenated hydrocarbons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
  • Polymerisation Methods In General (AREA)
JP14769177A 1976-12-09 1977-12-07 Preparation of diaryliodonium salt Granted JPS53101331A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/749,116 US4151175A (en) 1976-12-09 1976-12-09 Method for making diarylhalonium salts

Publications (2)

Publication Number Publication Date
JPS53101331A true JPS53101331A (en) 1978-09-04
JPS6236015B2 JPS6236015B2 (ja) 1987-08-05

Family

ID=25012329

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14769177A Granted JPS53101331A (en) 1976-12-09 1977-12-07 Preparation of diaryliodonium salt

Country Status (7)

Country Link
US (1) US4151175A (ja)
JP (1) JPS53101331A (ja)
DE (1) DE2754853A1 (ja)
FR (1) FR2373505A1 (ja)
GB (1) GB1572620A (ja)
IT (1) IT1089957B (ja)
NL (1) NL189607C (ja)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP1566694A1 (en) 2004-02-20 2005-08-24 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
EP1637927A1 (en) 2004-09-02 2006-03-22 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
WO2010128649A1 (ja) 2009-05-08 2010-11-11 株式会社日本触媒 ジアリールヨードニウム塩混合物とその製造方法、並びにジアリールヨードニウム化合物の製造方法
EP2296040A1 (en) 2001-07-05 2011-03-16 Fujifilm Corporation Positive photosensitive composition

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4196138A (en) * 1977-05-20 1980-04-01 General Electric Company Dicarbonyl chelate salts
US4238394A (en) * 1978-10-30 1980-12-09 General Electric Company Method for making diaryliodonium salts
US4329300A (en) * 1980-06-27 1982-05-11 General Electric Company Method for making diaryliodonium polyhalometalloid salts
US4537725A (en) * 1982-09-18 1985-08-27 Ciba-Geigy Corporation Diaryliodosyl salts
JPS59163336A (ja) * 1983-03-09 1984-09-14 Nippon Petrochem Co Ltd アルデヒドの製造法
JPS59163330A (ja) * 1983-03-09 1984-09-14 Nippon Petrochem Co Ltd ジアリ−ルヨ−ドニウム塩の製造方法
US4623666A (en) 1984-11-06 1986-11-18 Kennedy Thomas P Pharmacological applications of diphenylhalonium ion
US5362607A (en) * 1986-06-13 1994-11-08 Microsi, Inc. Method for making a patterned resist substrate composite
US5310619A (en) * 1986-06-13 1994-05-10 Microsi, Inc. Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable
US4845159A (en) * 1987-10-01 1989-07-04 General Electric Company Photoactive and thermally active polymeric iodonium salts, use, and method for making
US4840977A (en) * 1987-10-01 1989-06-20 General Electric Company Polymeric iodonium salts, method for making, and heat curable compositions
DE3902114A1 (de) * 1989-01-25 1990-08-02 Basf Ag Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung
US5488147A (en) * 1994-07-21 1996-01-30 Minnesota Mining And Manufacturing Company Diaryliodonium fluoroalkyl sulfonate salts and a method of making
CA2443317C (en) 2001-03-30 2013-06-18 The Arizona Board Of Regents On Behalf Of The University Of Arizona Materials, methods, and uses for photochemical generation of acids and/or radical species
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
CN100577671C (zh) * 2007-09-05 2010-01-06 武汉工程大学 4,4’-双十二烷基苯碘鎓六氟锑酸盐的合成方法
US8343608B2 (en) 2010-08-31 2013-01-01 General Electric Company Use of appended dyes in optical data storage media
CN103608183B (zh) 2011-06-21 2017-05-17 巴斯夫欧洲公司 在纸或纸板上印刷衍射光栅
JP6203253B2 (ja) 2012-06-14 2017-09-27 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se セキュリティエレメント及びホログラムの製造方法
EP2895922B1 (en) 2012-09-17 2018-04-18 Basf Se Security elements and method for their manufacture
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US10494766B2 (en) 2013-10-04 2019-12-03 Basf Se High gloss metal effect papers
WO2016156286A1 (en) 2015-03-30 2016-10-06 Basf Se High gloss metal effect papers and boards
WO2016174043A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Mehrstufiges verfahren zur no-herstellung
WO2016174192A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Medizinische badevorrichtung
US20210086545A1 (en) 2018-04-25 2021-03-25 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
WO2020064522A1 (en) 2018-09-24 2020-04-02 Basf Se Photocurable composition for use in 3d printing
US11999865B2 (en) 2018-09-24 2024-06-04 Basf Se UV curable composition for use in 3D printing
MX2021004736A (es) 2018-10-25 2021-06-04 Basf Se Composiciones, que comprenden nanoplaquetas de plata.
EP3680274A1 (en) 2019-01-14 2020-07-15 Basf Se Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing
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AU2020210698A1 (en) 2019-01-21 2021-07-15 Basf Se Security element
EP3917703A1 (en) 2019-01-29 2021-12-08 Basf Se Security element
US20220220284A1 (en) 2019-05-06 2022-07-14 Basf Se Compositions, comprising silver nanoplatelets
CN114641388A (zh) 2019-11-07 2022-06-17 巴斯夫欧洲公司 用于3d打印中的水洗性组合物
CN115279518A (zh) 2020-04-23 2022-11-01 巴斯夫欧洲公司 包含片状过渡金属颗粒的组合物
FR3125056A1 (fr) 2021-07-12 2023-01-13 Bostik Sa Composition à base de monomères (méth)acrylate
FR3125055A1 (fr) 2021-07-12 2023-01-13 Bostik Sa Composition à base de monomères ( méth )acrylate
WO2023170132A1 (en) 2022-03-10 2023-09-14 Basf Se Casting lacquer for screen printing

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3981897A (en) * 1975-05-02 1976-09-21 General Electric Company Method for making certain halonium salt photoinitiators

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP2296040A1 (en) 2001-07-05 2011-03-16 Fujifilm Corporation Positive photosensitive composition
EP2296039A1 (en) 2001-07-05 2011-03-16 Fujifilm Corporation Positive photosensitive composition
EP1566694A1 (en) 2004-02-20 2005-08-24 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
EP1637927A1 (en) 2004-09-02 2006-03-22 Fuji Photo Film Co., Ltd. Positive resist composition and pattern forming method using the same
WO2010128649A1 (ja) 2009-05-08 2010-11-11 株式会社日本触媒 ジアリールヨードニウム塩混合物とその製造方法、並びにジアリールヨードニウム化合物の製造方法
US8975203B2 (en) 2009-05-08 2015-03-10 Nippon Shokubai Co., Ltd. Diaryliodonium salt mixture and process for production thereof, and process for production of diaryliodonium compound

Also Published As

Publication number Publication date
GB1572620A (en) 1980-07-30
JPS6236015B2 (ja) 1987-08-05
NL189607B (nl) 1993-01-04
NL189607C (nl) 1993-06-01
FR2373505A1 (fr) 1978-07-07
FR2373505B1 (ja) 1984-03-30
DE2754853C2 (ja) 1988-03-17
DE2754853A1 (de) 1978-06-22
NL7713695A (nl) 1978-06-13
US4151175A (en) 1979-04-24
IT1089957B (it) 1985-06-18

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