NL178732B - SYSTEM FOR MEASURING AND CORRECTING THE FOCUSING OF A BUNDLE OF PARTICLES LOADED. - Google Patents
SYSTEM FOR MEASURING AND CORRECTING THE FOCUSING OF A BUNDLE OF PARTICLES LOADED.Info
- Publication number
- NL178732B NL178732B NLAANVRAGE7507428,A NL7507428A NL178732B NL 178732 B NL178732 B NL 178732B NL 7507428 A NL7507428 A NL 7507428A NL 178732 B NL178732 B NL 178732B
- Authority
- NL
- Netherlands
- Prior art keywords
- wire
- over
- grid
- closed path
- pulses
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/21—Means for adjusting the focus
-
- E—FIXED CONSTRUCTIONS
- E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
- E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
- E01C11/00—Details of pavings
- E01C11/24—Methods or arrangements for preventing slipperiness or protecting against influences of the weather
- E01C11/26—Permanently installed heating or blowing devices ; Mounting thereof
- E01C11/265—Embedded electrical heating elements ; Mounting thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
- H05B3/34—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs
- H05B3/36—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs heating conductor embedded in insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B3/00—Ohmic-resistance heating
- H05B3/40—Heating elements having the shape of rods or tubes
- H05B3/54—Heating elements having the shape of rods or tubes flexible
- H05B3/56—Heating cables
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
- H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/017—Manufacturing methods or apparatus for heaters
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
- H05B2203/026—Heaters specially adapted for floor heating
Abstract
A beam of charged particles is deflected in a closed path such as a square, for example, over a cross wire grid at a constant velocity by an X Y deflection system. A small high frequency jitter is added at both axes of deflection to cause oscillation of the beam at 45 DEG to the X and Y axes. From the time that the leading edge of the oscillating beam passes over the wire until the trailing edge of the beam passes over the wire, an envelope of the oscillations produced by the jitter is obtained. A second envelope is obtained when the leading edge of the beam exits from being over the wire until the trailing edge of the beam ceases to be over the wire. Thus, a pair of envelopes is produced as the beam passes over each wire of the grid. The number of pulses exceeding ten per cent of the peak voltage in the eight envelopes produced by the beam completing a cycle in its closed path around the grid are counted and compared with those counted during the previous cycle of the beam moving in its closed path over the grid. As the number of pulses decreases, the quality of the focus of the beam increases so that correction signals are applied to the focus coil in accordance with whether the number of pulses is increasing or decreasing.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US483266A US3924156A (en) | 1974-06-26 | 1974-06-26 | Method and system for correcting an aberration of a beam of charged particles |
Publications (3)
Publication Number | Publication Date |
---|---|
NL7507428A NL7507428A (en) | 1975-12-30 |
NL178732B true NL178732B (en) | 1985-12-02 |
NL178732C NL178732C (en) | 1986-05-01 |
Family
ID=23919393
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NLAANVRAGE7507428,A NL178732C (en) | 1974-06-26 | 1975-06-20 | SYSTEM FOR MEASURING AND CORRECTING THE FOCUSING OF A BUNDLE OF PARTICLES LOADED. |
Country Status (8)
Country | Link |
---|---|
US (1) | US3924156A (en) |
JP (1) | JPS5420396B2 (en) |
DE (1) | DE2521591C3 (en) |
FR (1) | FR2276625A1 (en) |
GB (1) | GB1505363A (en) |
IT (1) | IT1038110B (en) |
NL (1) | NL178732C (en) |
SE (1) | SE398415B (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5444824A (en) * | 1977-09-16 | 1979-04-09 | Victor Co Of Japan Ltd | Stabilizer circuit for focusing of pickup tube of electromagnetic focusing type |
US4137459A (en) * | 1978-02-13 | 1979-01-30 | International Business Machines Corporation | Method and apparatus for applying focus correction in E-beam system |
DE2937004C2 (en) * | 1979-09-13 | 1984-11-08 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München | Chromatically corrected deflection device for corpuscular beam devices |
US6864493B2 (en) * | 2001-05-30 | 2005-03-08 | Hitachi, Ltd. | Charged particle beam alignment method and charged particle beam apparatus |
US6533721B1 (en) * | 2001-07-27 | 2003-03-18 | Stryker Corporation | Endoscopic camera system with automatic non-mechanical focus |
US10056224B2 (en) * | 2015-08-10 | 2018-08-21 | Kla-Tencor Corporation | Method and system for edge-of-wafer inspection and review |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3588586A (en) * | 1968-04-26 | 1971-06-28 | Jeol Ltd | Apparatus for correcting electron beam deflection |
DE1948153A1 (en) * | 1969-09-23 | 1971-04-01 | Siemens Ag | Electron beam tube as a writing tube |
-
1974
- 1974-06-26 US US483266A patent/US3924156A/en not_active Expired - Lifetime
-
1975
- 1975-05-09 FR FR7515556A patent/FR2276625A1/en active Granted
- 1975-05-13 IT IT23255/75A patent/IT1038110B/en active
- 1975-05-15 GB GB20493/75A patent/GB1505363A/en not_active Expired
- 1975-05-15 DE DE2521591A patent/DE2521591C3/en not_active Expired
- 1975-05-28 JP JP6309075A patent/JPS5420396B2/ja not_active Expired
- 1975-06-20 NL NLAANVRAGE7507428,A patent/NL178732C/en not_active IP Right Cessation
- 1975-12-27 SE SE7507109A patent/SE398415B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE2521591C3 (en) | 1979-02-01 |
NL7507428A (en) | 1975-12-30 |
NL178732C (en) | 1986-05-01 |
DE2521591A1 (en) | 1976-01-15 |
GB1505363A (en) | 1978-03-30 |
US3924156A (en) | 1975-12-02 |
JPS515694A (en) | 1976-01-17 |
SE398415B (en) | 1977-12-19 |
SE7507109L (en) | 1975-12-29 |
DE2521591B2 (en) | 1978-05-03 |
JPS5420396B2 (en) | 1979-07-23 |
FR2276625A1 (en) | 1976-01-23 |
FR2276625B1 (en) | 1977-04-15 |
AU8138075A (en) | 1976-11-25 |
IT1038110B (en) | 1979-11-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
BA | A request for search or an international-type search has been filed | ||
BB | A search report has been drawn up | ||
BC | A request for examination has been filed | ||
A85 | Still pending on 85-01-01 | ||
V1 | Lapsed because of non-payment of the annual fee |