IT1038110B - SYSTEM AND EQUIPMENT TO CORRECT ABERRATION OF A BEAM OF CHARGED PARTICLES - Google Patents

SYSTEM AND EQUIPMENT TO CORRECT ABERRATION OF A BEAM OF CHARGED PARTICLES

Info

Publication number
IT1038110B
IT1038110B IT23255/75A IT2325575A IT1038110B IT 1038110 B IT1038110 B IT 1038110B IT 23255/75 A IT23255/75 A IT 23255/75A IT 2325575 A IT2325575 A IT 2325575A IT 1038110 B IT1038110 B IT 1038110B
Authority
IT
Italy
Prior art keywords
wire
over
grid
closed path
pulses
Prior art date
Application number
IT23255/75A
Other languages
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1038110B publication Critical patent/IT1038110B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/21—Means for adjusting the focus
    • E—FIXED CONSTRUCTIONS
    • E01—CONSTRUCTION OF ROADS, RAILWAYS, OR BRIDGES
    • E01C—CONSTRUCTION OF, OR SURFACES FOR, ROADS, SPORTS GROUNDS, OR THE LIKE; MACHINES OR AUXILIARY TOOLS FOR CONSTRUCTION OR REPAIR
    • E01C11/00—Details of pavings
    • E01C11/24—Methods or arrangements for preventing slipperiness or protecting against influences of the weather
    • E01C11/26—Permanently installed heating or blowing devices ; Mounting thereof
    • E01C11/265—Embedded electrical heating elements ; Mounting thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/20—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater
    • H05B3/34—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs
    • H05B3/36—Heating elements having extended surface area substantially in a two-dimensional plane, e.g. plate-heater flexible, e.g. heating nets or webs heating conductor embedded in insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/40—Heating elements having the shape of rods or tubes
    • H05B3/54—Heating elements having the shape of rods or tubes flexible
    • H05B3/56—Heating cables
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/002—Heaters using a particular layout for the resistive material or resistive elements
    • H05B2203/003—Heaters using a particular layout for the resistive material or resistive elements using serpentine layout
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/017—Manufacturing methods or apparatus for heaters
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B2203/00—Aspects relating to Ohmic resistive heating covered by group H05B3/00
    • H05B2203/026—Heaters specially adapted for floor heating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Civil Engineering (AREA)
  • Structural Engineering (AREA)
  • Electron Beam Exposure (AREA)

Abstract

A beam of charged particles is deflected in a closed path such as a square, for example, over a cross wire grid at a constant velocity by an X Y deflection system. A small high frequency jitter is added at both axes of deflection to cause oscillation of the beam at 45 DEG to the X and Y axes. From the time that the leading edge of the oscillating beam passes over the wire until the trailing edge of the beam passes over the wire, an envelope of the oscillations produced by the jitter is obtained. A second envelope is obtained when the leading edge of the beam exits from being over the wire until the trailing edge of the beam ceases to be over the wire. Thus, a pair of envelopes is produced as the beam passes over each wire of the grid. The number of pulses exceeding ten per cent of the peak voltage in the eight envelopes produced by the beam completing a cycle in its closed path around the grid are counted and compared with those counted during the previous cycle of the beam moving in its closed path over the grid. As the number of pulses decreases, the quality of the focus of the beam increases so that correction signals are applied to the focus coil in accordance with whether the number of pulses is increasing or decreasing.
IT23255/75A 1974-06-26 1975-05-13 SYSTEM AND EQUIPMENT TO CORRECT ABERRATION OF A BEAM OF CHARGED PARTICLES IT1038110B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US483266A US3924156A (en) 1974-06-26 1974-06-26 Method and system for correcting an aberration of a beam of charged particles

Publications (1)

Publication Number Publication Date
IT1038110B true IT1038110B (en) 1979-11-20

Family

ID=23919393

Family Applications (1)

Application Number Title Priority Date Filing Date
IT23255/75A IT1038110B (en) 1974-06-26 1975-05-13 SYSTEM AND EQUIPMENT TO CORRECT ABERRATION OF A BEAM OF CHARGED PARTICLES

Country Status (8)

Country Link
US (1) US3924156A (en)
JP (1) JPS5420396B2 (en)
DE (1) DE2521591C3 (en)
FR (1) FR2276625A1 (en)
GB (1) GB1505363A (en)
IT (1) IT1038110B (en)
NL (1) NL178732C (en)
SE (1) SE398415B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5444824A (en) * 1977-09-16 1979-04-09 Victor Co Of Japan Ltd Stabilizer circuit for focusing of pickup tube of electromagnetic focusing type
US4137459A (en) * 1978-02-13 1979-01-30 International Business Machines Corporation Method and apparatus for applying focus correction in E-beam system
DE2937004C2 (en) * 1979-09-13 1984-11-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V., 8000 München Chromatically corrected deflection device for corpuscular beam devices
US6864493B2 (en) * 2001-05-30 2005-03-08 Hitachi, Ltd. Charged particle beam alignment method and charged particle beam apparatus
US6533721B1 (en) * 2001-07-27 2003-03-18 Stryker Corporation Endoscopic camera system with automatic non-mechanical focus
US10056224B2 (en) * 2015-08-10 2018-08-21 Kla-Tencor Corporation Method and system for edge-of-wafer inspection and review

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3588586A (en) * 1968-04-26 1971-06-28 Jeol Ltd Apparatus for correcting electron beam deflection
DE1948153A1 (en) * 1969-09-23 1971-04-01 Siemens Ag Electron beam tube as a writing tube

Also Published As

Publication number Publication date
US3924156A (en) 1975-12-02
FR2276625A1 (en) 1976-01-23
FR2276625B1 (en) 1977-04-15
JPS515694A (en) 1976-01-17
DE2521591A1 (en) 1976-01-15
NL178732B (en) 1985-12-02
DE2521591C3 (en) 1979-02-01
SE398415B (en) 1977-12-19
AU8138075A (en) 1976-11-25
JPS5420396B2 (en) 1979-07-23
DE2521591B2 (en) 1978-05-03
GB1505363A (en) 1978-03-30
NL7507428A (en) 1975-12-30
SE7507109L (en) 1975-12-29
NL178732C (en) 1986-05-01

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