GB1194943A - Gauge for Measuring the Rate of Evaporation of Substances in an Evacuated Enclosure - Google Patents

Gauge for Measuring the Rate of Evaporation of Substances in an Evacuated Enclosure

Info

Publication number
GB1194943A
GB1194943A GB1858368A GB1858368A GB1194943A GB 1194943 A GB1194943 A GB 1194943A GB 1858368 A GB1858368 A GB 1858368A GB 1858368 A GB1858368 A GB 1858368A GB 1194943 A GB1194943 A GB 1194943A
Authority
GB
United Kingdom
Prior art keywords
scanning
jet
collisions
vapour
evaporation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB1858368A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Battelle Development Corp
Original Assignee
Battelle Development Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CH576267A external-priority patent/CH475559A/en
Application filed by Battelle Development Corp filed Critical Battelle Development Corp
Publication of GB1194943A publication Critical patent/GB1194943A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/542—Controlling the film thickness or evaporation rate
    • C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/02—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas
    • H01J41/04—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas with ionisation by means of thermionic cathodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Measuring Fluid Pressure (AREA)

Abstract

1,194,943. Electron beam tubes; ionization manometers. BATTELLE DEVELOPMENT CORP. 19 April, 1968 [21 April, 1967; 26 March, 1968], No. 18583/68. Heading H1D. [Also in Divisions G1 and G3] The rate of evaporation of a substance 9 emitted in the form of a jet 8 of vapour is measured by scanning an electron beam 5 through the jet, and collecting the ionization products resulting from collisions during scanning by electrode 4, the ionization current being composed of a continuous component due to collisions with residual gas atoms and a periodic component due to the collisions with the particles of the vapour jet, the amplitude of the latter component representing the numerical density of the vapour jet particles. The scanning action may be electrostatic or magnetic giving a rectilinear trace or a circular trace (Fig. 4, not shown). The waveform applied to the scanning plates from oscillator 19 may be sinusoidal, sawtooth, square wave or stepped. When the scan is circular, the electron collector 3 and the collision particle collector are of annular configuration. The collision products may be electrons or ions resulting from elastic or inelastic collisions respectively. The rate of evaporation of several vapour jets may be measured using one scanning electron beam.
GB1858368A 1967-04-21 1968-04-19 Gauge for Measuring the Rate of Evaporation of Substances in an Evacuated Enclosure Expired GB1194943A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH576267A CH475559A (en) 1967-04-21 1967-04-21 Process for measuring the evaporation rate under vacuum, gauge for the implementation of this process and application of this process
CH454168A CH490678A (en) 1967-04-21 1968-03-26 Vacuum evaporation rate measurement gauge

Publications (1)

Publication Number Publication Date
GB1194943A true GB1194943A (en) 1970-06-17

Family

ID=25695723

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1858368A Expired GB1194943A (en) 1967-04-21 1968-04-19 Gauge for Measuring the Rate of Evaporation of Substances in an Evacuated Enclosure

Country Status (5)

Country Link
JP (1) JPS5212590B1 (en)
CH (1) CH490678A (en)
DE (1) DE1773242C3 (en)
FR (1) FR1577403A (en)
GB (1) GB1194943A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005091330A2 (en) * 2002-05-28 2005-09-29 Inficon, Inc. Louvered beam stop for lowering x-ray limit of a total pressure gauge

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60225422A (en) * 1984-04-24 1985-11-09 Hitachi Ltd Forming method of thin film and equipment thereof
DE3521549A1 (en) * 1985-06-15 1986-12-18 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Method for measuring and/or regulating a particle stream

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005091330A2 (en) * 2002-05-28 2005-09-29 Inficon, Inc. Louvered beam stop for lowering x-ray limit of a total pressure gauge
WO2005091330A3 (en) * 2002-05-28 2005-11-10 Inficon Inc Louvered beam stop for lowering x-ray limit of a total pressure gauge

Also Published As

Publication number Publication date
DE1773242B2 (en) 1974-01-10
FR1577403A (en) 1969-08-08
DE1773242A1 (en) 1971-10-28
JPS5212590B1 (en) 1977-04-08
CH490678A (en) 1970-05-15
DE1773242C3 (en) 1974-08-08

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Legal Events

Date Code Title Description
PS Patent sealed
PLNP Patent lapsed through nonpayment of renewal fees